Patents by Inventor Akira Hayashida

Akira Hayashida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090014428
    Abstract: A heating apparatus comprises heating elements arranged of a sheet form and having notches or through holes provided therein, a side wall member made of an electrically conductive material and arranged to surround and define the heating space, and holding members disposed at the heating space side of the side wall member for holding at one end the heating elements. Also, extending members are provided, each member comprising an extending-through portion arranged to project from the heating space side of the side wall member and extend through the notch or through hole between both ends in the heating element and projected portions arranged to project at both, front and back, sides of the heating element from the extending-through portion in a direction, which is orthogonal to the extending direction of the extending-through portion, thus to inhibit the displacement of the heating elements along the extending direction.
    Type: Application
    Filed: June 25, 2008
    Publication date: January 15, 2009
    Applicants: Hitachi Kokusai Electric Inc., Teitokusha Co., Ltd.
    Inventors: Akira Hayashida, Masaaki Ueno, Masakazu Shimada, Kimio Kitamura, Kenji Tanaka, Jyunichi Nishihara
  • Publication number: 20090014435
    Abstract: A heating apparatus comprises a heating element, an inner shell for supporting the heating element, an outer shell disposed along the outer boundary of the inner shell, a cooling medium passage for conveying a cooling medium between the inner shell and the outer shell, a first opening provided in the inner shell, a second opening provided in the outer shell, and a partition arranged to extend from the first opening to the second opening for developing at least a space separated from the cooling medium passage and between the inner shell and the outer shell. The heating apparatus further comprises an insulator for shutting up a gap provided between the partition and the second opening.
    Type: Application
    Filed: June 25, 2008
    Publication date: January 15, 2009
    Applicants: Hitachi Kokusai Electric Inc., Teitokusha Co., Ltd.
    Inventors: Akira Hayashida, Masaaki Ueno, Masakazu Shimada, Masashi Sugishita, Toshimitsu Miyata, Kimio Kitamura, Kenji Tanaka, Jyunichi Nishihara
  • Publication number: 20090016706
    Abstract: A heating apparatus comprises a wall for surrounding and defining a heating space, a heating element mounted on the inner side of the wall, reflecting members for reflecting the heat emitted from the heating element. Also, a moving unit joined to one end of each of the reflecting members for moving the reflecting members. Moreover, pivotal members joined to the reflecting members beside more their respective other side than one side of the reflecting members for controlling as pivots the movement of the reflecting member driven by the moving unit.
    Type: Application
    Filed: June 25, 2008
    Publication date: January 15, 2009
    Applicants: Hitachi Kokusai Electric Inc., Teitokusha Co., Ltd.
    Inventors: Akira Hayashida, Masaaki Ueno, Masakazu Shimada, Masashi Sugishita, Toshimitsu Miyata, Kimio Kitamura, Kenji Tanaka, Jyunichi Nishihara
  • Publication number: 20080182345
    Abstract: A semiconductor manufacturing apparatus and substrate processing method is provided with which the film formed on a substrate can be controlled in thickness and quality.
    Type: Application
    Filed: January 23, 2008
    Publication date: July 31, 2008
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Masashi Sugishita, Masaaki Ueno, Akira Hayashida
  • Publication number: 20080153314
    Abstract: An object of the present invention is to improve substrate processing efficiency. A substrate processing apparatus has a reaction tube that processes a substrate inside, and a heating apparatus disposed so as to surround an external periphery of the reaction tube, so that at least a gas inlet tube is disposed on a side surface in an area in which the substrate is processed inside the reaction tube, and the heating apparatus has a heat insulator that surrounds the reaction tube, an inlet opening formed in the shape of a groove in the heat insulator from the lower end of the heating apparatus so as to avoid the gas inlet tube, and a heating element disposed between the heat insulator and the reaction tube.
    Type: Application
    Filed: November 30, 2007
    Publication date: June 26, 2008
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Akira Hayashida, Masaaki Ueno, Masakazu Shimada, Yukinori Aburatani, Tomoyuki Yamada, Sieyo Nakashima, Masashi Sugishita
  • Patent number: 6143409
    Abstract: Described is an adhesive containing a polycarbodiimide resin having repeating units represented by the following formula:.paren open-st.R--N.dbd.C.dbd.N.paren close-st..sub.nwherein R is a divalent hydrocarbon group and n is an integer of 5 to 250, and also described is a flexible printed circuit board and a coverlay film fabricated using the above-described polycarbodiimide resin-containing adhesive.
    Type: Grant
    Filed: November 25, 1998
    Date of Patent: November 7, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasuyoshi Komoto, Akira Hayashida, Michio Aizawa, Hitoshi Arai, Ken Yahata
  • Patent number: 5916675
    Abstract: Described is an adhesive containing a polycarbodiimide resin having repeating units represented by the following formula:.paren open-st.R--N.dbd.C.dbd.N.paren close-st..sub.nwherein R is a divalent hydrocarbon group and n is an integer of 5 to 250, and also described is a flexible printed circuit board and a coverlay film fabricated using the above-described polycarbodiimide resin-containing adhesive.
    Type: Grant
    Filed: June 12, 1997
    Date of Patent: June 29, 1999
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasuyoshi Komoto, Akira Hayashida, Michio Aizawa, Hitoshi Arai, Ken Yahata
  • Patent number: 5837801
    Abstract: The method for preparing a crosslinked polycarbodiimide according to the present invention comprises reacting a polydicarbodiimide compound with a compound, which has in a molecule thereof two or more hydroxy or mercapto groups, in the presence of an alcoholate of an alkali metal or of an alkaline earth metal. The crosslinked polycarbodiimide obtained according to the method is excellent in heat resistance and mechanical properties.
    Type: Grant
    Filed: December 4, 1996
    Date of Patent: November 17, 1998
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ken Yahata, Hiroshi Miyoshi, Yasuyuki Takiguchi, Yasuyoshi Komoto, Akira Hayashida
  • Patent number: 5821325
    Abstract: A hydroxy- or mercapto-bearing organic compound is caused to react with a polycarbodiimide compound in the presence of an alcoholate of an alkali metal or of an alkaline earth metal. The carbodiimide linkage in the polymer which results from the above-described reaction is crosslinked.
    Type: Grant
    Filed: December 10, 1996
    Date of Patent: October 13, 1998
    Assignee: Shin-Estu Chemical Co., Ltd.
    Inventors: Ken Yahata, Yasuyuki Takiguchi, Hiroshi Miyoshi, Yasuyoshi Komoto, Akira Hayashida
  • Patent number: 5804257
    Abstract: A polysilane composition including a polysilane and a plasticizer can be coated as a thin film having improved mechanical strength and a high photo decomposition rate. A polysilane composition including a polysilane and an ester can be coated as a thin film which is exposed to UV and readily dyed to form a dyed polysilane film.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: September 8, 1998
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Akira Hayashida, Shigeru Mori, Eiichi Tabei
  • Patent number: 5770661
    Abstract: A polycarbodiimide compound is reacted with an organic compound having at least two amino groups in the molecule. A polycarbodiimide compound is reacted with an amine compound having a silicon atom in the molecule. The carbodiimide bonds remained in the crosslinked material are further crosslinked. The crosslinked material is further heated/calcined to obtain an inorganic material having high heat resistance and strong toughness.
    Type: Grant
    Filed: January 13, 1997
    Date of Patent: June 23, 1998
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshi Miyoshi, Ken Yahata, Yasuyoshi Komoto, Yasuyuki Takiguchi, Akira Hayashida
  • Patent number: 5750636
    Abstract: This invention provides a process wherein a stable solution of polycarbodiimide with a number-average molecular-weight of 5,000 to 60,000 can be very easily prepared by using an organic diisocyanate (e.g., 2,4-tolylene diisocyanate or 2,6-tolylene diisocyanate) as starting material, a cyclic phosphine oxide as catalyst and a chlorinated aromatic compound as solvent and by controlling certain reaction conditions within the reaction temperature range of 110.degree. to 150.degree. C.
    Type: Grant
    Filed: June 4, 1996
    Date of Patent: May 12, 1998
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasuyoshi Komoto, Yasuyuki Takiguchi, Ken Yahata, Akira Hayashida, Minoru Takamizawa
  • Patent number: 5750637
    Abstract: This invention provides a process for the preparation of a polycarbodiimide solution wherein the polycarbodiimide is synthesized by heating an organic diisocyanate (e.g., 2,4-tolylene diisocyanate or 2,6-tolylene diisocyanate) in the presence of a carbodiimidation catlayst characterized in that a non-chlorinated aromatic hydrocarbon is used as the solvent and the resulting polycarbodiimide has a number average molecular weight from about 3,000 to about 10,000; wherein the synthesis is performed in the temperature range of from about 100.degree. to about 120.degree. C.
    Type: Grant
    Filed: June 4, 1996
    Date of Patent: May 12, 1998
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasuyuki Takiguchi, Ken Yahata, Yasuyoshi Komoto, Akira Hayashida, Minoru Takamizawa
  • Patent number: 5599892
    Abstract: In a process for preparing a polysilane from a diorganodihalosilane and an alkali metal, a low molecular weight polysilane results from the process as a by-product. The low molecular weight polysilane is further reacted with an alkali metal for conversion into a high molecular weight polysilane.
    Type: Grant
    Filed: October 6, 1995
    Date of Patent: February 4, 1997
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Akira Hayashida
  • Patent number: 5580912
    Abstract: A polysilane is blended with a porphyrin or a metal complex thereof. The polysilane composition may further contain a plasticizer. The porphyrin is effective for suppressing photolysis of polysilane.
    Type: Grant
    Filed: August 17, 1995
    Date of Patent: December 3, 1996
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Akira Hayashida, Shigeru Mori
  • Patent number: 5296418
    Abstract: A hafnium-containing silazane polymer is obtained through a polymerization reaction of which the reactants are(A) a halide of an organic silicon compound;(B) a hafnium compound having a the formula:HfX.sub.4 [I]wherein X is chlorine or bromine, and(C) a disilazane having the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 may be the same or different and are hydrogen, methyl ethyl, phenyl or vinyl.
    Type: Grant
    Filed: October 23, 1992
    Date of Patent: March 22, 1994
    Assignee: Shin-Etsu Chemical Company, Ltd.
    Inventors: Yoshihumi Takeda, Akira Hayashida
  • Patent number: 5237033
    Abstract: Polysilanes are synthesized by reacting dihalosilanes in the presence of alkali metal particles while using copper powder, cuprous oxide, cupric oxide, or an organic copper compound as a catalyst. There are obtained high molecular weight polysilanes in high yields.
    Type: Grant
    Filed: March 13, 1992
    Date of Patent: August 17, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Eiichi Tabei, Shigeru Mori, Akira Hayashida, Motoo Fukushima
  • Patent number: 5210058
    Abstract: An organic silazane polymer is prepared by reacting ammonia gas with a mixture of a trihalosilane and a monohalosilane, for example, methyltrichlorosilane and trimethylchlorosilane in an organic solvent to form a silazane compound, and heating the silazane compound at 200 to 350.degree. C. for polymerization. By melting, shaping, infusibilizing, and firing the silazane polymer, there is obtained a ceramic material.
    Type: Grant
    Filed: July 8, 1991
    Date of Patent: May 11, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshihumi Takeda, Akira Hayashida, Toshinobu Ishihara
  • Patent number: 5200371
    Abstract: Organic silazane polymers are prepared by reacting a specific organic silicon compound or a mixture of organic silicon compounds with a disilazane at a temperature of 25.degree. to 350.degree. C. in an anhydrous atmosphere. The polymers are then reacted with ammonia, thereby reducing the residual halogen in the polymers. The resulting organic silazane polymers are resistant against hydrolysis and stable and thus suitable as precursors for manufacturing ceramic fibers and sheets by shaping, infusibilizing and firing.
    Type: Grant
    Filed: December 20, 1990
    Date of Patent: April 6, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshihumi Takeda, Akira Hayashida
  • Patent number: 5183875
    Abstract: A hafnium-containing silazane polymer is obtained through a polymerization reaction of which the reactants are(A) a halide of an organic silicon compound;(B) a hafnium compound having a the formula:HfX.sub.4 [I]wherein X is chlorine or bromine, and(C) a disilazane having the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 may be the same or different and are hydrogen, methyl ethyl, phenyl or vinyl.
    Type: Grant
    Filed: December 19, 1990
    Date of Patent: February 2, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshihumi Takeda, Akira Hayashida