Abstract: In an extreme ultra violet light source apparatus that exhausts debris including fast ions and neutral particles by the effect of a magnetic field, neutral particles emitted from plasma are efficiently ionized. The extreme ultra violet light source apparatus includes a plasma generating unit that generates plasma, that radiates at least extreme ultra violet light, through pulse operation; collective optics that collects the extreme ultra violet light radiated from the plasma; a microwave generating unit that radiates microwave through pulse operation into a space in which a magnetic field is formed to cause electron cyclotron resonance, and thereby ionizes neutral particles emitted from the plasma; a magnetic field forming unit that forms the magnetic field and a magnetic field for trapping at least ionized particles; and a control unit that synchronously controls at least the plasma generating unit and the microwave generating unit.

Abstract: An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.

Abstract: An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.

Abstract: An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.

Abstract: An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma.

Abstract: A driver laser for EUV light source apparatus which driver laser simultaneously achieves short-pulsing and multi-line oscillation. The driver laser includes: a short-pulse multi-line oscillated CO2 laser oscillator having a device that shortens width of pulses included in a laser beam to be output and a device that suppresses amplitude of an oscillation spectrum exhibiting an energy peak value; and at least one amplifier that inputs the laser beam output from the short-pulse multi-line oscillated CO2 laser oscillator and amplifies the input laser beam to output the amplified laser beam.

Abstract: Offset in the ejection direction of target material droplets is corrected in order to stabilize EUV output in an EUV light source device. An extreme ultraviolet light source device includes a droplet generation device 110 that outputs target material droplets 101 towards a predetermined plasma emission point 103; a charging device 130 that charges the target material droplets 101; a trajectory correction device 140 that generates a force field in the trajectory to correct the travel direction of the charged target material droplets 101a so that the charged target material droplets 101a travel towards the plasma emission point 103; and a laser light source 150 that irradiates, at the plasma emission point 103, a laser beam onto the charged target material to generate plasma thereby.

Abstract: A driver laser for EUV light source apparatus which driver laser simultaneously achieves short-pulsing and multi-line oscillation. The driver laser includes: a short-pulse multi-line oscillated CO2 laser oscillator having a device that shortens width of pulses included in a laser beam to be output and a device that suppresses amplitude of an oscillation spectrum exhibiting an energy peak value; and at least one amplifier that inputs the laser beam output from the short-pulse multi-line oscillated CO2 laser oscillator and amplifies the input laser beam to output the amplified laser beam.

Abstract: A wireless communication terminal is provided. The wireless communication terminal including a first wireless communication section configured to operate in a first clock system; a second wireless communication section configured to operate in a second clock system different from the first clock system, and perform short-range wireless communication; and an asynchronous interface that mediates between the first wireless communication section and the second wireless communication section.

Abstract: A slab type laser apparatus has a slab type gas laser medium part formed in a region defined by a pair of electrode flat plates oppositely disposed in parallel with each other in a space to be filled with a gas laser medium which is excited by high-frequency electric power. The apparatus includes an oscillator part including a pair of resonator mirrors oppositely disposed with a part of the gas laser medium part in between, and for amplifying a laser beam to have predetermined light intensity to emit the laser beam, and the amplifier part including a plurality of return mirrors oppositely disposed with a part of the gas laser medium part in between. The incident laser beam goes and returns plural times between the return mirrors, and the laser beam is amplified to have predetermined power.

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

Abstract: An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.

Abstract: The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.

Abstract: In an LPP type EUV light source apparatus, the intensity of radiated EUV light is stabilized by improving the positional stability of droplets. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target supply division including a target tank for storing a target material therein and an injection nozzle for injecting the target material in a jet form, for supplying the target material into the chamber; a charging electrode applied with a direct-current voltage between the target tank and itself, for charging droplets when the target material in the jet form injected from the injection nozzle is broken up into the droplets; a laser for applying a laser beam to the droplets of the target material to generate plasma; and a collector mirror for collecting extreme ultra violet light radiated from the plasma to output the extreme ultra violet light.

Abstract: A communication apparatus is provided that performs short-range wireless communication in a contactless manner. The communication apparatus includes: a large antenna; a first wireless processing section configured to perform data communication via electromagnetic induction-type using the large antenna; a small antenna placed inside the large antenna; and a second wireless processing section configured to perform data communication using the small antenna.

Abstract: A mesoporous silica thick-film comprising a layer of mesoporous silica formed in a thickness of 10 ?m to 1 mm, and a process for producing a mesoporous silica thick-film, which comprises disposing a substrate in a solution containing mesoporous silica suspended therein and subsequently applying a voltage thereby to form a film having a thickness of 10 ?m to 1 mm by the electrophoretic deposition of the mesoporous silica on a surface of the substrate is provided.

Abstract: A semiconductor memory device formed on a semiconductor chip includes first memory arrays, a plurality of second memory arrays, a first voltage generator, and first bonding pads. The semiconductor chip is divided into first, second and third rectangle regions and the third rectangle region is arranged between the first rectangle region and the second rectangle region. The first memory arrays are formed in the first rectangle region. The second memory arrays are formed in the second rectangle region. The voltage generator and first bonding pads are arranged in the third rectangle region. The first bonding pads are arranged between the first rectangle region and the voltage generator and no bonding pads are arranged between the voltage generator and the second memory arrays.

Abstract: A semiconductor memory device formed on a semiconductor chip includes first memory arrays, a plurality of second memory arrays, a first voltage generator, and first bonding pads. The semiconductor chip is divided into first, second and third rectangle regions and the third rectangle region is arranged between the first rectangle region and the second rectangle region. The first memory arrays are formed in the first rectangle region. The second memory arrays are formed in the second rectangle region. The voltage generator and first bonding pads are arranged in the third rectangle region. The first bonding pads are arranged between the first rectangle region and the voltage generator and no bonding pads are arranged between the voltage generator and the second memory arrays.

Abstract: An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained by using a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.

Abstract: In an extreme ultra violet light source apparatus that exhausts debris including fast ions and neutral particles by the effect of a magnetic field, neutral particles emitted from plasma are efficiently ionized. The extreme ultraviolet light source apparatus includes: a plasma generating unit that generates plasma, that radiates at least extreme ultra violet light, through pulse operation; collective optics that collects the extreme ultra violet light radiated from the plasma; a microwave generating unit that radiates microwave through pulse operation into a space in which a magnetic field is formed to cause electron cyclotron resonance, and thereby ionizes neutral particles emitted from the plasma; a magnetic field forming unit that forms the magnetic field and a magnetic field for trapping at least ionized particles; and a control unit that synchronously controls at least the plasma generating unit and the microwave generating unit.