Patents by Inventor Aki Hidaka

Aki Hidaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Water-soluble cutting fluid for slicing silicon ingots
    Patent number: 9522481
    Abstract: A water-soluble cutting fluid for slicing silicon ingots is characterized in that it includes a monoprotic or diprotic aliphatic carboxylic acid (A) having a carbon number (including the carbon in the carbonyl group) of 4˜10, and either a polyprotic organic acid (B) with ?pKa of 0.9˜2.3 as defined by the following formula (1) or a salt (BA) of said organic acid (B) as essential components: ?pKa=(pKa2)?(pKa1)??(1) wherein the dissociation stage, at which the organic acid (B) denoted as n-protic acid HnA, becomes Hn-1A+H+ is numbered 1 with an acid dissociation constant expressed as pKa1, and the dissociation stage at which the organic acid (B) becomes Hn-2A+H+ is numbered as 2 with an acid dissociation constant expressed as pKa2.
    Type: Grant
    Filed: August 30, 2010
    Date of Patent: December 20, 2016
    Assignee: SANYO CHEMICAL INDUSTRIES, LTD.
    Inventors: Aki Hidaka, Yoshitaka Katsukawa, Tsuyoshi Okamoto
  • WATER-SOLUBLE CUTTING FLUID FOR SLICING SILICON INGOTS
    Publication number: 20120156123
    Abstract: A water-soluble cutting fluid for slicing silicon ingots is characterized in that it includes a monoprotic or diprotic aliphatic carboxylic acid (A) having a carbon number (including the carbon in the carbonyl group) of 4˜10, and either a polyprotic organic acid (B) with ?pKa of 0.9˜2.3 as defined by the following formula (1) or a salt (BA) of said organic acid (B) as essential components: ?pKa=(pKa2)?(pKa1) ??(1) wherein the dissociation stage, at which the organic acid (B) denoted as n-protic acid HnA, becomes Hn-1A+H+ is numbered 1 with an acid dissociation constant expressed as pKa1, and the dissociation stage at which the organic acid (B) becomes Hn-2A+H+ is numbered as 2 with an acid dissociation constant expressed as pKa2.
    Type: Application
    Filed: August 30, 2010
    Publication date: June 21, 2012
    Applicant: SANYO CHEMICAL INDUSTRIES, LTD.
    Inventors: Aki Hidaka, Yoshitaka Katsukawa, Tsuyoshi Okamoto