Patents by Inventor Akikazu Okawara

Akikazu Okawara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical axis adjusting mechanism for X-ray lens, X-ray analytical instrument, and method of adjusting optical axis of X-ray lens
    Patent number: 7289597
    Abstract: An optical axis adjusting mechanism for an X-ray lens, an X-ray analytical instrument and a method of adjusting an optical axis of an X-ray lens, capable of enhancing detection efficiency of an X-ray while preventing degradation of the device performance are provided. An optical axis adjusting mechanism for an X-ray lens to be implemented in an X-ray analytical instrument, includes an exit side adjusting mechanism for adjusting an exit side focal point of the X-ray lens to focus on an X-ray detector, and an entrance side adjusting mechanism for adjusting an entrance side focal point of the X-ray lens to focus on an analytical point of a sample, and the entrance side adjusting mechanism is disposed with a greater distance from the X-ray lens than a distance between the exit side adjusting mechanism and the X-ray lens.
    Type: Grant
    Filed: March 24, 2006
    Date of Patent: October 30, 2007
    Assignee: SII NanoTechnology Inc.
    Inventors: Norio Sasayama, Akikazu Okawara, Satoshi Nakayama
  • Optical axis adjusting mechanism for X-ray lens, X-ray analytical instrument, and method of adjusting optical axis of X-ray lens
    Publication number: 20060226340
    Abstract: An optical axis adjusting mechanism for an X-ray lens, an X-ray analytical instrument and a method of adjusting an optical axis of an X-ray lens, capable of enhancing detection efficiency of an X-ray while preventing degradation of the device performance are provided. An optical axis adjusting mechanism for an X-ray lens to be implemented in an X-ray analytical instrument, includes an exit side adjusting mechanism for adjusting an exit side focal point of the X-ray lens to focus on an X-ray detector, and an entrance side adjusting mechanism for adjusting an entrance side focal point of the X-ray lens to focus on an analytical point of a sample, and the entrance side adjusting mechanism is disposed with a greater distance from the X-ray lens than a distance between the exit side adjusting mechanism and the X-ray lens.
    Type: Application
    Filed: March 24, 2006
    Publication date: October 12, 2006
    Inventors: Norio Sasayama, Akikazu Okawara, Satoshi Nakayama