Abstract: A process for the modification of a surface of a solid material, having the step of contacting the surface with a surface-modifying composition under irradiation with light of a wavelength in the range of 200 to 800 nm optionally in the presence of a photoinitiator, wherein the solid material has surface groups selected from C—OH, Si—OH, C?O and C—O—C groups and wherein the surface-modifying composition has at least a hydrosilane and at least one reactive compound (A) other than the hydrosilane, wherein the reactive compound (A) has at least two functional groups selected from (meth)acrylate, (meth)acrylamide, hydroxyl, carboxylic acid, alkene, alkyne and epoxy, and wherein the amount of hydrosilane in the composition ranges between 0.5 and 99 vol %, and wherein the vol % is determined at 20° C. relative to the total of the surface modifying composition. A solid material having a partial surface modification layer.

Abstract: A process for the modification of a surface of a solid material, having the step of contacting the surface with a surface-modifying composition under irradiation with light of a wavelength in the range of 200 to 800 nm optionally in the presence of a photoinitiator, wherein the solid material has surface groups selected from C—OH, Si—OH, C?O and C—O—C groups and wherein the surface-modifying composition has at least a hydrosilane and at least one reactive compound (A) other than the hydrosilane, wherein the reactive compound (A) has at least two functional groups selected from (meth)acrylate, (meth)acrylamide, hydroxyl, carboxylic acid, alkene, alkyne and epoxy, and wherein the amount of hydrosilane in the composition ranges between 0.5 and 99 vol %, and wherein the vol % is determined at 20° C. relative to the total of the surface modifying composition. A solid material having a partial surface modification layer.

Abstract: A process for the modification of a surface of a solid material, including the step of contacting the surface with a surface-modifying compound under irradiation with light of a wavelength in the range of 200 to 800 nm optionally in the presence of a photoinitiator, wherein a) the surface has Si—OH groups, C—OH groups or epoxy groups and the surface-modifying compound is a hydrosilane, or b) the surface has O—Si—H groups and the surface-modifying compound is a silanol or an alcohol.