Patents by Inventor Akihiro NIWA

Akihiro NIWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11977707
    Abstract: Each of first electrode sections forming a transmission electrode includes a first main line and a plurality of first auxiliary lines. Each of second electrode sections forming a reception electrode includes a second main line and a plurality of second auxiliary lines. With the transmission and reception electrodes and overlapping each other, the first main line and the second main line intersect with each other at one point, and a cell region is unclosed. The cell region is surrounded by two or more types of thin wires selected from a group consisting of the first main line, the first auxiliary lines, the second main line, and the second auxiliary lines.
    Type: Grant
    Filed: October 18, 2021
    Date of Patent: May 7, 2024
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Hiromitsu Niwa, Kota Araki, Akihiro Yamamura, Hiroaki Nishiono
  • Patent number: 11632851
    Abstract: A plasma emitting device includes plasma head configured to generate a plasmarized gas and jet the plasmarized gas so generated from a nozzle thereof, a gas supply device configured to supply a gas to the plasma head while controlling a flow rate of the gas, gas tube connecting the gas supply device with the plasma head to constitute a gas flow path, and pressure detector configured to detect a pressure of the gas supplied from the gas supply deice. Pressures of gases which are supplied to the plasma head are detected for use for various purposes, whereby the practical plasma emitting device is made up. Specifically, for example, a head clogging, which is a clog impeding a gas flow in the plasma head, can be determined without difficulty based on the detected pressure.
    Type: Grant
    Filed: December 20, 2017
    Date of Patent: April 18, 2023
    Assignee: FUJI CORPORATION
    Inventors: Takahiro Jindo, Toshiyuki Ikedo, Shinji Takikawa, Akihiro Niwa
  • Publication number: 20210276054
    Abstract: An object of the present invention is to provide a technique capable of removing oil regardless of a shape of a target object to which the oil is attached. Cutting oil is decomposed by irradiating the cutting oil with a plasma gas containing oxygen plasma. Oxygen radicals decompose a carbon element and a hydrogen element constituting the oil into carbon dioxide and water, respectively, to remove the oil. Therefore, paraffin and ester contained in the cutting oil can be decomposed by irradiating the cutting oil with the plasma gas containing oxygen plasma. Since the plasma gas can flow along a shape of a target object, the oil can be removed regardless of a shape of a portion of the target object to which the oil is attached.
    Type: Application
    Filed: August 2, 2018
    Publication date: September 9, 2021
    Applicant: FUJI CORPORATION
    Inventors: Takahiro JINDO, Takuya IWATA, Akihiro NIWA, Akihiro HIGASHIDA
  • Patent number: 10980101
    Abstract: An atmospheric pressure plasma generating device includes a nozzle block in which fourth gas passages from which plasma gas is emitted are formed, is covered by cover, and a through-hole is formed in the cover such that the leading end of the fourth gas passage is positioned on the inside. Heated gas is supplied inside the cover and is emitted from the through-hole of the cover, and plasma gas is emitted so as to penetrate the heated gas. By the plasma gas being surrounded by the heated gas in this manner, deactivation of the plasma gas is prevented. A distance between the leading end of the fourth gas passage and an opening of the through-hole at an outer wall of the cover is set from 0 to 2 mm in an emission direction of the plasma gas.
    Type: Grant
    Filed: June 2, 2015
    Date of Patent: April 13, 2021
    Assignee: FUJI CORPORATION
    Inventors: Akihiro Niwa, Takahiro Jindo
  • Patent number: 10950420
    Abstract: An atmospheric pressure plasma device including a plasma head; a gas tube configured to supply a gas to the plasma head; a flow rate controller configured to control a flow rate of the gas supplied to the gas tube; a pressure sensor arranged downstream of the flow rate controller and configured to detect a pressure in the gas tube; and a determining section configured to determine a state of the device based on how the pressure in the gas tube deviates from a standard value specified for each flow rate of the supplied gas. As a result, it is possible to determine the gas leakage of the atmospheric pressure plasma device. Further, it is possible to determine whether plasma is being generated in a favorable state.
    Type: Grant
    Filed: April 4, 2017
    Date of Patent: March 16, 2021
    Assignee: FUJI CORPORATION
    Inventors: Takahiro Jindo, Toshiyuki Ikedo, Akihiro Niwa
  • Publication number: 20200396821
    Abstract: A plasma emitting device includes plasma head configured to generate a plasmarized gas and jet the plasmarized gas so generated from a nozzle thereof, a gas supply device configured to supply a gas to the plasma head while controlling a flow rate of the gas, gas tube connecting the gas supply device with the plasma head to constitute a gas flow path, and pressure detector configured to detect a pressure of the gas supplied from the gas supply device. Pressures of gases which are supplied to the plasma head are detected for use for various purposes, whereby the practical plasma emitting device is made up. Specifically, for example, a head clogging, which is a clog impeding a gas flow in the plasma head, can be determined without difficulty based on the detected pressure.
    Type: Application
    Filed: December 20, 2017
    Publication date: December 17, 2020
    Applicant: FUJl CORPORATION
    Inventors: Takahiro JINDO, Toshiyuki IKEDO, Shinji TAKIKAWA, Akihiro NIWA
  • Publication number: 20200118801
    Abstract: An atmospheric pressure plasma device including a plasma head; a gas tube configured to supply a gas to the plasma head; a flow rate controller configured to control a flow rate of the gas supplied to the gas tube; a pressure sensor arranged downstream of the flow rate controller and configured to detect a pressure in the gas tube; and a determining section configured to determine a state of the device based on how the pressure in the gas tube deviates from a standard value specified for each flow rate of the supplied gas. As a result, it is possible to determine the gas leakage of the atmospheric pressure plasma device. Further, it is possible to determine whether plasma is being generated in a favorable state.
    Type: Application
    Filed: April 4, 2017
    Publication date: April 16, 2020
    Applicant: FUJI CORPORATION
    Inventors: Takahiro JINDO, Toshiyuki IKEDO, Akihiro NIWA
  • Patent number: 10343132
    Abstract: Water is flowed inside main body section formed from an insulating material such that a specified space remains inside the main body section. Electrodes and are arranged along the outer walls of the main body section and voltage is applied to the electrodes. Processing gas present inside the main body section is plasmarized and plasma is emitted to the water flowing inside the main body section.
    Type: Grant
    Filed: May 30, 2014
    Date of Patent: July 9, 2019
    Assignee: FUJI CORPORATION
    Inventors: Akihiro Niwa, Takahiro Jindo, Toshiyuki Ikedo
  • Publication number: 20180146537
    Abstract: With an atmospheric pressure plasma generating device of the present invention, nozzle block 36 in which fourth gas passages 66 from which plasma gas is emitted are formed, is covered by cover 22, and through-hole 70 is formed in the cover such that the leading end of the fourth gas passage is positioned on the inside. Heated gas is supplied inside the cover. Thus, heated gas is emitted from the through-hole of the cover, and plasma gas is emitted so as to penetrate the heated gas. By the plasma gas being surrounded by the heated gas in this manner, deactivation of the plasma gas is prevented. Also, distance X between the leading end of the fourth gas passage and an opening of the through-hole at an outer wall of the cover is set from 0 to 2 mm in an emission direction of the plasma gas. By this, it is possible to appropriately cover plasma gas with heated gas without obstructing the flow of the plasma gas.
    Type: Application
    Filed: June 2, 2015
    Publication date: May 24, 2018
    Applicant: FUJI MACHINE MFG. CO., LTD.
    Inventors: Akihiro NIWA, Takahiro JINDO
  • Publication number: 20170182473
    Abstract: Water is flowed inside main body section formed from an insulating material such that a specified space remains inside the main body section. Electrodes and are arranged along the outer walls of the main body section and voltage is applied to the electrodes. Processing gas present inside the main body section is plasmarized and plasma is emitted to the water flowing inside the main body section.
    Type: Application
    Filed: May 30, 2014
    Publication date: June 29, 2017
    Applicant: FUJI MACHINE MFG. CO., LTD.
    Inventors: Akihiro NIWA, Takahiro JINDO, Toshiyuki IKEDO