Abstract: A medical system recommends a posture of a subject during a medical procedure. The medical system includes a processor and an output device. The processor determines suitable postures of the subject during the medical procedure based on at least one of subject information, including information on a posture of the subject obtained upon a predetermined movement by the subject and information on the procedure. The output device presents one or more of the suitable postures determined by the processor as recommended postures.

Abstract: An apparatus enabling abnormality detection of a sample. A first interference optical system scans the sample with first signal light from a first sample optical path, making the first signal light interfere with first reference light from a first reference optical path, to detect first interference light. Optical path length difference between the first sample optical path and first reference optical path is changed based on the detection. A change in the optical path length difference is determined. A second interference optical system scans the sample with second signal light from a second sample optical path, making the second signal light interfere with second reference light from a second reference optical path to detect second interference light. Tomographic information of the sample based on detection of the second interference light is determined. A refractive index profile of the sample is obtained based on the change amount information and tomographic information.

Abstract: In a fundus observation apparatus, an optical system detects interference light generated by superposing signal light having traveled by way of an eye fundus and reference light having traveled by way of a reference optical path. An image forming part forms a cross sectional image based on detection results of the interference light. A specifying part analyzes the cross sectional image to specify an abnormal region located in the vicinity of central fovea of the eye fundus. The association information generating part calculates the distance between the central fovea and the abnormal region and generates association information in which the direction of the abnormal region relative to the central fovea and the distance are associated with each other. The evaluation information generating part generates evaluation information for evaluating the state of the eye fundus based on the association information.

Abstract: An apparatus enabling abnormality detection of a sample. A first interference optical system scans the sample with first signal light from a first sample optical path, making the first signal light interfere with first reference light from a first reference optical path, to detect first interference light. Optical path length difference between the first sample optical path and first reference optical path is changed based on the detection. A change in the optical path length difference is determined. A second interference optical system scans the sample with second signal light from a second sample optical path, making the second signal light interfere with second reference light from a second reference optical path to detect second interference light. Tomographic information of the sample based on detection of the second interference light is determined. A refractive index profile of the sample is obtained based on the change amount information and tomographic information.

Abstract: In a fundus observation apparatus, an optical system detects interference light generated by superposing signal light having traveled by way of an eye fundus and reference light having traveled by way of a reference optical path. An image forming part forms a cross sectional image based on detection results of the interference light. A specifying part analyzes the cross sectional image to specify an abnormal region located in the vicinity of central fovea of the eye fundus. The association information generating part calculates the distance between the central fovea and the abnormal region and generates association information in which the direction of the abnormal region relative to the central fovea and the distance are associated with each other. The evaluation information generating part generates evaluation information for evaluating the state of the eye fundus based on the association information.

Abstract: An ophthalmic observation apparatus 1 performs an OCT measurement of a fundus Ef to form an OCT image, performs an analytical processing on this OCT image, and outputs examination-results information including the analysis results. The ophthalmic observation apparatus 1 is capable of selectively executing a plurality of operation modes. The ophthalmic observation apparatus 1 preliminarily stores operation mode information 214, in which various operational details are associated with each operation mode. When one operation mode is designated, the ophthalmic observation apparatus 1 refers to the operation mode information 214 to identify the operational details associated with this operation mode, and controls an optical system, an image forming part 220, a three-dimensional image forming part 231, an analytic processor 232, a display 240, and/or a printer 300, etc. based on the identified operational details.

Abstract: A control method of an ophthalmic observation apparatus that comprises an analysis means that analyze an image of an eye formed by using OCT, comprising: storing operation mode information in which an operation mode is associated with operational details of at least the analysis means; identifying the operational details associated with the operation mode by referring to the stored operation mode information; and controlling at least the analysis means based on the identified operational details. The analysis means can execute multiple analytic processings including layer-thickness analysis and/or lesion identification analysis. In the operation mode information, the operation mode is associated with at least one of the multiple analytic processings. In the identifying step, the analytic processing that is associated with the operation mode is identified by referring to the operation mode information. In the controlling step, the identified analytic processing is executed by controlling the analysis means.

Abstract: An ophthalmic observation apparatus 1 performs an OCT measurement of a fundus Ef to form an OCT image, performs an analytical processing on this OCT image, and outputs examination-results information including the analysis results. The ophthalmic observation apparatus 1 is capable of selectively executing a plurality of operation modes. The ophthalmic observation apparatus 1 preliminarily stores operation mode information 214, in which various operational details are associated with each operation mode. When one operation mode is designated, the ophthalmic observation apparatus 1 refers to the operation mode information 214 to identify the operational details associated with this operation mode, and controls an optical system, an image forming part 220, a three-dimensional image forming part 231, an analytic processor 232, a display 240, and/or a printer 300, etc. based on the identified operational details.

Abstract: A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (18a, 20a) for adjusting an angle of an aperture.

Abstract: The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.

Abstract: A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.

Abstract: The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.

Abstract: A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.

Abstract: The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.

Abstract: A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.

Abstract: A surface inspection apparatus of the present invention includes an irradiation optical unit having a multibeam irradiation optical unit for converging and irradiating multiple beams upon a surface of an object to be inspected; a detector which has a light-condensing optical unit including light-sensitive elements for respectively receiving the multiple beams reflected by the surface of the inspecting object; and a processor which obtains a plane-coordinate-position of a position to be irradiated and detected at a reference height position based on a difference between light-receiving reference positions of each of the light-sensitive elements when assumed that the irradiated and detected position of the inspecting object is at the reference height position and actual light-receiving positions of each of the light-sensitive elements, according to a result of analysis and process of surface state information.

Abstract: A surface inspection apparatus includes an LD (10 for emitting a laser beam (L0), an irradiation optical system for entering the emitted laser beam (L0) onto an inspection surface (210) of a wafer at predetermined depression angle (?), a scanning device (30) to displace the wafer (200) in order for the laser beam (L0) scans the inspection surface (210) in a spiral, an light intensity detecting device (50) to detect light intensity, and a scattered light detecting optical system (40) for guiding scattered light (L2) emitted from an irradiation area (220) in which the laser beam (L0) is entered. The light intensity detecting device (50) includes a multianode PMT (51) for detecting the light intensity by decomposing the scattered light (L2) into 10 channels (ch) in a one-dimensional direction (Y axis direction).

Abstract: A method for inspecting a surface, including entering a predetermined luminous flux at a predetermined incident angle in an inspected surface of an inspection object which is an object of a surface inspection, displaying relatively at least one of the luminous flux and the inspection object so that the luminous flux scans upon the inspected surface, decomposing spatially light intensity of scattered light reflected on an area of the inspected surface entering the luminous flux into a plurality of channels with respect to an one-dimensional direction corresponding to a predetermined direction in the area of the inspected surface entering the light flux, performing inspection of the inspected surface by detecting individually light intensity of each of the decomposed scattered lights obtained by the decomposition, and increasing uniformity of light intensity distribution with respect to at least the predetermined direction in the area of the inspected surface in which the luminous flux is entered.

Abstract: A surface inspection apparatus of the present invention includes an irradiation optical unit having a multibeam irradiation optical unit for converging and irradiating multiple beams upon a surface of an object to be inspected; a detector which has a light-condensing optical unit including light-sensitive elements for respectively receiving the multiple beams reflected by the surface of the inspecting object; and a processor which obtains a plane-coordinate-position of a position to be irradiated and detected at a reference height position based on a difference between light-receiving reference positions of each of the light-sensitive elements when assumed that the irradiated and detected position of the inspecting object is at the reference height position and actual light-receiving positions of each of the light-sensitive elements, according to a result of analysis and process of surface state information.

Abstract: A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (13a, 13b) for adjusting an angle of an aperture.