Patents by Inventor Akihiro Nakano

Akihiro Nakano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090319756
    Abstract: The present invention provides a duplexed operation processor control system that includes operation processors, an I/O device, and at least one communication path that couples the operation processors to the I/O device, and at least one communication path that couples the operation processors with each other. The duplexed operation processor control system switches over either of the operation processors to be a primary operation processor that executes a control operation for a control target, and the other to be a secondary operation processor that is in a stand-by state, and the secondary operation processor snoops control data synchronously when the primary operation processor acquires the control data from the control target.
    Type: Application
    Filed: June 18, 2009
    Publication date: December 24, 2009
    Inventors: Toshiki Shimizu, Akira Bando, Yusaku Otsuka, Yasuhiro Kiyofuji, Elji Kobayashi, Akihiro Onozuka, Satoru Funaki, Masakazu Ishikawa, Hideaki Masuko, Yusuke Seki, Wataru Sasaki, Naoya Mashiko, Akihiro Nakano, Shin Kokura, Shoichi Ozawa, Yu Iwasaki
  • Publication number: 20080013475
    Abstract: In a control apparatus which transmits/receives data from a central processing unit via a serial transfer channel to a communication control unit, and groups/distributes data of input/output units from the communication control unit via a parallel transfer channel, the control apparatus initiates a diagnosing unit of the parallel transfer channel in response to an instruction issued from the central processing unit, and diagnosis the input/output units subsequent to the diagnosis of the transmission channel. Data input/output timing of the input/output unit is also instructed from the central processing unit, so that the central processing unit can suppress lowering of response speeds caused by the diagnoses, and can maintain the periodicity of the data input/output.
    Type: Application
    Filed: June 28, 2007
    Publication date: January 17, 2008
    Inventors: Akira Bandou, Masamitsu Kobayashi, Masahiro Shiraishi, Akihiro Onozuka, Takashi Umehara, Shin Kokura, Eiji Kobayashi, Masakazu Ishikawa, Yasuyuki Furuta, Naoya Mashiko, Satoru Funaki, Yuusuke Seki, Tatsuyuki Ootani, Wataru Sasaki, Yusaku Otsuka, Akihiro Nakano, Shoichi Ozawa, Takenori Kasahara, Yu Iwasaki
  • Publication number: 20070193350
    Abstract: A volume measuring apparatus is provided with: an acoustic tube whose one end is communicated with a container in which an object to be measured is contained; another container communicated with the other end of the acoustic tube; a partition chamber which defines a sealed space disposed adjacent to the another container and which includes a partition plate for dividing the sealed space and an inner space of the another container; and an electromotive-type speaker which is disposed in the sealed space and whose acoustic wave output surface is disposed opposite to the partition plate. A processing device obtains a volume of the object to be measured, on the basis of an acoustic signal associated with an acoustic wave outputted into the another container via the partition plate from the acoustic wave output surface.
    Type: Application
    Filed: March 23, 2005
    Publication date: August 23, 2007
    Applicants: KYOTO UNIVERSITY, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, JAPAN SPACE FORUM, MAYEKAWA MFG. CO., LTD.
    Inventors: Takahisa Nishizu, Akihiro Nakano, Yasuo Torikata, Tomoki Yamashita
  • Patent number: 6806438
    Abstract: A plasma processing apparatus comprising a plurality of plasma processing units is provided. Each of the plasma processing units has a matching circuit connected between a radiofrequency generator and a plasma excitation electrode. Among these plasma processing units, a variation <RA> between the maximum and minimum values of input-terminal-side AC resistances RA of the matching circuits defined by <RA>=(RAmax−RAmin)/(RAmax+RAmin) is adjusted to be less than 0.5. A variation between the maximum and minimum values of output-terminal-side AC resistances RB of the matching circuits defined by <RB>=(RBmax−RBmin)/(RBmax+RBmin) is also adjusted to be less than 0.5. The plasma processing units can be adjusted to achieve substantially uniform plasma results in a shorter period of time.
    Type: Grant
    Filed: November 6, 2001
    Date of Patent: October 19, 2004
    Assignee: Alps Electric Co., Ltd.
    Inventors: Akihiro Nakano, Tadahiro Ohmi
  • Patent number: 6748199
    Abstract: A portable telephone apparatus includes a reference frequency generating section capable of suitably changing frequency accuracy of an output signal in accordance with an input control voltage, and a high-accurate reference frequency generating section having accuracy for a temperature change extremely higher than that of the reference frequency generating section and in which output frequency accuracy thereof changes only within a range of prescribed values. A determination device determines whether or not frequency accuracy of an output signal from the reference frequency generating section meets the prescribed value. A selector selects an output signal from the reference frequency generating section in a case that a determination result of the determination device meets the prescribed value, and selects an output signal from the high-accurate reference frequency generating section in a case that a determination result of the determination device does not meet the prescribed value.
    Type: Grant
    Filed: January 19, 2001
    Date of Patent: June 8, 2004
    Assignee: NEC Corporation
    Inventor: Akihiro Nakano
  • Patent number: 6581452
    Abstract: Volume measuring apparatus is used in a closed space as in the case of volume measurement of liquid in a container placed on an orbit of an artificial satellite and permits the volume measurement in a state without mixture with gas, liquid, or solid. A volume measuring apparatus is an apparatus for measuring the volume of liquid or solid under microgravity, which has two or more containers coupled to each other by a pipe, a device for separating or fixing a gas phase, a liquid phase, or a solid phase, a pressure fluctuation source, a pressure signal receiver, a pressure gage, and a thermometer, wherein the separating or fixing device, the pressure fluctuation source, the pressure signal receiver, the pressure gage, and the thermometer are placed in the containers and wherein the pressure fluctuation source, the pressure signal receiver, the pressure gage, and the thermometer are connected to a signal analyzing unit.
    Type: Grant
    Filed: March 19, 2002
    Date of Patent: June 24, 2003
    Assignees: Agency of Industrial Science and Technology, Japan Space Forum, National Space Development Agency of Japan
    Inventors: Akihiro Nakano, Nobukazu Ohnishi
  • Publication number: 20030000299
    Abstract: Volume measuring apparatus is used in a closed space as in the case of volume measurement of liquid in a container placed on an orbit of an artificial satellite and permits the volume measurement in a state without mixture with gas, liquid, or solid. A volume measuring apparatus is an apparatus for measuring the volume of liquid or solid under microgravity, which has two or more containers coupled to each other by a pipe, a device for separating or fixing a gas phase, a liquid phase, or a solid phase, a pressure fluctuation source, a pressure signal receiver, a pressure gage, and a thermometer, wherein the separating or fixing device, the pressure fluctuation source, the pressure signal receiver, the pressure gage, and the thermometer are placed in the containers and wherein the pressure fluctuation source, the pressure signal receiver, the pressure gage, and the thermometer are connected to a signal analyzing unit.
    Type: Application
    Filed: March 19, 2002
    Publication date: January 2, 2003
    Inventors: Akihiro Nakano, Nobukazu Ohnishi
  • Patent number: 6422294
    Abstract: To obtain a high-quality cast product of a cylinder head, a proper directivity to the cooling process of the molten metal after a pouring process by utilizing the shape of a cylinder head is discussed. In a process where molten metal is injected to a casting mold cavity formed between upper and lower molds to fill it therewith so that the molten metal is solidified to form a cylinder head of an engine, a plurality of core protrusions corresponding to holes (plug holes and bolt holes) are formed in the upper mold, and a cooling means is attached to each of the core protrusions. With respect to cooling means attached to the plurality of core protrusions, those attached to the inner core protrusions comparatively closer to the center of the casting mold are designed so as to have a greater cooling capability than those attached to the outer core protrusions; therefore, with respect to the center portion and the outer portion of the casting mold cavity.
    Type: Grant
    Filed: December 15, 2000
    Date of Patent: July 23, 2002
    Assignee: Mazda Motor Corporation
    Inventors: Akira Murata, Akihiro Nakano, Nobuyuki Matsubayashi, Takayuki Shouju, Tomoyuki Nozaki, Shigeo Yano
  • Publication number: 20020088400
    Abstract: A plasma processing apparatus comprising a plurality of plasma processing units is provided. Each of the plasma processing units has a matching circuit connected between a radiofrequency generator and a plasma excitation electrode. Among these plasma processing units, a variation <RA> between the maximum and minimum values of input-terminal-side AC resistances RA of the matching circuits defined by <RA>=(RAmax−RAmin)/(RAmax+RAmin) is adjusted to be less than 0.5. A variation between the maximum and minimum values of output-terminal-side AC resistances RB of the matching circuits defined by <RB>=(RBmax−RBmin)/(RBmax+RBmin) is also adjusted to be less than 0.5. The plasma processing units can be adjusted to achieve substantially uniform plasma results in a shorter period of time.
    Type: Application
    Filed: November 6, 2001
    Publication date: July 11, 2002
    Applicant: Alps Electric Co., Ltd.
    Inventors: Akihiro Nakano, Tadahiro Ohmi
  • Publication number: 20010014590
    Abstract: A reference frequency generating section 10 capable of suitably changing frequency accuracy of an output signal in accordance with an input control voltage, and a high-accurate reference frequency generating section 13 having accuracy for a temperature change extremely higher than that of the reference frequency generating section 10 and in which output frequency accuracy thereof changes only within a range of prescribed values (frequency accuracy within a range where transmission and reception of a portable telephone can be conducted) are provided. A reference frequency after an AFC operation, which is output from the reference frequency generating section 10, is compared with an output signal from the high-accurate reference frequency generating section 13, and whether or not frequency accuracy of an output signal from the reference frequency generating section 10 meets a prescribed value is determined.
    Type: Application
    Filed: January 19, 2001
    Publication date: August 16, 2001
    Inventor: Akihiro Nakano
  • Patent number: 6214136
    Abstract: The film boiling state of a refrigerant is maintained for a time longer than in the prior art by t to lower the nuclear boiling start temperature to a temperature at which the material proof strength of a work exceeds thermal stress, thereby lowering the cooling rate of the work. In addition, by controlling the cooling rate in hardening, the film boiling state of the refrigerant is maintained to a temperature at which the material proof strength exceeds thermal stress, thereby cooling the work at a temperature equal to or higher than the critical cooling rate of the work.
    Type: Grant
    Filed: July 29, 1998
    Date of Patent: April 10, 2001
    Assignee: Mazda Motor Corporation
    Inventors: Kazuyuki Yoshimoto, Ryoji Abe, Yukihiro Sugimoto, Fuminori Ishimura, Yukio Yamamoto, Nobuyuki Oda, Yukiyoshi Fukuda, Toshio Miyatani, Hiroshi Kodama, Akihiro Nakano
  • Patent number: 6147923
    Abstract: An NMOS capacitor 13 and a PMOS capacitor 18 for pumping up are connected in series to an output line 12. In middle point voltage control circuit 20, a power supply line at VCC is connected via a PMOS transistor 21 to the anode of a reverse-flow preventing diode 22 and the node of voltage VM, the cathode of the diode 22 is connected via an NMOS transistor 23 to a ground line, and control signals *BIN and AIN are provided to the gate electrodes of the transistors 21 and 23, respectively, in response to an address transition detection signal AT. An end point voltage control circuit 30 is connected between the gate electrode of the NMOS transistor 23 and one end of the PMOS capacitor 18, and is equipped with inverters 31 and 32 connected in series. In an initial state, VM is at 0V and VE and VOUT is at VCC. Next the node of VM becomes a floating state and VE is lowered to 0V. Finally the node of VM is raised to VCC to boost VOUT from VCC up to VCC(2+.alpha.), where 0<.alpha.<1.
    Type: Grant
    Filed: June 30, 1999
    Date of Patent: November 14, 2000
    Assignee: Fujitsu Limited
    Inventor: Akihiro Nakano
  • Patent number: 5917366
    Abstract: Disclosed is a voltage booster or drop circuit. The voltage booster or drop circuit includes: a plurality of diode devices connected in series; a plurality of capacitors, first electrodes of which are connected to connection points of the diode devices, for which a pulse signal is supplied to second electrodes of the capacitors and a raised voltage or dropped voltage is output to the last stage of the diode devices; and pulse generation device. The pulse generation device supplies a first pulse signal to the second electrodes of odd numbered capacitors and supplies a second pulse signal, the phase of which is opposite that of the first pulse signal, to the second electrodes of even numbered capacitors.
    Type: Grant
    Filed: July 24, 1997
    Date of Patent: June 29, 1999
    Assignee: Fujitsu Limited
    Inventor: Akihiro Nakano
  • Patent number: 5611388
    Abstract: A casting mold for a low-pressure casting apparatus can be opened and closed and is closed to form therein a cavity which is filled with molten metal to form a cast product. The casting mold includes an upper mold of metal, a lower mold of metal and a sand mold which is disposed between the upper and lower molds and forms a part of the cavity. A top wall of the cavity is formed by a lower surface of the upper mold, at least a part of a side wall of the cavity is formed by the sand mold so that the upper mold contacts with the molten metal filled in the cavity in a larger area than the lower mold.
    Type: Grant
    Filed: August 31, 1994
    Date of Patent: March 18, 1997
    Assignee: Mazda Motor Corporation
    Inventors: Hirofumi Fukuoka, Junzou Fujiya, Yoshiaki Uena, Akihiro Nakano