Patents by Inventor Akihiro NIWA
Akihiro NIWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11977707Abstract: Each of first electrode sections forming a transmission electrode includes a first main line and a plurality of first auxiliary lines. Each of second electrode sections forming a reception electrode includes a second main line and a plurality of second auxiliary lines. With the transmission and reception electrodes and overlapping each other, the first main line and the second main line intersect with each other at one point, and a cell region is unclosed. The cell region is surrounded by two or more types of thin wires selected from a group consisting of the first main line, the first auxiliary lines, the second main line, and the second auxiliary lines.Type: GrantFiled: October 18, 2021Date of Patent: May 7, 2024Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Hiromitsu Niwa, Kota Araki, Akihiro Yamamura, Hiroaki Nishiono
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Patent number: 11632851Abstract: A plasma emitting device includes plasma head configured to generate a plasmarized gas and jet the plasmarized gas so generated from a nozzle thereof, a gas supply device configured to supply a gas to the plasma head while controlling a flow rate of the gas, gas tube connecting the gas supply device with the plasma head to constitute a gas flow path, and pressure detector configured to detect a pressure of the gas supplied from the gas supply deice. Pressures of gases which are supplied to the plasma head are detected for use for various purposes, whereby the practical plasma emitting device is made up. Specifically, for example, a head clogging, which is a clog impeding a gas flow in the plasma head, can be determined without difficulty based on the detected pressure.Type: GrantFiled: December 20, 2017Date of Patent: April 18, 2023Assignee: FUJI CORPORATIONInventors: Takahiro Jindo, Toshiyuki Ikedo, Shinji Takikawa, Akihiro Niwa
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Publication number: 20210276054Abstract: An object of the present invention is to provide a technique capable of removing oil regardless of a shape of a target object to which the oil is attached. Cutting oil is decomposed by irradiating the cutting oil with a plasma gas containing oxygen plasma. Oxygen radicals decompose a carbon element and a hydrogen element constituting the oil into carbon dioxide and water, respectively, to remove the oil. Therefore, paraffin and ester contained in the cutting oil can be decomposed by irradiating the cutting oil with the plasma gas containing oxygen plasma. Since the plasma gas can flow along a shape of a target object, the oil can be removed regardless of a shape of a portion of the target object to which the oil is attached.Type: ApplicationFiled: August 2, 2018Publication date: September 9, 2021Applicant: FUJI CORPORATIONInventors: Takahiro JINDO, Takuya IWATA, Akihiro NIWA, Akihiro HIGASHIDA
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Patent number: 10980101Abstract: An atmospheric pressure plasma generating device includes a nozzle block in which fourth gas passages from which plasma gas is emitted are formed, is covered by cover, and a through-hole is formed in the cover such that the leading end of the fourth gas passage is positioned on the inside. Heated gas is supplied inside the cover and is emitted from the through-hole of the cover, and plasma gas is emitted so as to penetrate the heated gas. By the plasma gas being surrounded by the heated gas in this manner, deactivation of the plasma gas is prevented. A distance between the leading end of the fourth gas passage and an opening of the through-hole at an outer wall of the cover is set from 0 to 2 mm in an emission direction of the plasma gas.Type: GrantFiled: June 2, 2015Date of Patent: April 13, 2021Assignee: FUJI CORPORATIONInventors: Akihiro Niwa, Takahiro Jindo
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Patent number: 10950420Abstract: An atmospheric pressure plasma device including a plasma head; a gas tube configured to supply a gas to the plasma head; a flow rate controller configured to control a flow rate of the gas supplied to the gas tube; a pressure sensor arranged downstream of the flow rate controller and configured to detect a pressure in the gas tube; and a determining section configured to determine a state of the device based on how the pressure in the gas tube deviates from a standard value specified for each flow rate of the supplied gas. As a result, it is possible to determine the gas leakage of the atmospheric pressure plasma device. Further, it is possible to determine whether plasma is being generated in a favorable state.Type: GrantFiled: April 4, 2017Date of Patent: March 16, 2021Assignee: FUJI CORPORATIONInventors: Takahiro Jindo, Toshiyuki Ikedo, Akihiro Niwa
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Publication number: 20200396821Abstract: A plasma emitting device includes plasma head configured to generate a plasmarized gas and jet the plasmarized gas so generated from a nozzle thereof, a gas supply device configured to supply a gas to the plasma head while controlling a flow rate of the gas, gas tube connecting the gas supply device with the plasma head to constitute a gas flow path, and pressure detector configured to detect a pressure of the gas supplied from the gas supply device. Pressures of gases which are supplied to the plasma head are detected for use for various purposes, whereby the practical plasma emitting device is made up. Specifically, for example, a head clogging, which is a clog impeding a gas flow in the plasma head, can be determined without difficulty based on the detected pressure.Type: ApplicationFiled: December 20, 2017Publication date: December 17, 2020Applicant: FUJl CORPORATIONInventors: Takahiro JINDO, Toshiyuki IKEDO, Shinji TAKIKAWA, Akihiro NIWA
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Publication number: 20200118801Abstract: An atmospheric pressure plasma device including a plasma head; a gas tube configured to supply a gas to the plasma head; a flow rate controller configured to control a flow rate of the gas supplied to the gas tube; a pressure sensor arranged downstream of the flow rate controller and configured to detect a pressure in the gas tube; and a determining section configured to determine a state of the device based on how the pressure in the gas tube deviates from a standard value specified for each flow rate of the supplied gas. As a result, it is possible to determine the gas leakage of the atmospheric pressure plasma device. Further, it is possible to determine whether plasma is being generated in a favorable state.Type: ApplicationFiled: April 4, 2017Publication date: April 16, 2020Applicant: FUJI CORPORATIONInventors: Takahiro JINDO, Toshiyuki IKEDO, Akihiro NIWA
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Patent number: 10343132Abstract: Water is flowed inside main body section formed from an insulating material such that a specified space remains inside the main body section. Electrodes and are arranged along the outer walls of the main body section and voltage is applied to the electrodes. Processing gas present inside the main body section is plasmarized and plasma is emitted to the water flowing inside the main body section.Type: GrantFiled: May 30, 2014Date of Patent: July 9, 2019Assignee: FUJI CORPORATIONInventors: Akihiro Niwa, Takahiro Jindo, Toshiyuki Ikedo
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Publication number: 20180146537Abstract: With an atmospheric pressure plasma generating device of the present invention, nozzle block 36 in which fourth gas passages 66 from which plasma gas is emitted are formed, is covered by cover 22, and through-hole 70 is formed in the cover such that the leading end of the fourth gas passage is positioned on the inside. Heated gas is supplied inside the cover. Thus, heated gas is emitted from the through-hole of the cover, and plasma gas is emitted so as to penetrate the heated gas. By the plasma gas being surrounded by the heated gas in this manner, deactivation of the plasma gas is prevented. Also, distance X between the leading end of the fourth gas passage and an opening of the through-hole at an outer wall of the cover is set from 0 to 2 mm in an emission direction of the plasma gas. By this, it is possible to appropriately cover plasma gas with heated gas without obstructing the flow of the plasma gas.Type: ApplicationFiled: June 2, 2015Publication date: May 24, 2018Applicant: FUJI MACHINE MFG. CO., LTD.Inventors: Akihiro NIWA, Takahiro JINDO
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Publication number: 20170182473Abstract: Water is flowed inside main body section formed from an insulating material such that a specified space remains inside the main body section. Electrodes and are arranged along the outer walls of the main body section and voltage is applied to the electrodes. Processing gas present inside the main body section is plasmarized and plasma is emitted to the water flowing inside the main body section.Type: ApplicationFiled: May 30, 2014Publication date: June 29, 2017Applicant: FUJI MACHINE MFG. CO., LTD.Inventors: Akihiro NIWA, Takahiro JINDO, Toshiyuki IKEDO