Abstract: A liquid crystal exposure apparatus that irradiates a substrate held by a substrate holder which moves along an XY plane with an illumination light via an optical system while the substrate holder moves in the X-axis direction, has; a scale measured based on movement of the substrate holder in the X-axis direction, heads that measure the scale while relatively moving in the X-axis direction with respect to the scale, a plurality of scales arranged at mutually different positions in the X-axis direction measured based on movement of the substrate holder in the Y-axis direction, and a plurality of heads provided for each scale that measures the scales while relatively moving in the Y-axis direction with respect to the scales based on movement of the substrate in the Y-axis direction.

Abstract: A control system, of a plurality of heads, acquires grating correction information related to at least two of scales in a first grating group and scales in a second grating group, based on position information of a movable body measured using at least four heads irradiating measurement beams on at least two of the scales and scales. The grating correction information is used to control movement of the movable body using at least three heads irradiating at least two of the scales and scales.

Abstract: A substrate stage apparatus provided with: a substrate holder that can be moved in a plane including an X-axis and a Y-axis; a head unit that can be moved synchronously with the substrate holder along the Y-axis; an encoder system for measuring substrate position, the system including a scale disposed on the substrate holder, and heads disposed on the head unit, and acquiring the X-axis direction and the Y-axis direction position information of the substrate holder on the basis of the output of the heads; an encoder system for measuring head-unit position, the system acquiring the Y-axis direction position information of the head unit; and a position control system that controls the position of the substrate holder within the XY plane on the basis of the output of the encoder system for measuring substrate position and the encoder system for measuring head-unit position.

Abstract: In an exposure apparatus, on a substrate holder (34), a plurality of grating areas (RG) is arranged mutually apart in the X-axis direction, and a plurality of heads (66a to 66d) that irradiates a measurement beam with respect to the grating area and can move in the Y-axis direction is arranged outside of the substrate holder. A control system controls movement of the substrate holder in at least directions of three degrees of freedom within an XY plane, based on measurement information of at least three heads of the plurality of heads facing the grating area and measurement information of a measurement device that measures position information of the plurality of heads. The measurement beam of each of the plurality of heads, during the movement of substrate holder in the X-axis direction, moves off of one of the plurality of grating areas and switches to another adjacent grating area.

Abstract: A control system controls a drive system of a substrate holder, based on correction information to compensate for measurement error of a measurement system including an encoder system that occurs due to movement of at least one of a plurality of grating areas (scale), a plurality of heads and a substrate holder, and position information measured by the measurement system, and a measurement beam from a head of each of the plurality of heads moves off from one of the plurality of grating areas and switches to another adjacent grating area, during the movement of the substrate holder in the X-axis direction.

Abstract: In an exposure apparatus, on a substrate holder (34), a plurality of grating areas (RG) is arranged mutually apart in the X-axis direction, and a plurality of heads (66a to 66d) that irradiates a measurement beam with respect to the grating area and can move in the Y-axis direction is arranged outside of the substrate holder. A control system controls movement of the substrate holder in at least directions of three degrees of freedom within an XY plane, based on measurement information of at least three heads of the plurality of heads facing the grating area and measurement information of a measurement device that measures position information of the plurality of heads. The measurement beam of each of the plurality of heads, during the movement of substrate holder in the X-axis direction, moves off of one of the plurality of grating areas and switches to another adjacent grating area.

Abstract: A substrate stage apparatus provided with: a substrate holder that can be moved in a plane including an X-axis and a Y-axis; a head unit that can be moved synchronously with the substrate holder along the Y-axis; an encoder system for measuring substrate position, the system including a scale disposed on the substrate holder, and heads disposed on the head unit, and acquiring the X-axis direction and the Y-axis direction position information of the substrate holder on the basis of the output of the heads; an encoder system for measuring head-unit position, the system acquiring the Y-axis direction position information of the head unit; and a position control system that controls the position of the substrate holder within the XY plane on the basis of the output of the encoder system for measuring substrate position and the encoder system for measuring head-unit position.

Abstract: A control system, of a plurality of heads, acquires grating correction information related to at least two of scales in a first grating group and scales in a second grating group, based on position information of a movable body measured using at least four heads irradiating measurement beams on at least two of the scales and scales. The grating correction information is used to control movement of the movable body using at least three heads irradiating at least two of the scales and scales.

Abstract: In an exposure apparatus, on a substrate holder, a plurality of grating areas is arranged mutually apart in the X-axis direction, and a plurality of heads that irradiates a measurement beam with respect to the grating area and can move in the Y-axis direction is arranged outside of the substrate holder. A control system controls movement of the substrate holder in at least directions of three degrees of freedom within an XY plane, based on measurement information of at least three heads of the plurality of heads facing the grating area and measurement information of a measurement device that measures position information of the plurality of heads. The measurement beam of each of the plurality of heads, during the movement of substrate holder in the X-axis direction, moves off of one of the plurality of grating areas and switches to another adjacent grating area.

Abstract: A control system controls a drive system of a substrate holder, based on correction information to compensate for measurement error of a measurement system including an encoder system that occurs due to movement of at least one of a plurality of grating areas (scale), a plurality of heads and a substrate holder, and position information measured by the measurement system, and a measurement beam from a head of each of the plurality of heads moves off from one of the plurality of grating areas and switches to another adjacent grating area, during the movement of the substrate holder in the X-axis direction.

Abstract: A liquid crystal exposure apparatus that irradiates a substrate held by a substrate holder which moves along an XY plane with an illumination light via an optical system while the substrate holder moves in the X-axis direction, has; a scale measured based on movement of the substrate holder in the X-axis direction, heads that measure the scale while relatively moving in the X-axis direction with respect to the scale, a plurality of scales arranged at mutually different positions in the X-axis direction measured based on movement of the substrate holder in the Y-axis direction, and a plurality of heads provided for each scale that measures the scales while relatively moving in the Y-axis direction with respect to the scales based on movement of the substrate in the Y-axis direction.

Abstract: A control system, of a plurality of heads, acquires grating correction information related to at least two of scales in a first grating group and scales in a second grating group, based on position information of a movable body measured using at least four heads irradiating measurement beams on at least two of the scales and scales. The grating correction information is used to control movement of the movable body using at least three heads irradiating at least two of the scales and scales.

Abstract: A substrate stage apparatus provided with: a substrate holder that can be moved in a plane including an X-axis and a Y-axis; a head unit that can be moved synchronously with the substrate holder along the Y-axis; an encoder system for measuring substrate position, the system including a scale disposed on the substrate holder, and heads disposed on the head unit, and acquiring the X-axis direction and the Y-axis direction position information of the substrate holder on the basis of the output of the heads; an encoder system for measuring head-unit position, the system acquiring the Y-axis direction position information of the head unit; and a position control system that controls the position of the substrate holder within the XY plane on the basis of the output of the encoder system for measuring substrate position and the encoder system for measuring head-unit position.

Abstract: A substrate stage apparatus provided with: a substrate holder that can be moved in a plane including an X-axis and a Y-axis; a head unit that can be moved synchronously with the substrate holder along the Y-axis; an encoder system for measuring substrate position, the system including a scale disposed on the substrate holder, and heads disposed on the head unit, and acquiring the X-axis direction and the Y-axis direction position information of the substrate holder on the basis of the output of the heads; an encoder system for measuring head-unit position, the system acquiring the Y-axis direction position information of the head unit; and a position control system that controls the position of the substrate holder within the XY plane on the basis of the output of the encoder system for measuring substrate position and the encoder system for measuring head-unit position.

Abstract: A control system, of a plurality of heads, acquires grating correction information related to at least two of scales in a first grating group and scales in a second grating group, based on position information of a movable body measured using at least four heads irradiating measurement beams on at least two of the scales and scales. The grating correction information is used to control movement of the movable body using at least three heads irradiating at least two of the scales and scales.

Abstract: A control system, of a plurality of heads, acquires grating correction information related to at least two of scales in a first grating group and scales in a second grating group, based on position information of a movable body measured using at least four heads irradiating measurement beams on at least two of the scales and scales. The grating correction information is used to control movement of the movable body using at least three heads irradiating at least two of the scales and scales.

Abstract: A control system, of a plurality of heads, acquires grating correction information related to at least two of scales in a first grating group and scales in a second grating group, based on position information of a movable body measured using at least four heads irradiating measurement beams on at least two of the scales and scales. The grating correction information is used to control movement of the movable body using at least three heads irradiating at least two of the scales and scales.

Abstract: A liquid crystal exposure apparatus that irradiates a substrate held by a substrate holder which moves along an XY plane with an illumination light via an optical system while the substrate holder moves in the X-axis direction, has; a scale measured based on movement of the substrate holder in the X-axis direction, heads that measure the scale while relatively moving in the X-axis direction with respect to the scale, a plurality of scales arranged at mutually different positions in the X-axis direction measured based on movement of the substrate holder in the Y-axis direction, and a plurality of heads provided for each scale that measures the scales while relatively moving in the Y-axis direction with respect to the scales based on movement of the substrate in the Y-axis direction.

Abstract: A substrate stage apparatus provided with: a substrate holder that can be moved in a plane including an X-axis and a Y-axis; a head unit that can be moved synchronously with the substrate holder along the Y-axis; an encoder system for measuring substrate position, the system including a scale disposed on the substrate holder, and heads disposed on the head unit, and acquiring the X-axis direction and the Y-axis direction position information of the substrate holder on the basis of the output of the heads; an encoder system for measuring head-unit position, the system acquiring the Y-axis direction position information of the head unit; and a position control system that controls the position of the substrate holder within the XY plane on the basis of the output of the encoder system for measuring substrate position and the encoder system for measuring head-unit position.

Abstract: A control system controls a drive system of a substrate holder, based on correction information to compensate for measurement error of a measurement system including an encoder system that occurs due to movement of at least one of a plurality of grating areas (scale), a plurality of heads and a substrate holder, and position information measured by the measurement system, and a measurement beam from a head of each of the plurality of heads moves off from one of the plurality of grating areas and switches to another adjacent grating area, during the movement of the substrate holder in the X-axis direction.