Abstract: Structures and methods of operating a resistive switching memory device are disclosed herein. In one embodiment, a resistive switching memory device can include: (i) a plurality of resistive memory cells, where each of the resistive switching memory cells is configured to be programmed to a low resistance state by application of a first voltage in a forward bias direction, and to be erased to a high resistance state by application of a second voltage in a reverse bias direction; and (ii) a sensing circuit coupled to at least one of the plurality of resistive memory cells, where the sensing circuit is configured to read a data state of the at least one resistive memory cell by application of a third voltage in the forward bias direction or the bias reverse direction.

Abstract: In one embodiment of the present invention, a resistive switching device includes a first electrode disposed over a substrate and coupled to a first potential node, a switching layer disposed over the first electrode, a conductive amorphous layer disposed over the switching layer, and a second electrode disposed on the conductive amorphous layer and coupled to a second potential node.

Abstract: In one embodiment of the present invention, a memory cell includes a first resistive switching element having a first terminal and a second terminal, and a second resistive switching element having a first terminal and a second terminal. The memory further includes a three terminal transistor, which has a first terminal, a second terminal, and a third terminal. The first terminal of the three terminal transistor is coupled to the first terminal of the first resistive switching element. The second terminal of the three terminal transistor is coupled to the first terminal of the second resistive switching element. The third terminal of the three terminal transistor is coupled to a word line.

Abstract: In accordance with an embodiment of the present invention, a resistive switching device includes an opening disposed within a first dielectric layer, a conductive barrier layer disposed on sidewalls of the opening, a fill material including an inert material filling the opening. A solid electrolyte layer is disposed over the opening. The solid electrolyte contacts the fill material but not the conductive barrier layer. A top electrode is disposed over the solid electrolyte.