Abstract: A semiconductor processing system and a method for assembling such a system in a room of a semiconductor fabrication plant. The system comprises an equipment module and a pedestal. The equipment module may be movable over the pedestal to bring the equipment module in an end position and may have a plurality of stop surfaces. The method comprises placing the pedestal in the room, placing two stops on the pedestal and positioning the two stops relative to reference elements in the room, and connecting the positioned stops to the pedestal so that the positions thereof in the X-direction and Y-direction are fixed. The equipment module may be moved over the pedestal until the stop surfaces of the equipment module abut against the stops so as to position the equipment module in the X-direction and Y-direction relative to the reference elements.

Abstract: A storage apparatus to store cassettes for substrates comprising a moveable base plate constructed and arranged to hold cassettes, an outer wall provided with an opening to receive and remove the cassettes from the base plate, and a moving device constructed and arranged to move the base plate with respect to the opening. The storage apparatus is provided with a stationary sensor near the opening for detecting at least one of a presence and a correct orientation of a substrate cassette on the base plate at the opening.

Abstract: A storage device for use with at least one batch furnace for batch treatment of wafers supported in a wafer boat is disclosed. The storage device comprises a cassette storage carousel for storing a plurality of wafer cassettes on rotatable platform stages. A carousel housing bounds a mini-environment chamber in which the platform stages are accommodated. A gas recirculation circuit of the storage device subsequently comprises a gas inlet channel, a gas inlet filter, the mini-environment chamber, a plurality of gas outlet openings in a bottom wall of the carousel housing, a plenum housing bounding a plenum chamber, a plenum chamber outlet, a gas circulation pump connecting the plenum chamber outlet to an inlet end of the gas inlet duct.

Abstract: An apparatus 1 for processing a plurality of substrates 3 is provided. The apparatus may have a process tube 5 creating a process chamber 7; a heater 9 surrounding the process tube 5; a flange 11 for supporting the process tube; and a door 15 configured to support a wafer boat 17 with a plurality of substrates 3 in the process chamber and to seal the process chamber 7. An exhaust operably connected to the process chamber 7 may be provided to remove gas from the process chamber via a first exhaust duct 19. The apparatus may be provided with an extractor chamber 21 surrounding the first exhaust duct where it connects to the process chamber and connected to a second exhaust duct 23 to remove gas from the extractor chamber.

Abstract: The invention relates to a storage apparatus to store cassettes for substrates comprising: a moveable base plate constructed and arranged to hold cassettes; an outer wall provided with an opening to receive and remove the cassettes from the base plate, and a moving device constructed and arranged to move the base plate with respect to the opening. The storage apparatus is provided with a stationary sensor near the opening for detecting at least one of a presence and a correct orientation of a substrate cassette on the base plate at the opening.

Abstract: A storage device for use with at least one batch furnace for batch treatment of wafers supported in a wafer boat is disclosed. The storage device comprises a cassette storage carousel for storing a plurality of wafer cassettes on rotatable platform stages. A carousel housing bounds a mini-environment chamber in which the platform stages are accommodated. A gas recirculation circuit of the storage device subsequently comprises a gas inlet channel, a gas inlet filter, the mini-environment chamber, a plurality of gas outlet openings in a bottom wall of the carousel housing, a plenum housing bounding a plenum chamber, a plenum chamber outlet, a gas circulation pump connecting the plenum chamber outlet to an inlet end of the gas inlet duct.

Abstract: A storage apparatus to store cassettes for substrates comprising a moveable base plate constructed and arranged to hold cassettes, an outer wall provided with an opening to receive and remove the cassettes from the base plate, and a moving device constructed and arranged to move the base plate with respect to the opening is disclosed. The storage apparatus is provided with a stationary sensor near the opening for detecting at least one of a presence and a correct orientation of a substrate cassette on the base plate at the opening.

Abstract: A storage device for use with at least one batch furnace for batch treatment of wafers supported in a wafer boat is disclosed. The storage device comprises a cassette storage carousel for storing a plurality of wafer cassettes on rotatable platform stages. A carousel housing bounds a mini-environment chamber in which the platform stages are accommodated. A gas recirculation circuit of the storage device subsequently comprises a gas inlet channel, a gas inlet filter, the mini-environment chamber, a plurality of gas outlet openings in a bottom wall of the carousel housing, a plenum housing bounding a plenum chamber, a plenum chamber outlet, a gas circulation pump connecting the plenum chamber outlet to an inlet end of the gas inlet duct.

Abstract: A dummy wafer storage cassette for storing dummy wafers. The dummy wafer storage cassette may have more than 30 wafer slots for accommodating dummy wafers. The dummy wafer cassette may have substantially the same outer dimensions as a standardized wafer cassette with 25 wafer slots and a pitch of the wafer slots of the dummy wafer storage cassette may be smaller than a pitch between the wafer slots in the standardized wafer cassette.

Abstract: A storage device for use with at least one batch furnace for batch treatment of wafers supported in a wafer boat is disclosed. The storage device comprises a cassette storage carousel for storing a plurality of wafer cassettes on rotatable platform stages. A carousel housing bounds a mini-environment chamber in which the platform stages are accommodated. A gas recirculation circuit of the storage device subsequently comprises a gas inlet channel, a gas inlet filter, the mini-environment chamber, a plurality of gas outlet openings in a bottom wall of the carousel housing, a plenum housing bounding a plenum chamber, a plenum chamber outlet, a gas circulation pump connecting the plenum chamber outlet to an inlet end of the gas inlet duct.

Abstract: The invention relates to a storage apparatus to store cassettes for substrates comprising: a moveable base plate constructed and arranged to hold cassettes; an outer wall provided with an opening to receive and remove the cassettes from the base plate, and a moving device constructed and arranged to move the base plate with respect to the opening. The storage apparatus is provided with a stationary sensor near the opening for detecting at least one of a presence and a correct orientation of a substrate cassette on the base plate at the opening.

Abstract: The invention relates to a cassette holder assembly for holding a cassette for storing at least one semiconductor material substrate in an interior space accessible from a front end of the cassette. The cassette holder assembly may have a base plate for receiving the cassette. Two holding members supported by the base plate may be positioning the cassette on the plate in the assembly. The holding members may be substantially identical to each other.

Abstract: A dummy wafer storage cassette for storing dummy wafers. The dummy wafer storage cassette may have more than 30 wafer slots for accommodating dummy wafers. The dummy wafer cassette may have substantially the same outer dimensions as a standardized wafer cassette with 25 wafer slots and a pitch of the wafer slots of the dummy wafer storage cassette may be smaller than a pitch between the wafer slots in the standardized wafer cassette.

Abstract: The invention relates to a cassette holder assembly for holding a cassette for storing at least one semiconductor material substrate in an interior space accessible from a front end of the cassette. The cassette holder assembly may have a base plate for receiving the cassette. Two holding members supported by the base plate may be positioning the cassette on the plate in the assembly. The holding members may be substantially identical to each other.

Abstract: The invention relates to a cassette holder assembly for holding a cassette for storing at least one semiconductor material substrate in an interior space accessible from a front end of the cassette. The cassette holder assembly may have a base plate for receiving the cassette. Two holding members supported by the base plate may be positioning the cassette on the plate in the assembly. The holding members may be substantially identical to each other.

Abstract: The invention relates to a cassette holder assembly for holding a cassette for storing at least one semiconductor material substrate in an interior space accessible from a front end of the cassette. The cassette holder assembly may have a base plate for receiving the cassette. Two holding members supported by the base plate may be positioning the cassette on the plate in the assembly. The holding members may be substantially identical to each other.

Abstract: A method for processing solar cells comprising: providing a vertical furnace to receive an array of mutually spaced circular semiconductor wafers for integrated circuit processing; composing a process chamber loading configuration for solar cell substrates, wherein a size of the solar cell substrates that extends along a first surface to be processed is smaller than a corresponding size of the circular semiconductor wafers, such that multiple arrays of mutually spaced solar cell substrates can be accommodated in the process chamber, loading the solar cell substrates into the process chamber; subjecting the solar cell substrates to a process in the process chamber.

Abstract: A method for processing solar cells comprising: providing a vertical furnace to receive an array of mutually spaced circular semiconductor wafers for integrated circuit processing; composing a process chamber loading configuration for solar cell substrates, wherein a size of the solar cell substrates that extends along a first surface to be processed is smaller than a corresponding size of the circular semiconductor wafers, such that multiple arrays of mutually spaced solar cell substrates can be accommodated in the process chamber, loading the solar cell substrates into the process chamber; subjecting the solar cell substrates to a process in the process chamber.

Abstract: A method for processing solar cells comprising: providing a vertical furnace to receive an array of mutually spaced circular semiconductor wafers for integrated circuit processing; composing a process chamber loading configuration for solar cell substrates, wherein a size of the solar cell substrates that extends along a first surface to be processed is smaller than a corresponding size of the circular semiconductor wafers, such that multiple arrays of mutually spaced solar cell substrates can be accommodated in the process chamber, loading the solar cell substrates into the process chamber; subjecting the solar cell substrates to a process in the process chamber.

Abstract: Wafer boat for holding semiconductor wafers in a spaced vertical arrangement during processing, said wafer boat comprising a plurality of vertically spaced holding positions for receiving and supporting said wafers in a substantially horizontal orientation, wherein the holding positions can be accessed from a front side of the wafer boat to allow for insertion and removal of a wafer, wherein at least one holding position comprises a back support for engaging a back side portion of a wafer and two lateral supports for engaging opposite lateral side portions of the wafer, and wherein the back support is disposed at a lower position than said two lateral supports such that sagging of a front side portion of an inserted wafer near the front side of the wafer boat due to gravity is at least partially compensated for.