Patents by Inventor Akira Ikegami

Akira Ikegami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7960696
    Abstract: As an aspect for realizing accurate observation, inspection, or measurement of the contact hole with large aspect ratio, a method and a device to scan a second electron beam after scanning a first electron beam to a sample to charge the sample are proposed wherein the beam diameter of the first electron beam is made larger than the beam diameter of the second electron beam.
    Type: Grant
    Filed: September 25, 2008
    Date of Patent: June 14, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Makoto Ezumi, Satoru Iwama, Junichi Kakuta, Takahiro Sato, Akira Ikegami
  • Publication number: 20100294929
    Abstract: The present invention has the object of providing charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges.
    Type: Application
    Filed: February 23, 2010
    Publication date: November 25, 2010
    Inventors: Makoto Ezumi, Yoichi Ose, Akira Ikegami, Hideo Todokoro, Tatsuaki Ishijima, Takahiro Sato, Ritsuo Fukaya, Kazunari Asao
  • Publication number: 20100258723
    Abstract: In a scanning electron microscope, an optimum scanning method for reducing the amount of deflection of a primary electron beam and secondary electrons is determined to acquire stable images. An energy filter is used to discriminate between energy levels. The change in yield of obtained electrons is used to measure the variation in specimen potential. The time constant of charging created during electron beam irradiation is extracted. The scanning method is optimized based on the extracted time constant to reduce the distortion and magnification variation that appear in a SEM image.
    Type: Application
    Filed: June 25, 2010
    Publication date: October 14, 2010
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Akira IKEGAMI, Hideyuki KAZUMI, Koichiro TAKEUCHI, Atsushi KOBARU, Seiko OOMORI
  • Patent number: 7763113
    Abstract: The present invention provides a photocatalyst material, which can comprise a photocatalyst with an excellent adherence to a substrate and a high photocatalytic activity, and a production method thereof. The photocatalyst material (20) obtained by reacting crystal nuclei with a sol solution containing an organic metallic compound or the like and then carrying out gelation, solidification and heat treatment has a structure where more than one basic structures (10) are fixed to the surface of the substrate (1). The basic structure consists of abase portion (2) comprising crystal nuclei fixed to the surface of the substrate (1) and a photocatalyst crystalline body (3), which connects to and is extended from the base portion (2) and has a columnar structure having a hollow portion (5) formed therein. A cylindrical substrate may be used for the substrate (1). The above photocatalytic activity is further enhanced by the formation of an interior-exposing structure (8) in a shell portion (4).
    Type: Grant
    Filed: June 14, 2002
    Date of Patent: July 27, 2010
    Assignee: Andre Andes Electric Co., Ltd.
    Inventors: Azuma Ruike, Takeshi Kudo, Yuko Nakamura, Kazuhito Kudo, Fumie Kawanami, Akira Ikegami
  • Patent number: 7763852
    Abstract: In a scanning electron microscope, an optimum scanning method for reducing the amount of deflection of a primary electron beam and secondary electrons is determined to acquire stable images. An energy filter is used to discriminate between energy levels. The change in yield of obtained electrons is used to measure the variation in specimen potential. The time constant of charging created during electron beam irradiation is extracted. The scanning method is optimized based on the extracted time constant to reduce the distortion and magnification variation that appear in a SEM image.
    Type: Grant
    Filed: November 7, 2007
    Date of Patent: July 27, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Ikegami, Hideyuki Kazumi, Koichiro Takeuchi, Atsushi Kobaru, Seiko Oomori
  • Patent number: 7723681
    Abstract: For the purpose of repeatedly observing the bottom of a contact hole with a high aspect ratio, the potential of an electrostatic charge in each of a pattern to be observed and a vicinity of a range to be observed is stabilized by pre-charging a range on which to irradiate a beam of electrons while changing the range on a step-by-step basis.
    Type: Grant
    Filed: October 12, 2007
    Date of Patent: May 25, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuki Ojima, Satoru Iwama, Akira Ikegami
  • Patent number: 7700918
    Abstract: The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges.
    Type: Grant
    Filed: March 17, 2008
    Date of Patent: April 20, 2010
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Ezumi, Yoichi Ose, Akira Ikegami, Hideo Todokoro, Tatsuaki Ishijima, Takahiro Sato, Ritsuo Fukaya, Kazunari Asao
  • Publication number: 20090272899
    Abstract: An object of the present invention is to provide a method and apparatus for measuring a potential on a surface of a sample using a charged particle beam while restraining a change in the potential on the sample induced by the charged particle beam application, or detecting a compensation value for a change in a condition for the apparatus caused by the sample being electrically charged. In order to achieve the above object, the present invention provides a method and apparatus for applying a voltage to a sample so that a charged particle beam does not reach the sample (hereinafter, this may be referred to as “mirror state”) in a state in which the charged particle beam is applied toward the sample, and detecting information relating to a potential on the sample using signals obtained by that voltage application.
    Type: Application
    Filed: December 18, 2007
    Publication date: November 5, 2009
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Minoru YAMAZAKI, Akira Ikegami, Hideyuki Kazumi, Osamu Nasu
  • Publication number: 20090224170
    Abstract: An object of the present invention is to provide a scanning electron microscope suitable for monitoring apparatus conditions of the microscope itself, irrespective of the presence of charge-up, specimen inclination, and the like. In order to achieve the object, proposed is a scanning electron microscope including a function to monitor the apparatus conditions on the basis of information obtained with an electron beam reflected before reaching a specimen. Specifically, for example, while applying a negative voltage to the specimen to reflect the electron beam before the electron beam reaches the specimen, and simultaneously supplying a predetermined signal to a deflector for alignment, the scanning electron microscope monitors changes of the detected positions of the reflected electrons of the electron beam. If the above-mentioned predetermined signal is under the condition where an alignment is properly performed, the changes of the detected positions of the electrons reflect deviation of an axis.
    Type: Application
    Filed: February 25, 2009
    Publication date: September 10, 2009
    Inventors: Minoru YAMAZAKI, Akira Ikegami, Hideyuki Kazumi, Manabu Yano, Kazunari Asao, Takeshi Mizuno, Yuki Ojima
  • Patent number: 7566839
    Abstract: A contact-breaker device that can be miniaturized, realize low power consumption and low cost, and generate an irregular pulse current by causing irregular electrical conduction and insulation of a circuit. The contact-breaker device comprises: fixed terminals 12A and 12B secured at positions spaced apart from each other; and a movable member 11 capable of moving relative to the fixed terminals 12A and 12B and coming into or avoiding contact with the fixed terminals 12A and 12B based on its movement, thereby causing electrical conduction or insulation between the fixed terminals 12A and 12B; wherein the movable member 11 irregularly moves in accordance with externally applied vibration, thereby causing irregular electrical conduction or insulation between the fixed terminals 12A and 12B.
    Type: Grant
    Filed: May 27, 2005
    Date of Patent: July 28, 2009
    Assignee: Hukuba Dental Kabushiki Kaisha
    Inventors: Hiroshi Hukuba, Akira Ikegami, Keisabro Tozawa, Yukito Kohno, Akiko Saeki, legal representative, Satoshi Saeki, legal representative, Tomoko Shibata, legal representative, Kiyoshi Kobayashi, Toshio Tobe, Kiyoshi Ikegami, Kimihiro Saeki
  • Publication number: 20090084954
    Abstract: As an aspect for realizing accurate observation, inspection, or measurement of the contact hole with large aspect ratio, a method and a device to scan a second electron beam after scanning a first electron beam to a sample to charge the sample are proposed wherein the beam diameter of the first electron beam is made larger than the beam diameter of the second electron beam.
    Type: Application
    Filed: September 25, 2008
    Publication date: April 2, 2009
    Inventors: Makoto EZUMI, Satoru Iwama, Junichi Kakuta, Takahiro Sato, Akira Ikegami
  • Publication number: 20090039264
    Abstract: Disclosed herein are a method for applying, while a charged particle beam is in a state being irradiated toward the sample, a voltage to the sample so that the charged particle beam does not reach the sample (hereafter such state may be referred to as a mirror state) and detecting information on a potential of a sample using a signal obtained then, and a device for automatically adjusting conditions of the device based on the result of measuring.
    Type: Application
    Filed: August 8, 2008
    Publication date: February 12, 2009
    Inventors: Akira IKEGAMI, Minoru Yamazaki, Hideyuki Kazumi, Koichiro Takeuchi, Hisaya Murakoshi
  • Publication number: 20080265160
    Abstract: For the purpose of repeatedly observing the bottom of a contact hole with a high aspect ratio, the potential of an electrostatic charge in each of a pattern to be observed and a vicinity of a range to be observed is stabilized by pre-charging a range on which to irradiate a beam of electrons while changing the range on a step-by-step basis.
    Type: Application
    Filed: October 12, 2007
    Publication date: October 30, 2008
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Yuki OJIMA, Satoru Iwama, Akira Ikegami
  • Publication number: 20080201091
    Abstract: The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges.
    Type: Application
    Filed: March 17, 2008
    Publication date: August 21, 2008
    Inventors: Makoto Ezumi, Yoichi Ose, Akira Ikegami, Hideo Todokoro, Tatsuaki Ishijima, Takahiro Sato, Ritsuo Fukaya, Kazunari Asao
  • Publication number: 20080116375
    Abstract: In a scanning electron microscope, an optimum scanning method for reducing the amount of deflection of a primary electron beam and secondary electrons is determined to acquire stable images. An energy filter is used to discriminate between energy levels. The change in yield of obtained electrons is used to measure the variation in specimen potential. The time constant of charging created during electron beam irradiation is extracted. The scanning method is optimized based on the extracted time constant to reduce the distortion and magnification variation that appear in a SEM image.
    Type: Application
    Filed: November 7, 2007
    Publication date: May 22, 2008
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Akira Ikegami, Hideyuki Kazumi, Koichiro Takeuchi, Atsushi Kobaru, Seiko Oomori
  • Patent number: 7372028
    Abstract: The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges.
    Type: Grant
    Filed: May 8, 2006
    Date of Patent: May 13, 2008
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Ezumi, Yoichi Ose, Akira Ikegami, Hideo Todokoro, Tatsuaki Ishijima, Takahiro Sato, Ritsuo Fukaya, Kazunari Asao
  • Publication number: 20060219918
    Abstract: The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges.
    Type: Application
    Filed: May 8, 2006
    Publication date: October 5, 2006
    Inventors: Makoto Ezumi, Yoichi Ose, Akira Ikegami, Hideo Todokoro, Tatsuaki Ishijima, Takahiro Sato, Ritsuo Fukaya, Kazunari Asao
  • Patent number: 7087899
    Abstract: The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges.
    Type: Grant
    Filed: March 11, 2005
    Date of Patent: August 8, 2006
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Ezumi, Yoichi Ose, Akira Ikegami, Hideo Todokoro, Tatsuaki Ishijima, Takahiro Sato, Ritsuo Fukaya, Kazunari Asao
  • Publication number: 20060028306
    Abstract: A contact-breaker device that can be miniaturized, realize low power consumption and low cost, and generate an irregular pulse current by causing irregular electrical conduction and insulation of a circuit. The contact-breaker device comprises: fixed terminals 12A and 12B secured at positions spaced apart from each other; and a movable member 11 capable of moving relative to the fixed terminals 12A and 12B and coming into or avoiding contact with the fixed terminals 12A and 12B based on its movement, thereby causing electrical conduction or insulation between the fixed terminals 12A and 12B; wherein the movable member 11 irregularly moves in accordance with externally applied vibration, thereby causing irregular electrical conduction or insulation between the fixed terminals 12A and 12B.
    Type: Application
    Filed: May 27, 2005
    Publication date: February 9, 2006
    Applicant: HUKUBA DENTAL KABUSHIKI KAISHA
    Inventors: Hiroshi Hukuba, Akira Ikegami, Keisabro Tozawa, Yukito Kohno, Kimihiro Saeki, Kiyoshi Kobayashi, Toshio Tobe, Kiyoshi Ikegami, Akiko Saeki, Satoshi Saeki, Tomoko Shibata
  • Patent number: 6946656
    Abstract: The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges.
    Type: Grant
    Filed: July 10, 2002
    Date of Patent: September 20, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Ezumi, Yoichi Ose, Akira Ikegami, Hideo Todokoro, Tatsuaki Ishijima, Takahiro Sato, Ritsuo Fukaya, Kazunari Asao