Patents by Inventor Akiko Yuzawa

Akiko Yuzawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150088008
    Abstract: According to one embodiment, a pressure sensor includes a support, a film unit supported by the support, having an upper surface, and capable of being deformed, and a first sensing element provided on the upper surface. The first sensing element includes a first magnetic layer, a second magnetic layer provided apart from the first magnetic layer and a first intermediate unit including a first intermediate layer including a portion provided between the first and second magnetic layers. The first magnetic layer extends in a first direction parallel to the upper surface, and a first major axis length of the first magnetic layer is longer than a first minor axis length. The second magnetic layer extends in a second direction parallel to the upper surface and crossing the first direction, and a second major axis length of the second magnetic layer is longer than a second minor axis length.
    Type: Application
    Filed: August 27, 2014
    Publication date: March 26, 2015
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yoshihiko FUJI, Hideaki FUKUZAWA, Michiko HARA, Tomohiko NAGATA, Akio HORI, Shiori KAJI, Yoshihiro HIGASHI, Akiko YUZAWA
  • Publication number: 20150082918
    Abstract: According to one embodiment, a strain sensing element is provided on a film unit configured to be deformed. The strain sensing element includes a functional layer, a first magnetic layer, a second magnetic layer, and a spacer layer. The functional layer includes at least one of an oxide and a nitride. The second magnetic layer is provided between the functional layer and the first magnetic layer. A magnetization of the second magnetic layer is variable in accordance with a deformation of the film unit. The spacer layer is provided between the first magnetic layer and the second magnetic layer. At least a part of the second magnetic layer is amorphous and includes boron.
    Type: Application
    Filed: August 28, 2014
    Publication date: March 26, 2015
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yoshihiko FUJI, Hideaki FUKUZAWA, Shiori KAJI, Akio HORI, Tomohiko NAGATA, Michiko HARA, Yoshihiro HIGASHI, Akiko YUZAWA
  • Patent number: 8956560
    Abstract: In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.
    Type: Grant
    Filed: March 19, 2012
    Date of Patent: February 17, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yasuaki Ootera, Yoshiyuki Kamata, Naoko Kihara, Yoshiaki Kawamonzen, Takeshi Okino, Ryosuke Yamamoto, Tomoyuki Maeda, Norikatsu Sasao, Akiko Yuzawa, Takuya Shimada, Hiroyuki Hieda
  • Patent number: 8916053
    Abstract: A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.
    Type: Grant
    Filed: June 20, 2012
    Date of Patent: December 23, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshiaki Kawamonzen, Yasuaki Ootera, Akiko Yuzawa, Naoko Kihara, Yoshiyuki Kamata, Hiroyuki Hieda, Norikatsu Sasao, Ryosuke Yamamoto, Takeshi Okino, Tomoyuki Maeda, Takuya Shimada
  • Publication number: 20140369530
    Abstract: According to one embodiment, a pressure sensor includes a film part, and a sensing unit. A circumscribing rectangle circumscribing a configuration of a film surface of the film part has a first side, a second side, a third side connected to one end of the first side and one end of the second side, a fourth side connected to one other end of the first side and one other end of the second side, and a centroid of the circumscribing rectangle. The circumscribing rectangle includes a first region enclosed by the first side, line segments connecting the centroid to the one end of the first side, and to the one other end of the first side. The sensing unit includes sensing elements provided on a portion of the film surface overlapping the first region. Each sensing element includes a first, second magnetic layers, and a spacer layer.
    Type: Application
    Filed: March 5, 2014
    Publication date: December 18, 2014
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yoshihiko FUJI, Kei Masunishi, Hideaki Fukuzawa, Yoshihiro Higashi, Michiko Hara, Akio Hori, Tomohiko Nagata, Shiori Kaji, Akiko Yuzawa
  • Patent number: 8865010
    Abstract: In one embodiment, a pattern forming method includes: forming a functional layer having a functional group to cross-link a first polymer on a substrate; forming a diblock copolymer layer having the first polymer and a second polymer on the functional layer; self-assembling the diblock copolymer layer to form a self-assembled layer, the self-assembled layer having a first domain corresponding to the first polymer, and a plurality of second domains corresponding to the second polymer and surrounded by or interposed in the first domain; cross-linking the first polymer in the self-assembled layer with the functional group in the functional layer to form a bonding layer disposed in the self-assembled layer and bonded to the functional layer; and washing or etching the self-assembled layer to remain the bonding layer.
    Type: Grant
    Filed: January 25, 2013
    Date of Patent: October 21, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Naoko Kihara, Hiroyuki Hieda, Akiko Yuzawa, Norikatsu Sasao, Ryosuke Yamamoto, Yoshiyuki Kamata
  • Publication number: 20140137658
    Abstract: According to one embodiment, a microphone package includes: a pressure sensing element including a film and a device; and a cover. The film generates strain in response to pressure. The device includes: a first electrode; a second electrode; and a first magnetic layer. The first magnetic layer is provided between the first electrode and the second electrode and has a first magnetization. The cover includes: an upper portion; and a side portion. The side portion is magnetic and provided depending on the first magnetization and the second magnetization.
    Type: Application
    Filed: October 3, 2013
    Publication date: May 22, 2014
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yoshihiro HIGASHI, Yoshihiko Fuji, Michiko Hara, Akiko Yuzawa, Shiori Kaji, Tomohiko Nagata, Akio Hori, Hideaki Fukuzawa
  • Publication number: 20140137668
    Abstract: According to one embodiment, a pressure sensor includes a base unit, a film unit, and a plurality of sensing elements. The plurality of sensing elements is provided on the film unit radially with respect to a centroid of the film unit. The plurality of sensing elements has a first side and a second side intersecting the first side. Each of the plurality of sensing elements includes a first magnetic layer, a second magnetic layer, and an intermediate layer. Each of the plurality of sensing elements has a shape anisotropy characterized by a length of the first side being longer than a length of the second side intersecting the first side. The plurality of sensing elements is provided at lines having radial configurations extending from the centroid to have a prescribed angle between the first side and the line.
    Type: Application
    Filed: October 7, 2013
    Publication date: May 22, 2014
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Hideaki FUKUZAWA, Yoshihiro Higashi, Yoshihiko Fuji, Michiko Hara, Akio Hori, Shiori Kaji, Tomohiko Nagata, Akiko Yuzawa
  • Publication number: 20140090486
    Abstract: According to one embodiment, a pressure sensor includes a substrate, a first electrode, a second electrode, a first magnetic layer, a second magnetic, a spacer layer, a third magnetic layer. The substrate includes a first region and a second region. The first electrode is provided on the first region. The second electrode is provided on the first electrode. The first magnetic layer is provided between the first electrode and the second electrode. The second magnetic layer is provided between the first electrode and the first magnetic layer or between the first magnetic layer and the second electrode. The spacer layer is provided between the first magnetic layer and the second magnetic layer in a stacking direction of layers from the first electrode to the second electrode. The third magnetic layer is provided continuously with the second magnetic layer on the second region.
    Type: Application
    Filed: June 26, 2013
    Publication date: April 3, 2014
    Inventors: Yoshihiko FUJI, Hideaki FUKUZAWA, Michiko HARA, Yoshihiro HIGASHI, Akio HORI, Tomohiko NAGATA, Shiori KAJI, Akiko YUZAWA
  • Publication number: 20130256263
    Abstract: In one embodiment, a pattern forming method includes: forming a functional layer having a functional group to cross-link a first polymer on a substrate; forming a diblock copolymer layer having the first polymer and a second polymer on the functional layer; self-assembling the diblock copolymer layer to form a self-assembled layer, the self-assembled layer having a first domain corresponding to the first polymer, and a plurality of second domains corresponding to the second polymer and surrounded by or interposed in the first domain; cross-linking the first polymer in the self-assembled layer with the functional group in the functional layer to form a bonding layer disposed in the self-assembled layer and bonded to the functional layer; and washing or etching the self-assembled layer to remain the bonding layer.
    Type: Application
    Filed: January 25, 2013
    Publication date: October 3, 2013
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Naoko KIHARA, Hiroyuki Hieda, Akiko Yuzawa, Norikatsu Sasao, Ryosuke Yamamoto, Yoshiyuki Kamata
  • Publication number: 20130075361
    Abstract: A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.
    Type: Application
    Filed: June 20, 2012
    Publication date: March 28, 2013
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yoshiaki KAWAMONZEN, Yasuaki OOTERA, Akiko YUZAWA, Naoko KIHARA, Yoshiyuki KAMATA, Hiroyuki HIEDA, Norikatsu SASAO, Ryosuke YAMAMOTO, Takeshi OKINO, Tomoyuki MAEDA, Takuya SHIMADA
  • Publication number: 20130069272
    Abstract: In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.
    Type: Application
    Filed: March 19, 2012
    Publication date: March 21, 2013
    Inventors: Yasuaki OOTERA, Yoshiyuki KAMATA, Naoko KIHARA, Yoshiaki KAWAMONZEN, Takeshi OKINO, Ryosuke YAMAMOTO, Tomoyuki MAEDA, Norikatsu SASAO, Akiko YUZAWA, Takuya SHIMADA, Hiroyuki Hieda
  • Patent number: 8300340
    Abstract: According to one embodiment, a servo area of a magnetic recording medium includes magnetic dots arrayed at a period L0. The magnetic dots include a plurality of magnetic dot regions divided in the cross track direction. A width Wm in the down track direction of the mth magnetic dot region from the innermost circumference and a number Nm of dot rows in the down track direction of the mth region meet a relationship represented by L0{Nm?3/2?0.3}?Wm?L0{Nm?3/2+0.3}??(1).
    Type: Grant
    Filed: March 2, 2011
    Date of Patent: October 30, 2012
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masatoshi Sakurai, Ryosuke Yamamoto, Naoko Kihara, Akiko Yuzawa, Yoshiyuki Kamata
  • Publication number: 20110259849
    Abstract: According to one embodiment, a method for producing an imprint mold includes forming, on a substrate, a plurality of guides including a first wall surface and a second wall surface, wherein an angle between at least one of the first and second wall surfaces and an exposed substrate surface is 131° or less, applying a self-assembling material, which forms a sphere when phase-separated, to a guide groove area defined by the first wall surface, the second wall surface and the substrate surface, and self-assembling the self-assembling material to form a dot pattern, etching the substrate by using the dot pattern as a mask to transfer the dot pattern and forming an imprint mold by using the substrate with the dot pattern transferred as a master mold.
    Type: Application
    Filed: April 25, 2011
    Publication date: October 27, 2011
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Masatoshi Sakurai, Naoko Kihara, Hiroki Tanaka, Ryosuke Yamamoto, Akiko Yuzawa
  • Publication number: 20110242706
    Abstract: According to one embodiment, a servo area of a magnetic recording medium includes magnetic dots arrayed at a period L0. The magnetic dots include a plurality of magnetic dot regions divided in the cross track direction. A width Wm in the down track direction of the mth magnetic dot region from the innermost circumference and a number Nm of dot rows in the down track direction of the mth region meet a relationship represented by L0{Nm?3/2?0.3}?Wm?L0{Nm?3/2+0.
    Type: Application
    Filed: March 2, 2011
    Publication date: October 6, 2011
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Masatoshi SAKURAI, Ryosuke YAMAMOTO, Naoko KIHARA, Akiko YUZAWA, Yoshiyuki KAMATA
  • Patent number: 7833458
    Abstract: According to one embodiment, an imprinting method includes applying a resist to a substrate, imprinting a stamper on which protruded patterns are formed against the resist applied to the substrate, forcing a distal end of a peeling wedge into a part between the substrate and the stamper, and introducing a gas between the substrate and the stamper to peel off the stamper from the substrate, in which a gap between the substrate and the stamper is made larger than a thickness of the resist at a part into which the distal end of the peeling wedge is forced.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: November 16, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Akiko Yuzawa, Seiji Morita, Shinobu Sugimura, Masatoshi Sakurai
  • Publication number: 20090277574
    Abstract: According to one embodiment, a pattern transfer method includes spin-coating one surface of a medium substrate with photopolymer having viscosity of 10 cps or less to form an photopolymer layer having a thickness of 200 nm or less, bonding the one surface of the medium substrate and the patterned surface of the first transparent stamper under vacuum with the photopolymer layer sandwiched therebetween, applying an ultraviolet ray to the photopolymer layer through the first transparent stamper to cure the photopolymer layer, and peeling off the first transparent stamper to form the photopolymer layer to which patterns of protrusions and recesses are transferred on the one surface of the medium substrate to control a thickness of the photopolymer layer remaining in recesses to 100 nm or less.
    Type: Application
    Filed: May 11, 2009
    Publication date: November 12, 2009
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Shinobu SUGIMURA, Seiji MORITA, Akiko YUZAWA, Masatoshi SAKURAI
  • Publication number: 20090280285
    Abstract: According to one embodiment, there is provided a stamper holder which holds a disk-shape metal stamper for molding having a center hole with an inner diameter of 17.5 mm or less and formed with patterns of protrusions and recesses for a recording medium on a surface in a state that the stamper holder is fixed to a first die having a center hole, in which the stamper holder has an approximately cylindrical shape so as to be inserted into the center hole of the first die and comprises a flange provided at one end configured to hold an inner peripheral portion of the stamper surface near the center hole, and an outer diameter of the flange is 17.6 mm or less.
    Type: Application
    Filed: May 8, 2009
    Publication date: November 12, 2009
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Shinobu Sugimura, Seiji Morita, Akiko Yuzawa, Masatoshi Sakurai
  • Publication number: 20090246310
    Abstract: According to one embodiment, a resin imprint stamper formed of a resin material in an annular shape having a through-hole in a central part thereof, including a pattern area formed on a part of a surface thereof in which a plurality of lands and grooves are circumferentially arranged with a track pitch of 100 nm or less, and the pattern height of at most 100 nm, wherein no protrusion and step having a height exceeding 10 ?m from a top surface of the pattern area are present in a region less than 3 mm from an end of the pattern area toward an inner periphery thereof.
    Type: Application
    Filed: March 27, 2009
    Publication date: October 1, 2009
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Masatoshi Sakurai, Seiji Morita, Shinobu Sugimura, Akiko Yuzawa
  • Publication number: 20090243152
    Abstract: According to one embodiment, an imprinting method includes applying a resist to a substrate, imprinting a stamper on which protruded patterns are formed against the resist applied to the substrate, forcing a distal end of a peeling wedge into a part between the substrate and the stamper, and introducing a gas between the substrate and the stamper to peel off the stamper from the substrate, in which a gap between the substrate and the stamper is made larger than a thickness of the resist at a part into which the distal end of the peeling wedge is forced.
    Type: Application
    Filed: March 27, 2009
    Publication date: October 1, 2009
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Akiko YUZAWA, Seiji MORITA, Shinobu SUGIMURA, Masatoshi SAKURAI