Patents by Inventor Adrian John Murrell

Adrian John Murrell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7586101
    Abstract: The invention relates to improving the efficiency of ion flow from an ion source, by reducing heat loss from the source both in the ion chamber of the ion source and its constituent parts (e.g. the electron source). This is achieved by lining the interior of the ion chamber and/or the exterior with heat reflective and/or heat insulating material and by formation of an indirectly heated cathode tube such that heat transfer along the tube and away from the ion chamber is restricted by the formation of slits in the tube. Efficiency of the ion source is further enhanced by impregnating and/or coating the front plate of the ion chamber with a material which comprises an element or compound thereof, the ions of which element are the same specie as those to be implanted into the substrate from the source thereof.
    Type: Grant
    Filed: December 22, 2004
    Date of Patent: September 8, 2009
    Assignee: Applied Materials, Inc.
    Inventors: Adrian John Murrell, Richard David Goldberg, Christopher J. S. Burgess, David George Armour, Erik J. H. Collart
  • Publication number: 20080129180
    Abstract: The invention relates to improving the efficiency of ion flow from an ion source, by reducing heat loss from the source both in the ion chamber of the ion source and its constituent parts (e.g. the electron source). This is achieved by lining the interior of the ion chamber and/or the exterior with heat reflective and/or heat insulating material and by formation of an indirectly heated cathode tube such that heat transfer along the tube and away from the ion chamber is restricted by the formation of slits in the tube. Efficiency of the ion source is further enhanced by impregnating and/or coating the front plate of the ion chamber with a material which comprises an element or compound thereof, the ions of which element are the same specie as those to be implanted into the substrate from the source thereof.
    Type: Application
    Filed: December 22, 2004
    Publication date: June 5, 2008
    Inventors: Adrian John Murrell, Richard David Goldberg, Christopher J.S. Burgess, David George Armour, Erik J.H. Collart
  • Patent number: 6847043
    Abstract: The invention relates to improving the efficiency of ion flow from an ion source, by reducing heat loss from the source both in the ion chamber of the ion source and its constituent parts (e.g. the electron source). This is achieved by lining the interior of the ion chamber and/or the exterior with heat reflective and/or heat insulating material and by formation of an indirectly heated cathode tube such that heat transfer along the tube and away from the ion chamber is restricted by the formation of slits in the tube. Efficiency of the ion source is further enhanced by impregnating and/or coating the front plate of the ion chamber with a material which comprises an element or compound thereof, the ions of which element are the same specie as those to be implanted into the substrate from the source thereof.
    Type: Grant
    Filed: December 31, 2002
    Date of Patent: January 25, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Adrian John Murrell, Richard David Goldberg, Christopher J. S. Burgess, David George Armour, Erik J. H. Collart
  • Publication number: 20030197129
    Abstract: The invention relates to improving the efficiency of ion flow from an ion source, by reducing heat loss from the source both in the ion chamber of the ion source and its constituent parts (e.g. the electron source). This is achieved by lining the interior of the ion chamber and/or the exterior with heat reflective and/or heat insulating material and by formation of an indirectly heated cathode tube such that heat transfer along the tube and away from the ion chamber is restricted by the formation of slits in the tube. Efficiency of the ion source is further enhanced by impregnating and/or coating the front plate of the ion chamber with a material which comprises an element or compound thereof, the ions of which element are the same specie as those to be implanted into the substrate from the source thereof.
    Type: Application
    Filed: December 31, 2002
    Publication date: October 23, 2003
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Adrian John Murrell, Richard David Goldberg, Christopher J. S. Burgess, David George Armour, Erik J.H. Collart
  • Patent number: 6559454
    Abstract: An ion beam generation apparatus comprising an ion source (20) for generating ions, and a tetrode extraction assembly (11) comprising four electrodes for extracting and accelerating ions from the ion source. The extraction assembly comprises a source electrode (22) at the potential of the ion source, an extraction electrode (23) adjacent to the source electrode to extract ions from the ion source (20), a ground electrode (25), and a suppression electrode (24) between the extraction electrode and the ground electrode. Each electrode has an aperture to allow the ion beam to pass therethrough. The gap between the extraction (23) and suppression (24) electrodes is variable in the direction of ion beam travel.
    Type: Grant
    Filed: May 29, 2001
    Date of Patent: May 6, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Adrian John Murrell, Erik Jan Hilda Collart, Bernard Francis Harrison, Amir Al-Bayati, Chris James Burgess, David Armour, Andrew Holmes, Simon Povall, Drew Arnold, Paul Anthony Burfield