Patents by Inventor Abhishek Shendre
Abhishek Shendre has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11886166Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. The area comprises a plurality of pixels, and the original set of exposure information comprises dosages for the plurality of pixels in the area. A backscatter is calculated for a sub area of the area based on the original set of exposure information including the dosages for the plurality of pixels in the area. An increase in dosage for at least one pixel in a plurality of pixels in the sub area is determined, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area.Type: GrantFiled: February 14, 2023Date of Patent: January 30, 2024Assignee: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman
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Publication number: 20230386784Abstract: Methods and systems for exposing a desired shape in an area on a surface using a charged particle beam system include determining a local pattern density for the area, based on an original set of exposure information. A pre-proximity effect correction (PEC) maximum dose for the local pattern density is determined, based on a pre-determined target post-PEC maximum dose. The pre-PEC maximum dose may be calculated near an edge of the desired shape. Methods also include modifying the original set of exposure information with the pre-PEC maximum dose to create a modified set of exposure information.Type: ApplicationFiled: August 3, 2023Publication date: November 30, 2023Applicant: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman
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Patent number: 11756765Abstract: Methods for exposing a desired shape in an area on a surface using a charged particle beam system include determining a local pattern density for the area of the desired shape based on an original set of exposure information. A backscatter for a sub area is calculated, based on the original set of exposure information. Dosage for at least one pixel in a plurality of pixels in the sub area is increased, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area. A pre-PEC maximum dose is determined for the local pattern density, based on a pre-determined target post-PEC maximum dose. The original set of exposure information is modified with the pre-PEC maximum dose and the increased dosage of the at least one pixel in the sub area to create a modified set of exposure information.Type: GrantFiled: June 17, 2021Date of Patent: September 12, 2023Assignee: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman
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Publication number: 20230205177Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. The area comprises a plurality of pixels, and the original set of exposure information comprises dosages for the plurality of pixels in the area. A backscatter is calculated for a sub area of the area based on the original set of exposure information including the dosages for the plurality of pixels in the area. An increase in dosage for at least one pixel in a plurality of pixels in the sub area is determined, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area.Type: ApplicationFiled: February 14, 2023Publication date: June 29, 2023Applicant: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman
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Publication number: 20230124768Abstract: Methods for exposing a desired shape in an area on a surface using a charged particle beam system include determining a local pattern density for the area, based on an original set of exposure information. A pre-proximity effect correction (PEC) maximum dose for the local pattern density is determined, based on a pre-determined target post-PEC maximum dose. The pre-PEC maximum dose is calculated near an edge of the desired shape. Methods also include modifying the original set of exposure information with the pre-PEC maximum dose to create a modified set of exposure information.Type: ApplicationFiled: December 19, 2022Publication date: April 20, 2023Applicant: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman
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Patent number: 11604451Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. The area comprises a plurality of pixels, and the original set of exposure information comprises dosages for the plurality of pixels in the area. A backscatter is calculated for a sub area of the area based on the original set of exposure information. A dosage for at least one pixel in a plurality of pixels in the sub area is increased, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area. A modified set of exposure information is output, including the increased dosage of the at least one pixel in the sub area.Type: GrantFiled: March 24, 2021Date of Patent: March 14, 2023Assignee: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman
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Patent number: 11263496Abstract: Methods for matching features in patterns for electronic designs include inputting a set of pattern data for semiconductor or flat panel displays, where the set of pattern data comprises a plurality of features. Each feature in the plurality of features is classified, where the classifying is based on a geometrical context defined by shapes in a region. The classifying uses machine learning techniques.Type: GrantFiled: February 18, 2020Date of Patent: March 1, 2022Assignee: D2S, Inc.Inventors: Mariusz Niewczas, Abhishek Shendre
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Publication number: 20210313143Abstract: Methods for exposing a desired shape in an area on a surface using a charged particle beam system include determining a local pattern density for the area of the desired shape based on an original set of exposure information. A backscatter for a sub area is calculated, based on the original set of exposure information. Dosage for at least one pixel in a plurality of pixels in the sub area is increased, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area. A pre-PEC maximum dose is determined for the local pattern density, based on a pre-determined target post-PEC maximum dose. The original set of exposure information is modified with the pre-PEC maximum dose and the increased dosage of the at least one pixel in the sub area to create a modified set of exposure information.Type: ApplicationFiled: June 17, 2021Publication date: October 7, 2021Applicant: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman
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Publication number: 20210208569Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. The area comprises a plurality of pixels, and the original set of exposure information comprises dosages for the plurality of pixels in the area. A backscatter is calculated for a sub area of the area based on the original set of exposure information. A dosage for at least one pixel in a plurality of pixels in the sub area is increased, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area. A modified set of exposure information is output, including the increased dosage of the at least one pixel in the sub area.Type: ApplicationFiled: March 24, 2021Publication date: July 8, 2021Applicant: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman
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Publication number: 20200272865Abstract: Methods for matching features in patterns for electronic designs include inputting a set of pattern data for semiconductor or flat panel displays, where the set of pattern data comprises a plurality of features. Each feature in the plurality of features is classified, where the classifying is based on a geometrical context defined by shapes in a region. The classifying uses machine learning techniques.Type: ApplicationFiled: February 18, 2020Publication date: August 27, 2020Applicant: D2S, Inc.Inventors: Mariusz Niewczas, Abhishek Shendre