Patents by Inventor Akihiro Kawahara

Akihiro Kawahara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11927904
    Abstract: Provided is an electrophotographic belt of an endless shape including a substrate, wherein the substrate contains a polyimide resin and carbon nanotubes, wherein a content of the carbon nanotubes in the substrate is 15 vol % or less with respect to a total volume of the polyimide resin, wherein the substrate has a tensile strength of 200 MPa or more in each of a peripheral direction thereof and a direction perpendicular to the peripheral direction, and wherein the substrate has a thermal conductivity of 0.9 W/(m·K) or more in a thickness direction thereof.
    Type: Grant
    Filed: June 9, 2022
    Date of Patent: March 12, 2024
    Assignee: Canon Kabushiki Kaisha
    Inventors: Akeshi Asaka, Taiki Watanabe, Yuma Kobayashi, Hidetaka Kawamura, Satoru Nishiuma, Akihiro Taya, Ryunosuke Kawahara
  • Publication number: 20240001436
    Abstract: According to the present invention, an additively manufactured ceramic core having both strength and collapsibility, and meltability and moreover having surface roughness improved is provided. The additively manufactured ceramic core disclosed herein is an additively manufactured ceramic core to be used as a core when manufacturing a metal casting and includes a central part corresponding to an additively manufactured fired body of a predetermined ceramic powder, a first layer covering at least a part of the central part, and a second layer formed on a surface layer of the first layer.
    Type: Application
    Filed: November 12, 2021
    Publication date: January 4, 2024
    Applicant: Noritake Co., Limited
    Inventors: Hirokazu Watanabe, Akihiro Kawahara, Tsuyoshi Hondo, Kouji Inukai, Shinji Kato
  • Publication number: 20230330890
    Abstract: Provided is a technique to manufacture an additive manufactured fired body in which the occurrence of deformation or the like is suppressed at a high level. Provided is a method for manufacturing an additive manufactured fired body, the method including a manufacturing step of manufacturing an additive manufactured object by using an additive manufacturing powder, and a firing step of obtaining the additive manufactured fired body by firing the additive manufactured object. In the manufacturing step, a supporter 20 that supports the additive manufactured object 10 is shaped together with the additive manufactured object 10 so as to surround the additive manufactured object 10 by using the additive manufacturing powder.
    Type: Application
    Filed: August 18, 2021
    Publication date: October 19, 2023
    Applicant: Noritake Co., Limited
    Inventors: Tsuyoshi Hondo, Akihiro Kawahara
  • Patent number: 9488904
    Abstract: Provided is a mask blank glass substrate that has high surface smoothness, that is formed with a fiducial mark capable of improving the detection accuracy of a defect position or the like, and that enables reuse or recycling of a glass substrate included therein. An underlayer is formed on a main surface, on the side where a transfer pattern is to be formed, of a glass substrate for a mask blank. The underlayer serves to reduce surface roughness of the main surface of the glass substrate or to reduce defects of the main surface of the glass substrate. A surface of the underlayer is a precision-polished surface. A fiducial mark which provides a reference for a defect position in defect information is formed on the underlayer.
    Type: Grant
    Filed: October 22, 2015
    Date of Patent: November 8, 2016
    Assignee: HOYA CORPORATION
    Inventors: Toshihiko Orihara, Akihiro Kawahara, Tsutomu Shoki
  • Publication number: 20160041462
    Abstract: Provided is a mask blank glass substrate that has high surface smoothness, that is formed with a fiducial mark capable of improving the detection accuracy of a defect position or the like, and that enables reuse or recycling of a glass substrate included therein. An underlayer is formed on a main surface, on the side where a transfer pattern is to be formed, of a glass substrate for a mask blank. The underlayer serves to reduce surface roughness of the main surface of the glass substrate or to reduce defects of the main surface of the glass substrate. A surface of the underlayer is a precision-polished surface. A fiducial mark which provides a reference for a defect position in defect information is formed on the underlayer.
    Type: Application
    Filed: October 22, 2015
    Publication date: February 11, 2016
    Applicant: HOYA CORPORATION
    Inventors: Toshihiko ORIHARA, Akihiro Kawahara, Tsutomu Shoki
  • Patent number: 9195131
    Abstract: Provided is a mask blank glass substrate that has high surface smoothness, that is formed with a fiducial mark capable of improving the detection accuracy of a defect position or the like, and that enables reuse or recycling of a glass substrate included therein. An underlayer is formed on a main surface, on the side where a transfer pattern is to be formed, of a glass substrate for a mask blank. The underlayer serves to reduce surface roughness of the main surface of the glass substrate or to reduce defects of the main surface of the glass substrate. A surface of the underlayer is a precision-polished surface. A fiducial mark which provides a reference for a defect position in defect information is formed on the underlayer.
    Type: Grant
    Filed: September 28, 2012
    Date of Patent: November 24, 2015
    Assignee: HOYA CORPORATION
    Inventors: Toshihiko Orihara, Akihiro Kawahara, Tsutomu Shoki
  • Publication number: 20140071124
    Abstract: An image processing apparatus has a texture mapping unit configured to obtain pixel data including first and second texture coordinates, and generate texel data corresponding to the first and second texture coordinates within a textured image having a gradation pattern based on a non-linear surface. A function of the non-linear surface is defined by a product of first and Bezier curve functions. The texture mapping unit includes first/second Bezier curve function calculation unit configured to calculate the first/second Bezier curve function by obtaining the first/second texture coordinate and control values of the first/second Bezier curve function; a multiplier configured to multiply respective outputs of the first and second Bezier curve function calculation units; and a blending processing unit configured to generate the texel data by blending a plurality of color data corresponding to the gradation pattern using a is multiplication value of the multiplier as a blending ratio.
    Type: Application
    Filed: August 29, 2013
    Publication date: March 13, 2014
    Applicant: FUJITSU SEMICONDUCTOR LIMITED
    Inventor: Akihiro Kawahara
  • Patent number: 8462167
    Abstract: A memory access control circuit includes a first internal register, an address transmitting unit that sets a state of the first internal register to a first state to transmit a first address and sets a state of the first internal register to a second state to transmit a second address, a second internal register, a data receiving unit that sets a state of the second internal register to a third state to receive first data corresponding to the first address, performs data processing on the first data without delay, sets a state of the second internal register to a fourth state to receive second data corresponding to the second address, and performs data processing on the second data after delaying the second data by a given delay time, a first backup unit and a second backup unit.
    Type: Grant
    Filed: October 29, 2009
    Date of Patent: June 11, 2013
    Assignee: Fujitsu Semiconductor Limited
    Inventors: Akihiro Kawahara, Makoto Adachi, Kouji Nishikawa, Masayuki Nakamura, Motonobu Mamiya, Kae Yamashita
  • Patent number: 7938940
    Abstract: A support for an oxygen separation membrane element to support a dense and cylindrical electrolytic membrane having oxygen ion permeability, comprises a base axially extending and having a cylindrical surface extending axially, and a plurality of ribs formed on the cylindrical surface of the base, radially projecting and axially extending, for supporting the electrolytic membrane at their ends being radially distant from the cylindrical surface of the base.
    Type: Grant
    Filed: July 27, 2007
    Date of Patent: May 10, 2011
    Assignees: Noritake Co., Limited, Chubu Electric Power Co., Inc.
    Inventors: Akihiro Kawahara, Shigeo Nagaya, Hiroshi Seo
  • Patent number: 7892708
    Abstract: In a mask blank substrate to be chucked by a mask stage of an exposure system, the flatness of a rectangular flatness measurement area excluding an area of 2 mm inward from an outer peripheral end surface on a main surface of the mask blank substrate on its side to be chucked by the mask stage is 0.6 ?m or less, and at least three of four corner portions of the flatness measurement area each have a shape that rises toward the outer peripheral side.
    Type: Grant
    Filed: June 9, 2010
    Date of Patent: February 22, 2011
    Assignee: Hoya Corporation
    Inventors: Masaru Tanabe, Atsushi Kawaguchi, Hiroyuki Akagawa, Akihiro Kawahara
  • Publication number: 20100248092
    Abstract: In a mask blank substrate to be chucked by a mask stage of an exposure system, the flatness of a rectangular flatness measurement area excluding an area of 2 mm inward from an outer peripheral end surface on a main surface of the mask blank substrate on its side to be chucked by the mask stage is 0.6 ?m or less, and at least three of four corner portions of the flatness measurement area each have a shape that rises toward the outer peripheral side.
    Type: Application
    Filed: June 9, 2010
    Publication date: September 30, 2010
    Applicant: HOYA CORPORATION
    Inventors: Masaru TANABE, Atsushi KAWAGUCHI, Hiroyuki AKAGAWA, Akihiro KAWAHARA
  • Patent number: 7745074
    Abstract: In a mask blank substrate to be chucked by a mask stage of an exposure system, the flatness of a rectangular flatness measurement area excluding an area of 2 mm inward from an outer peripheral end surface on a main surface of the mask blank substrate on its side to be chucked by the mask stage is 0.6 ?m or less, and at least three of four corner portions of the flatness measurement area each have a shape that rises toward the outer peripheral side.
    Type: Grant
    Filed: August 13, 2009
    Date of Patent: June 29, 2010
    Assignee: Hoya Corporation
    Inventors: Masaru Tanabe, Atsushi Kawaguchi, Hiroyuki Akagawa, Akihiro Kawahara
  • Publication number: 20100123728
    Abstract: A memory access control circuit includes a first internal register, an address transmitting unit that sets a state of the first internal register to a first state to transmit a first address and sets a state of the first internal register to a second state to transmit a second address, a second internal register, a data receiving unit that sets a state of the second internal register to a third state to receive first data corresponding to the first address, performs data processing on the first data without delay, sets a state of the second internal register to a fourth state to receive second data corresponding to the second address, and performs data processing on the second data after delaying the second data by a given delay time, a first backup unit and a second backup unit.
    Type: Application
    Filed: October 29, 2009
    Publication date: May 20, 2010
    Applicant: FUJITSU MICROELECTRONICS LIMITED
    Inventors: Akihiro KAWAHARA, Makoto Adachi, Kouji Nishikawa, Masayuki Nakamura, Motonobu Mamiya, Kae Yamashita
  • Publication number: 20100035164
    Abstract: In a mask blank substrate to be chucked by a mask stage of an exposure system, the flatness of a rectangular flatness measurement area excluding an area of 2 mm inward from an outer peripheral end surface on a main surface of the mask blank substrate on its side to be chucked by the mask stage is 0.6 ?m or less, and at least three of four corner portions of the flatness measurement area each have a shape that rises toward the outer peripheral side.
    Type: Application
    Filed: August 13, 2009
    Publication date: February 11, 2010
    Inventors: Masaru TANABE, Atsushi Kawaguchi, Hiroyuki Akagawa, Akihiro Kawahara
  • Patent number: 7635544
    Abstract: In a transparent substrate for a mask blank, which is required to have a predetermined optical characteristic, a substrate mark is formed by cutting off a predetermined corner portion into an oblique section. The shape of the mark is determined in accordance with the optical characteristic of he substrate.
    Type: Grant
    Filed: September 13, 2005
    Date of Patent: December 22, 2009
    Assignee: Hoya Corporation
    Inventors: Kesahiro Koike, Osamu Suzuki, Akihiro Kawahara
  • Publication number: 20090280415
    Abstract: In a transparent substrate for a mask blank, which is required to have a predetermined optical characteristic, a substrate mark is formed by cutting off a predetermined corner portion into an oblique section. The shape of the mark is determined in accordance with the optical characteristic of he substrate.
    Type: Application
    Filed: July 20, 2009
    Publication date: November 12, 2009
    Inventors: KESAHIRO KOIKE, OSAMU SUZUKI, AKIHIRO KAWAHARA
  • Patent number: 7592104
    Abstract: In a mask blank substrate to be chucked by a mask stage of an exposure system, the flatness of a rectangular flatness measurement area excluding an area of 2 mm inward from an outer peripheral end surface on a main surface of the mask blank substrate on its side to be chucked by the mask stage is 0.6 ?m or less, and at least three of four corner portions of the flatness measurement area each have a shape that rises toward the outer peripheral side.
    Type: Grant
    Filed: September 29, 2005
    Date of Patent: September 22, 2009
    Assignee: Hoya Corporation
    Inventors: Masaru Tanabe, Atsushi Kawaguchi, Hiroyuki Akagawa, Akihiro Kawahara
  • Publication number: 20080078675
    Abstract: A support for an oxygen separation membrane element to support a dense and cylindrical electrolytic membrane having oxygen ion permeability, comprises a base axially extending and having a cylindrical surface extending axially, and a plurality of ribs formed on the cylindrical surface of the base, radially projecting and axially extending, for supporting the electrolytic membrane at their ends being radially distant from the cylindrical surface of the base.
    Type: Application
    Filed: July 27, 2007
    Publication date: April 3, 2008
    Applicants: NORITAKE CO., LIMITED, CHUBU ELECTRIC POWER CO., INC.
    Inventors: Akihiro Kawahara, Shigeo Nagaya, Hiroshi Seo
  • Patent number: 7326936
    Abstract: An infrared detector includes a silicon substrate, an infrared reflecting film, a diaphragm including a bolometer thin film, disposed above the silicon substrate across a gap, and a signal line that electrically connects the bolometer thin film and the infrared reflecting film, such that the bolometer thin film and the infrared reflecting film constantly become equipotential with each other. In place of the signal line, a conductor independently provided from interconnects in the silicon substrate may be employed.
    Type: Grant
    Filed: June 3, 2005
    Date of Patent: February 5, 2008
    Assignees: NEC Electronics Corporation, NEC Corporation
    Inventors: Katsuya Kawano, Akihiro Kawahara
  • Publication number: 20060068300
    Abstract: In a mask blank substrate to be chucked by a mask stage of an exposure system, the flatness of a rectangular flatness measurement area excluding an area of 2 mm inward from an outer peripheral end surface on a main surface of the mask blank substrate on its side to be chucked by the mask stage is 0.6 ?m or less, and at least three of four corner portions of the flatness measurement area each have a shape that rises toward the outer peripheral side.
    Type: Application
    Filed: September 29, 2005
    Publication date: March 30, 2006
    Inventors: Masaru Tanabe, Atsushi Kawaguchi, Hiroyuki Akagawa, Akihiro Kawahara