Patents by Inventor Akshay HARLALKA

Akshay HARLALKA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHY SUPPORT CLEANING WITH CLEANING SUBSTRATE HAVING CONTROLLED GEOMETRY AND COMPOSITION
    Publication number: 20220026819
    Abstract: Apparatus for and method of removing a contaminant from a working surface of a lithography support such as a reticle or wafer stage in an EUV or a DUV photolithography system in which a cleaning substrate provided with a coating made a selected material and configuration is pressed against the working surface so that the contaminant is transferred from the working surface to the coating.
    Type: Application
    Filed: October 31, 2019
    Publication date: January 27, 2022
    Applicant: ASML Holding N.V.
    Inventors: Keane Michael LEVY, Akshay HARLALKA