Patents by Inventor Ahn Heejoon

Ahn Heejoon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sub-micron decal transfer lithography
    Patent number: 8252191
    Abstract: The present invention provides a method of sub-micron decal transfer lithography. The method includes forming a first pattern in a surface of a first silicon-containing elastomer, bonding at least a portion of the first pattern to a substrate, and etching a portion of at least one of the first silicon-containing elastomer and the substrate.
    Type: Grant
    Filed: May 5, 2006
    Date of Patent: August 28, 2012
    Assignee: Dow Corning Corporation
    Inventors: Ahn Heejoon, Ralph Nuzzo, Anne Shim
  • Sub-Micron Decal Transfer Lithography Statement Regarding Federally Sponsored Research or Development
    Publication number: 20080190888
    Abstract: The present invention provides a method of sub-micron decal transfer lithography. The method includes forming a first pattern in a surface of a first silicon-containing elastomer, bonding at least a portion of the first pattern to a substrate, and etching a portion of at least one of the first silicon-containing elastomer and the substrate.
    Type: Application
    Filed: May 5, 2006
    Publication date: August 14, 2008
    Inventors: Ahn Heejoon, Ralph Nuzzo, Anne Shim