Patents by Inventor Akitoshi Okino
Akitoshi Okino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230414811Abstract: A plasma generator apparatus generates atmospheric pressure and low temperature plasma that can communicate with a gas to generate reactive species that can be contained in a liquid. The plasma generator has a first electrode and a second electrode opposing each other with a space there between that is configured to house the gas. The generator also has a dielectric layer having a relative permittivity between 2 and 500, and a thickness of 3 mm or less; a power supply configured to supply electrical power to the first and second electrodes at a predetermined voltage and frequency, such that, based on a distance between the first and second electrodes, and the presence of the dielectric layer, atmospheric pressure, low temperature plasma is generated in the space so as to communicate with the gas disposed therein to thereby generate the reactive species.Type: ApplicationFiled: September 14, 2022Publication date: December 28, 2023Applicant: TellaPure, LLCInventors: Richard P. Lawless, Edgar Bryan Hill, Dawn Price, Hidetaka Noda, Akitoshi Okino
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Publication number: 20220403399Abstract: A method for introducing a genome editing enzyme into a plant cell includes: treating the cell with plasma; and then bringing the cell into contact with the genome editing enzyme in the presence of a di- or higher-valent metal cation.Type: ApplicationFiled: November 12, 2020Publication date: December 22, 2022Applicant: National Agriculture and Food Research OrganizationInventors: Ichiro MITSUHARA, Yuki YANAGAWA, Seiichi TOKI, Masaki IWAKAMI, Sakiko HIROSE, Etsuko KATOH, Akitoshi OKINO, Yuma SUENAGA, Shohei MORIYA, Yusuke IIJIMA
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Publication number: 20210127952Abstract: An endoscope hood having excellent antifogging properties and antifouling properties. The endoscope hood is configured to be mounted on an insertion side end of an endoscope. The endoscope hood comprises a cylindrical exterior portion and a disc portion provided in contact with an inner surface of the exterior portion. The exterior portion and the disc portion are formed integrally or separately. At least the disc portion is made of a hydrogel.Type: ApplicationFiled: June 25, 2018Publication date: May 6, 2021Applicant: SEED CO., LTD.Inventors: Yoshinori MORITA, Toshihiro TAKAMATSU, Akitoshi OKINO, Hidekazu MIYAHARA, Hiroaki KAWANO, Haruka ITO, Shiori KANEDA, Toru MATSUNAGA, Takao SATO
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Publication number: 20210007788Abstract: Provided is an end effector enabling the grasping of tissue and plasma radiation to tissue. This end effector comprises: a grasping member for grasping tissue; and a plasma generation mechanism capable of generating plasma. A pulling means is connected to the plasma generation mechanism, and by operation of the connected pulling means, grasping of tissue by the grasping means is achieved. The plasma generation means is configured so as to enable plasma to be radiated at the position where the grasping member grasps tissue.Type: ApplicationFiled: March 25, 2019Publication date: January 14, 2021Inventors: Akitoshi OKINO, Hidekazu MIYAHARA, Hiroaki KAWANO, Yuta HAYASHI, Yuma SUENAGA, Toshihiro TAKAMATSU, Manabu KUROSAWA
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Publication number: 20190233832Abstract: It was found that bringing a substance into contact with a plant cell after the plant cell is treated with plasma makes it possible to easily and highly efficiently introduce the substance into the cell without causing a damae regardless of the types of the plant and tissue from which the plant cell is derived.Type: ApplicationFiled: June 8, 2017Publication date: August 1, 2019Applicants: NATIONAL AGRICULTURE AND FOOD RESEARCH ORGANIZATION, TOKYO INSTITUTE OF TECHNOLOGYInventors: Ichiro MITSUHARA, Yuki YANAGAWA, Akitoshi OKINO, Hidekazu MIYAHARA, Hiroaki KAWANO, Tomohiro KOBAYASHI, Yosuke WATANABE
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Patent number: 10192722Abstract: A plasma treatment method subjects a long object to be treated to plasma treatment by placing the long object to be treated in contact with plasma, the density distribution of which varies while selectively passing the long object to be treated through an area having high plasma density so that a surface of the long object can be thoroughly and uniformly subjected to plasma treatment. The method is applied to a plasma treatment apparatus, and a plasma-treated long object can be obtained by the method.Type: GrantFiled: April 8, 2013Date of Patent: January 29, 2019Assignees: SUNLINE CO., LTD.Inventors: Akitoshi Okino, Hidekazu Miyahara, Hidenobu Tsutsumi, Junji Nakazaki, Takashi Ogawa, Keita Suizu
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Publication number: 20180347108Abstract: Provided are a yarn which can be easily knotted according to a common knotting method, which is high in knot strength and which can be suppressed in fading of coloration, and a method for production of the same. A yarn in which a plasma treated surface is formed on a surface of an original yarn and the plasma treated surface is covered with rubber. The yarn is preferably made of a synthetic resin, and polyethylene, wholly aromatic polyester and wholly aromatic polyamide are more preferable.Type: ApplicationFiled: July 26, 2016Publication date: December 6, 2018Applicants: SUNLINE CO., LTD., MIZUI CO., LTD.Inventors: Keita SUIZU, Takashi OGAWA, Hidenobu TSUTSUMI, Kazuya HAYASHI, Kazuaki MIZUI, Hidekazu MIYAHARA, Akitoshi OKINO
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Publication number: 20160071698Abstract: A plasma treatment method subjects a long object to be treated to plasma treatment by placing the long object to be treated in contact with plasma, the density distribution of which varies while selectively passing the long object to be treated through an area having high plasma density so that a surface of the long object can be thoroughly and uniformly subjected to plasma treatment. The method is applied to a plasma treatment apparatus, and a plasma-treated long object can be obtained by the method.Type: ApplicationFiled: April 8, 2013Publication date: March 10, 2016Inventors: Akitoshi OKINO, Hidekazu MIYAHARA, Hidenobu TSUTSUMI, Junji NAKAZAKI, Takashi OGAWA, Keita SUIZU
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Patent number: 8866389Abstract: The plasma temperature control apparatus includes a plasma generating section 40 that turns a plasma-generating gas into plasma, and a plasma-generating gas temperature control section 30 that controls the temperature of the plasma-generating gas supplied to the plasma generating section 40. The temperature of the plasma generated in the plasma generating section 40 is controlled by controlling the temperature of the plasma-generating gas.Type: GrantFiled: September 3, 2009Date of Patent: October 21, 2014Inventors: Akitoshi Okino, Hidekazu Miyahara
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Publication number: 20140271373Abstract: A liquid introducing plasma system including a plasma chamber in which a plasma is produced, a plasma generator device which creates the plasma in the chamber, and a spouting device for linearly ejecting a liquid in a linear jet to thereby introduce the liquid into the plasma chamber is disclosed. The plasma system is capable of supplying an ultra-small volume of sample liquid to the plasma while reducing consumption of electrical power required for generation of the plasma.Type: ApplicationFiled: May 12, 2014Publication date: September 18, 2014Applicant: NATIONAL UNIV. CORP. TOKYO INSTITUTE OF TECHNOLOGYInventors: Akitoshi OKINO, Hidekazu MIYAHARA, Goro OHBA
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Publication number: 20130095004Abstract: A liquid introducing plasma system including a plasma chamber in which a plasma is produced, a plasma generator device which creates the plasma in the chamber, and a spouting device for linearly ejecting a liquid in a linear jet to thereby introduce the liquid into the plasma chamber is disclosed. The plasma system is capable of supplying an ultra-small volume of sample liquid to the plasma while reducing consumption of electrical power required for generation of the plasma.Type: ApplicationFiled: July 19, 2012Publication date: April 18, 2013Applicant: Tokyo Institute of TechnologyInventors: Akitoshi OKINO, Hidekazu Miyahara, Goro Ohba
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Publication number: 20110236593Abstract: The invention is related to a treatment for a base material using plasma. Various particulate substances, porous substances, or film-state substances can be easily formed on the base material. Alternatively, a particulate substance, a porous substance, or a film-state substance, such as ceramic, can be formed even on a base material having low heat resistance. In a treatment method using plasma, in which the plasma is irradiated on a precursor substance 12 deposited on a surface of a base material 10 and a portion of the component materials of the precursor substance 12 is removed, the base material 10 is in particulate form, filamentous form, or three-dimensional form. The precursor substance 12 is liquid, gas, suspension, powder, or a solid applied to the base material. The precursor substance 12 is deposited on the base material 10 by coating, spraying, transfer, or printing.Type: ApplicationFiled: October 5, 2009Publication date: September 29, 2011Inventors: Akitoshi Okino, Hidekazu Miyahara
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Publication number: 20110156590Abstract: The plasma temperature control apparatus includes a plasma generating section 40 that turns a plasma-generating gas into plasma, and a plasma-generating gas temperature control section 30 that controls the temperature of the plasma-generating gas supplied to the plasma generating section 40. The temperature of the plasma generated in the plasma generating section 40 is controlled by controlling the temperature of the plasma-generating gas.Type: ApplicationFiled: September 3, 2009Publication date: June 30, 2011Inventors: Akitoshi Okino, Hidekazu Miyahara
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Publication number: 20100055915Abstract: [Problems] A processing apparatus and a processing method that shorten a lead time and are more reliable than before in respect of the processing performance are provided. [Means for Solving Problems] The processing apparatus has a chamber, a retaining means provided in the chamber for retaining a workpiece, an active atom supplying means for supplying an active atom into the chamber, and a chemical supplying means for supplying a chemical into the chamber. For the surface of the workpiece, dry processing by the active atom supplied from the active atom supplying means and wet processing by the chemical supplied from the chemical supplying means are performed.Type: ApplicationFiled: April 20, 2007Publication date: March 4, 2010Inventors: Masato Kanegae, Akitoshi Okino, Hidekazu Miyahara
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Publication number: 20090297406Abstract: A liquid introducing plasma system including a plasma chamber in which a plasma is produced, a plasma generator device which creates the plasma in the chamber, and a spouting device for linearly ejecting a liquid in a linear jet to thereby introduce the liquid into the plasma chamber is disclosed. The plasma system is capable of supplying an ultra-small volume of sample liquid to the plasma while reducing consumption of electrical power required for generation of the plasma.Type: ApplicationFiled: April 4, 2006Publication date: December 3, 2009Applicant: TOKYO INSTITUTE OF TECHNOLOGYInventors: Akitoshi Okino, Hidekazu Miyahara, Goro Ohba