Patents by Inventor Ahmad Wasiem Ibrahim EL-SAID

Ahmad Wasiem Ibrahim EL-SAID has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patterning process improvement involving optical aberration
    Patent number: 11422472
    Abstract: A method involving: obtaining a process model of a patterning process that includes or accounts for an average optical aberration of optical systems of a plurality of apparatuses for use with a patterning process; and applying the process model to determine an adjustment to a parameter of the patterning process to account for the average optical aberration.
    Type: Grant
    Filed: December 17, 2018
    Date of Patent: August 23, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Paulus Jacobus Maria Van Adrichem, Ahmad Wasiem Ibrahim El-Said, Christoph Rene Konrad Cebulla Hennerkes, Johannes Christiaan Maria Jasper
  • PATTERNING PROCESS IMPROVEMENT INVOLVING OPTICAL ABERRATION
    Publication number: 20210165332
    Abstract: A method involving: obtaining a process model of a patterning process that includes or accounts for an average optical aberration of optical systems of a plurality of apparatuses for use with a patterning process; and applying the process model to determine an adjustment to a parameter of the patterning process to account for the average optical aberration.
    Type: Application
    Filed: December 17, 2018
    Publication date: June 3, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Paulus Jacobus Maria VAN ADRICHEM, Ahmad Wasiem Ibrahim EL-SAID, Christoph Rene Konrad Cebulla HENNERKES, Johannes Christiaan Maria JASPER