Patents by Inventor Aihau Chen

Aihau Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for forming silicon containing films
    Publication number: 20030124818
    Abstract: The present invention describes a method and apparatus for forming a uniform silicon containing film in a single wafer reactor. According to the present invention, a silicon containing film is deposited in a resistively heated single wafer chamber utilizing a process gas having a silicon source gas and which provides an activation energy less than 0.5 eV at a temperature between 750° C.-550° C.
    Type: Application
    Filed: December 28, 2001
    Publication date: July 3, 2003
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Lee Luo, Ramaseshan Suryanarayanan Iyer, Shulin Wang, Aihau Chen, Paul Meissner