Patents by Inventor Aki Kuromatsu

Aki Kuromatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200095380
    Abstract: Provided is a coating agent that can be formed into a surface layer having excellent self-restoring properties and stain-proof properties by applying the coating agent onto a surface of a base material (for example, thermoplastic polyurethane) and curing the resulting material. The coating agent according to the present application contains urethane (meth)acrylate-based resin (a), fluorine-based compound (b) and photopolymerization initiator (d). Urethane (meth)acrylate-based resin (a) has weight average molecular weight (Mw) of 10,000 to 800,000. Fluorine-based compound (b) has at least two polymerizable functional groups. The surface layer formed of the coating agent has excellent self-restoring properties of a scratch, stain-proof properties and stretchability.
    Type: Application
    Filed: November 27, 2019
    Publication date: March 26, 2020
    Applicant: JNC CORPORATION
    Inventors: KYOKO KONDO, KENYA ITO, HIROYUKI IIZUKA, AKI KUROMATSU
  • Patent number: 10513586
    Abstract: Provided is a coating agent that can be formed into a surface layer having excellent self-restoring properties and stain-proof properties by applying the coating agent onto a surface of a base material (for example, thermoplastic polyurethane) and curing the resulting material. The coating agent according to the present application contains urethane (meth)acrylate-based resin (a), fluorine-based compound (b) and photopolymerization initiator (d). Urethane (meth)acrylate-based resin (a) has weight average molecular weight (Mw) of 10,000 to 800,000. Fluorine-based compound (b) has at least two polymerizable functional groups. The surface layer formed of the coating agent has excellent self-restoring properties of a scratch, stain-proof properties and stretchability.
    Type: Grant
    Filed: March 29, 2016
    Date of Patent: December 24, 2019
    Assignee: JNC CORPORATION
    Inventors: Kyoko Kondo, Kenya Ito, Hiroyuki Iizuka, Aki Kuromatsu
  • Publication number: 20180086882
    Abstract: Provided is a coating agent that can be formed into a surface layer having excellent self-restoring properties and stain-proof properties by applying the coating agent onto a surface of a base material (for example, thermoplastic polyurethane) and curing the resulting material. The coating agent according to the present application contains urethane (meth)acrylate-based resin (a), fluorine-based compound (b) and photopolymerization initiator (d). Urethane (meth)acrylate-based resin (a) has weight average molecular weight (Mw) of 10,000 to 800,000. Fluorine-based compound (b) has at least two polymerizable functional groups. The surface layer formed of the coating agent has excellent self-restoring properties of a scratch, stain-proof properties and stretchability.
    Type: Application
    Filed: March 29, 2016
    Publication date: March 29, 2018
    Applicant: JNC CORPORATION
    Inventors: Kyoko KONDO, Kenya ITO, Hiroyuki IIZUKA, Aki KUROMATSU
  • Patent number: 9756722
    Abstract: The transparent electroconductive film is provided with: a transparent substrate formed from a film-shaped polymer resin; a first hard coat layer laminated on one surface of the substrate; and a first transparent conductor layer laminated on the upper side of the first hard coating layer. The substrate has a film thickness of 2 to 250 ?m. The first hard coating layer is formed from a curable resin containing an inorganic oxide, and has a film thickness of 0.01 ?m to less than 0.5 ?m, or more than 6 ?m to 10 ?m. The first transparent conductor layer is formed from at least one material selected from the group consisting of an inorganic oxide, a metal, and carbon, has a film thickness of 10 nm to 2 ?m, and is patterned so as to have formed thereon a patterned section and a non-patterned section.
    Type: Grant
    Filed: December 21, 2012
    Date of Patent: September 5, 2017
    Assignee: JNC CORPORATION
    Inventors: Yoshitaka Morimoto, Takuro Tanaka, Koji Ohguma, Aki Kuromatsu
  • Patent number: 9375867
    Abstract: Provided is a transfer film for in-mold molding which is superior in solvent resistance, heat resistance, durability, blocking resistance, and moldability, and is capable of suppressing the generation of gate flow, and also provided is a method for producing such a film. The film is provided with: a transfer layer (11) which is to be transferred to an in-mold molded body and which is to be cured when irradiated with active energy rays after the transfer; and a film shaped substrate (L0). The transfer layer (11) comprises an IMD layer (L2) laminated on the substrate (L0) and to be arranged on the outermost surface of the molded body after the in-mold molding. The IMD layer (L2) is constituted by a mixture composition containing at least one active-energy curable resin and at least one thermosetting resin.
    Type: Grant
    Filed: June 18, 2012
    Date of Patent: June 28, 2016
    Assignee: JNC CORPORATION
    Inventors: Kenya Ito, Koji Ohguma, Takuro Tanaka, Yuka Takahashi, Aki Kuromatsu, Mikio Yamahiro
  • Publication number: 20150002760
    Abstract: The transparent electroconductive film is provided with: a transparent substrate formed from a film-shaped polymer resin; a first hard coat layer laminated on one surface of the substrate; and a first transparent conductor layer laminated on the upper side of the first hard coating layer. The substrate has a film thickness of 2 to 250 ?m. The first hard coating layer is formed from a curable resin containing an inorganic oxide, and has a film thickness of 0.01 ?m to less than 0.5 ?m, or more than 6 ?m to 10 ?m. The first transparent conductor layer is formed from at least one material selected from the group consisting of an inorganic oxide, a metal, and carbon, has a film thickness of 10 nm to 2 ?m, and is patterned so as to have formed thereon a patterned section and a non-patterned section.
    Type: Application
    Filed: December 21, 2012
    Publication date: January 1, 2015
    Inventors: Yoshitaka Morimoto, Takuro Tanaka, Koji Ohguma, Aki Kuromatsu
  • Publication number: 20140113115
    Abstract: Provided is a transfer film for in-mold molding which is superior in solvent resistance, heat resistance, durability, blocking resistance, and moldability, and is capable of suppressing the generation of gate flow, and also provided is a method for producing such a film. The film is provided with: a transfer layer (11) which is to be transferred to an in-mold molded body and which is to be cured when irradiated with active energy rays after the transfer; and a film shaped substrate (L0). The transfer layer (11) comprises an IMD layer (L2) laminated on the substrate (L0) and to be arranged on the outermost surface of the molded body after the in-mold molding. The TMD layer (L2) is constituted by a mixture composition containing at least one active-energy curable resin and at least one thermosetting resin.
    Type: Application
    Filed: June 18, 2012
    Publication date: April 24, 2014
    Applicant: JNC CORPORATION
    Inventors: Kenya Ito, Koji Ohguma, Takuro Tanaka, Yuka Takahashi, Aki Kuromatsu, Mikio Yamahiro