Patents by Inventor Akiyoshi AOMATSU

Akiyoshi AOMATSU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate treatment apparatus, and substrate treatment method
    Patent number: 10096493
    Abstract: The inventive substrate treatment apparatus includes: a rotative treatment control unit which controls a first chemical liquid supplying unit and a second chemical liquid supplying unit to perform a first chemical liquid supplying step of supplying a first chemical liquid to a substrate rotated by a substrate holding and rotating mechanism and a second chemical liquid supplying step of supplying a second chemical liquid to the substrate rotated by the substrate holding and rotating mechanism after the first chemical liquid supplying step; and a cleaning control unit which controls the cleaning liquid supplying unit to spout the cleaning liquid from the cleaning liquid outlet port to supply the cleaning liquid to the cup inner wall and/or the base wall surface before start of the second chemical liquid supplying step after end of the first chemical liquid supplying step, and/or during and/or after the second chemical liquid supplying step.
    Type: Grant
    Filed: February 14, 2017
    Date of Patent: October 9, 2018
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Akiyoshi Aomatsu, Shoji Uemae, Kazuki Nakamura, Yoshinori Izumi, Nobutaka Tanahashi
  • SUBSTRATE TREATMENT APPARATUS, AND SUBSTRATE TREATMENT METHOD
    Publication number: 20170154796
    Abstract: The inventive substrate treatment apparatus includes: a rotative treatment control unit which controls a first chemical liquid supplying unit and a second chemical liquid supplying unit to perform a first chemical liquid supplying step of supplying a first chemical liquid to a substrate rotated by a substrate holding and rotating mechanism and a second chemical liquid supplying step of supplying a second chemical liquid to the substrate rotated by the substrate holding and rotating mechanism after the first chemical liquid supplying step; and a cleaning control unit which controls the cleaning liquid supplying unit to spout the cleaning liquid from the cleaning liquid outlet port to supply the cleaning liquid to the cup inner wall and/or the base wall surface before start of the second chemical liquid supplying step after end of the first chemical liquid supplying step, and/or during and/or after the second chemical liquid supplying step.
    Type: Application
    Filed: February 14, 2017
    Publication date: June 1, 2017
    Inventors: Akiyoshi AOMATSU, Shoji UEMAE, Kazuki NAKAMURA, Yoshinori IZUMI, Nobutaka TANAHASHI
  • Substrate treatment apparatus, and substrate treatment method
    Patent number: 9601358
    Abstract: The inventive substrate treatment apparatus includes: a rotative treatment control unit which controls a first chemical liquid supplying unit and a second chemical liquid supplying unit to perform a first chemical liquid supplying step of supplying a first chemical liquid to a substrate rotated by a substrate holding and rotating mechanism and a second chemical liquid supplying step of supplying a second chemical liquid to the substrate rotated by the substrate holding and rotating mechanism after the first chemical liquid supplying step; and a cleaning control unit which controls the cleaning liquid supplying unit to spout the cleaning liquid from the cleaning liquid outlet port to supply the cleaning liquid to the cup inner wall and/or the base wall surface before start of the second chemical liquid supplying step after end of the first chemical liquid supplying step, and/or during and/or after the second chemical liquid supplying step.
    Type: Grant
    Filed: August 10, 2015
    Date of Patent: March 21, 2017
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Akiyoshi Aomatsu, Shoji Uemae, Kazuki Nakamura, Yoshinori Izumi, Nobutaka Tanahashi
  • SUBSTRATE TREATMENT APPARATUS, AND SUBSTRATE TREATMENT METHOD
    Publication number: 20160045938
    Abstract: The inventive substrate treatment apparatus includes: a rotative treatment control unit which controls a first chemical liquid supplying unit and a second chemical liquid supplying unit to perform a first chemical liquid supplying step of supplying a first chemical liquid to a substrate rotated by a substrate holding and rotating mechanism and a second chemical liquid supplying step of supplying a second chemical liquid to the substrate rotated by the substrate holding and rotating mechanism after the first chemical liquid supplying step; and a cleaning control unit which controls the cleaning liquid supplying unit to spout the cleaning liquid from the cleaning liquid outlet port to supply the cleaning liquid to the cup inner wall and/or the base wall surface before start of the second chemical liquid supplying step after end of the first chemical liquid supplying step, and/or during and/or after the second chemical liquid supplying step.
    Type: Application
    Filed: August 10, 2015
    Publication date: February 18, 2016
    Inventors: Akiyoshi AOMATSU, Shoji UEMAE, Kazuki NAKAMURA, Yoshinori IZUMI, Nobutaka TANAHASHI