Patents by Inventor Adriaan Marinus Lankhorst

Adriaan Marinus Lankhorst has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for reactive ion etching
    Patent number: 9761458
    Abstract: The invention relates to an apparatus for reactive ion etching of a substrate, comprising: a plasma etch zone including an etch gas supply and arranged with a plasma generating structure for igniting a plasma and comprising an electrode structure arranged to accelerate the etch plasma toward a substrate portion to have ions impinge on the surface of the substrate; a passivation zone including a cavity provided with a passivation gas supply; said supply arranged for providing a passivation gas flow from the supply to the cavity; the cavity in use being bounded by the injector head and the substrate surface; and a gas purge structure comprising a gas exhaust arranged between said etch zone and passivation zone; the gas purge structure thus forming a spatial division of the etch and passivation zones.
    Type: Grant
    Filed: February 25, 2011
    Date of Patent: September 12, 2017
    Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
    Inventors: Freddy Roozeboom, Adriaan Marinus Lankhorst, Paulus Willibrordus George Poodt, Norbertus Benedictus Koster, Gerardus Johan Jozef Winands, Adrianus Johannes Petrus Maria Vermeer
  • APPARATUS AND METHOD FOR REACTIVE ION ETCHING
    Publication number: 20130118895
    Abstract: The invention relates to an apparatus for reactive ion etching of a substrate, comprising: a plasma etch zone including an etch gas supply and arranged with a plasma generating structure for igniting a plasma and comprising an electrode structure arranged to accelerate the etch plasma toward a substrate portion to have ions impinge on the surface of the substrate; a passivation zone including a cavity provided with a passivation gas supply; said supply arranged for providing a passivation gas flow from the supply to the cavity; the cavity in use being bounded by the injector head and the substrate surface; and a gas purge structure comprising a gas exhaust arranged between said etch zone and passivation zone; the gas purge structure thus forming a spatial division of the etch and passivation zones.
    Type: Application
    Filed: February 25, 2011
    Publication date: May 16, 2013
    Applicant: Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO
    Inventors: Freddy Roozeboom, Adriaan Marinus Lankhorst, Paulus Willibrordus George Poodt, Norbertus Benedictus Koster, Gerardus Johan Jozef Winands, Adrianus Johannes Petrus Maria Vermeer