Patents by Inventor Akio Soejima

Akio Soejima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7129028
    Abstract: In a method of forming a holographic grating, a photoresist layer is formed on an optical substrate, and a resist pattern is formed in the photoresist layer to have grooves depth deeper than a predetermined depth of diffraction grating grooves to be formed. Then, the photoresist layer with the resist pattern is etched by an ion beam generated by a mixed gas containing a fluorine based gas and oxygen until the resist pattern is substantially completely disappears. Thus, the diffraction grating grooves having the predetermined depth are directly engraved on the optical glass plate.
    Type: Grant
    Filed: June 12, 2003
    Date of Patent: October 31, 2006
    Assignee: Shimadzu Corporation
    Inventors: Masaru Koeda, Yuji Tanaka, Akio Soejima
  • Publication number: 20030213768
    Abstract: In a method of forming a holographic grating, a photoresist layer is formed on an optical substrate, and a resist pattern is formed in the photoresist layer to have grooves depth deeper than a predetermined depth of diffraction grating grooves to be formed. Then, the photoresist layer with the resist pattern is etched by an ion beam generated by a mixed gas containing a fluorine based gas and oxygen until the resist pattern is substantially completely disappears. Thus, the diffraction grating grooves having the predetermined depth are directly engraved on the optical glass plate.
    Type: Application
    Filed: June 12, 2003
    Publication date: November 20, 2003
    Inventors: Masaru Koeda, Yuji Tanaka, Akio Soejima
  • Publication number: 20010017184
    Abstract: In order to form a holographic grating of the invention, a resist pattern having a groove depth deeper than a desired depth of diffraction grating grooves is engraved in a photoresist layer provided on an optical glass base plate by an exposure method. Then, the photoresist layer is etched by an ion beam generated by a mixed gas containing a fluorine based gas and oxygen until the photoresist layer is completely deleted. In etching the photoresist layer, the ion beam is irradiated from a direction, which is perpendicular to a grooving direction of the resist pattern and is inclined from a normal line direction of the base plate. As a result, there can be formed the holographic grating in which the diffraction grating grooves are directly engraved in the optical glass base plate. Since the diffraction grating grooves are directly engraved in the optical base plate, the photoresist layer is not peeled off as in the conventional grating, and the holographic grating of the invention has excellent durability.
    Type: Application
    Filed: December 14, 2000
    Publication date: August 30, 2001
    Applicant: SHIMADZU CORPORATION
    Inventors: Masaru Koeda, Yuji Tanaka, Akio Soejima