Patents by Inventor Alan Frank De Jong
Alan Frank De Jong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9958403Abstract: A method of investigating a specimen using X-ray tomography, comprising (a) mounting the specimen to a specimen holder, (b) irradiating the specimen with a beam of X-rays along a first line of sight through the specimen, and (c) detecting a flux of X-rays transmitted through the specimen and forming a first image. Then (d) repeating the steps (b) and (c) for a series of different lines of sight through the specimen, thereby producing a corresponding series of images.Type: GrantFiled: October 9, 2017Date of Patent: May 1, 2018Assignee: FEI CompanyInventors: Pavel Stejskal, Marek Un{hacek over (c)}ovský, Tomá{hacek over (s)} Vystav{hacek over (e)}l, Alan Frank de Jong, Bart Buijsse, Pierre Bleuet
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Publication number: 20180100815Abstract: A method of investigating a specimen using X-ray tomography, comprising (a) mounting the specimen to a specimen holder, (b) irradiating the specimen with a beam of X-rays along a first line of sight through the specimen, and (c) detecting a flux of X-rays transmitted through the specimen and forming a first image. Then (d) repeating the steps (b) and (c) for a series of different lines of sight through the specimen, thereby producing a corresponding series of images.Type: ApplicationFiled: October 9, 2017Publication date: April 12, 2018Applicant: FEI CompanyInventors: Pavel Stejskal, Marek Uncovský, Tomás Vystavel, Alan Frank de Jong, Bart Buijsse, Pierre Bleuet
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Patent number: 9162211Abstract: A micro-reactor is provided for observing small particles, cells, bacteria, viruses or protein molecules in a fluid. The micro-reactor includes a first channel for containing the fluid and a second channel adjacent to the first channel. A gap connects the first channel and the second channel and a window transparent to the method of inspection is provided at the gap. A static or dynamic gradient, such as a gradient in concentration of a chemical or biological material, in pressure, in temperature, in electric potential, or in magnetic field, is applied across the gap, thereby causing the particles to cross the gap. By detecting a property of the particles upstream in the first channel and then applying a pressure burst over the channels when the property meets certain pre-set criteria, only selected particles can be placed in the gap.Type: GrantFiled: October 26, 2010Date of Patent: October 20, 2015Assignee: FEI CompanyInventors: Gerard Anne Nicolaas Van Veen, Jacobus Peter Johannes Peters, Pleun Dona, Alan Frank De Jong
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Patent number: 8692196Abstract: The invention relates to a method for correcting distortions introduced by the projection system (106) of a TEM. As known to the person skilled in the art distortions may limit the resolution of a TEM, especially when making a 3D reconstruction of a feature using tomography. Also when using strain analysis in a TEM the distortions may limit the detection of strain. To this end the invention discloses a detector equipped with multipoles (152), the multipoles warping the image of the TEM in such a way that distortions introduced by the projection system are counteracted. The detector may further include a CCD or a fluorescent screen (151) for detecting the electrons.Type: GrantFiled: September 22, 2009Date of Patent: April 8, 2014Assignee: FEI CompanyInventors: Peter Christiaan Tiemeijer, Uwe Luecken, Alan Frank de Jong, Hendrik Nicolaas Slingerland
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Patent number: 8598542Abstract: Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate. The beam preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.Type: GrantFiled: March 8, 2010Date of Patent: December 3, 2013Assignee: FEI CompanyInventors: Milos Toth, Richard J. Young, Alexander Henstra, Alan Frank de Jong, Johannes Jacobus Lambertus Mulders
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Patent number: 8597565Abstract: A method for forming microscopic 3D structures. In the method according to the invention a substrate (105) is placed in a Scanning Electron Microscope (SEM). The SEM is equipped with a Gas Injection System (GIS) (110) for directing a jet of precursor fluid to the substrate. The substrate is cooled below the freezing point of the precursor gas so that a frozen layer of the precursor gas can be applied to the substrate. By now repeatedly applying a frozen layer of the precursor to the substrate and irradiate the frozen layer with an electron beam (102), a stack of frozen layers (130) is built, each layer showing an irradiated part (131) in which the precursor is converted to another material. After applying the last layer the temperature is raised so that the unprocessed precursor (132) can evaporate. As a result 3D structures with overhanging features can be built.Type: GrantFiled: March 31, 2010Date of Patent: December 3, 2013Assignee: FEI CompanyInventors: Jacob Simon Faber, Johannes Jacobus Lambertus Mulders, Alan Frank de Jong, Carmen Francisca Maria van Vilsteren
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Patent number: 8592762Abstract: A method of using a direct electron detector in a TEM, in which an image with a high intensity peak, such as a diffractogram or an EELS spectrum, is imaged on said detector. As known the high intensity peak may damage the detector. To avoid this damage, the center of the image is moved, as a result of which not one position of the detector is exposed to the high intensity, but the high intensity is smeared over the detector, displacing the high intensity peak before damage results.Type: GrantFiled: April 28, 2011Date of Patent: November 26, 2013Assignee: FEI CompanyInventors: Uwe Luecken, Alan Frank de Jong, Gerrit Cornelis van Hoften, Frank Jeroen Pieter Schuurmans
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Patent number: 8581189Abstract: A charged-particle microscopy includes irradiating a sample in measurement sessions, each having an associated beam parameter (P) value detecting radiation emitted during each measurement session, associating a measurand (M) with each measurement session, thus providing a data set (S) of data pairs {Pn, Mn}, wherein an integer in the range of 1?n?N, and processing the set (S) by: defining a Point Spread Function (K) having a kernel value Kn for each value n; defining a spatial variable (V); defining an imaging quantity (Q) having fore each value of n a value Qn that is a three-dimensional convolution of Kn and V, such that Qn=Kn*V; for each value of n, determining a minimum divergence min D(Mn?Kn*V) between Mn and Qn, solving V while applying constraints on the values Kn.Type: GrantFiled: August 10, 2012Date of Patent: November 12, 2013Assignee: FEI CompanyInventors: Faysal Boughorbel, Eric Gerardus Theodoor Bosch, Cornelis Sander Kooijman, Berend Helmerus Lich, Alan Frank de Jong
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Publication number: 20130037714Abstract: Charged-particle microscopy includes irradiating a sample in N measurement sessions, each having an associated beam parameter (P) value; Detecting radiation emitted during each measurement session, associating a measurand (M) with each measurement session, thus providing a data set (S) of data pairs {Pn, Mn}, where n is an integer in the range 1?n?N, and processing the set (S) by: Defining a Point Spread Function (K) having a kernel value Kn for each value of n; Defining a spatial variable (V); Defining an imaging quantity (Q) having for each value of n a value Qn that is a three-dimensional convolution of Kn and V, such that Qn=Kn*V; For each value of n, determining a minimum divergence min D(Mn?Kn*V) between Mn and Qn, solving for V while applying constraints on the values Kn.Type: ApplicationFiled: August 10, 2012Publication date: February 14, 2013Applicant: FEI CompanyInventors: Faysal Boughorbel, Berend Helmerus Lich, Cornelis Sander Kooijman, Eric Gerardus Theodoor Bosch, Alan Frank de Jong
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Patent number: 8268532Abstract: The invention relates to a method for forming microscopic structures. By scanning a focused particle beam over a substrate in the presence of a precursor fluid, a patterned seed layer is formed. By now growing this layer with Atomic Layer Deposition or Chemical Vapor Deposition, a high quality layer can be grown. An advantage of this method is that forming the seed layer takes relatively little time, as only a very thin layer needs to be deposited.Type: GrantFiled: December 18, 2009Date of Patent: September 18, 2012Assignee: FEI CompanyInventors: Alan Frank De Jong, Johannes Jacobus Lambertus Mulders, Wilhelmus Mathijs Marie Kessels, Adriaan Jacobus Martinus Mackus
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Publication number: 20110266439Abstract: A method of using a direct electron detector in a TEM, in which an image with a high intensity peak, such as a diffractogram or an EELS spectrum, is imaged on said detector. As known the high intensity peak may damage the detector. To avoid this damage, the centre of the image is moved, as a result of which not one position of the detector is exposed to the high intensity, but the high intensity is smeared over the detector, displacing the high intensity peak before damage results.Type: ApplicationFiled: April 28, 2011Publication date: November 3, 2011Applicant: FEI CompanyInventors: Uwe Luecken, Alan Frank de Jong, Gerrit Cornelis van Hoften, Frank Jeroen Pieter Schuurmans
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Publication number: 20110097706Abstract: The invention relates to a micro-reactor for observing small particles, cells, bacteria, viruses or protein molecules in a fluid. The micro-reactor shows a first channel formed between two layers for containing the fluid, with an inlet and an outlet, the two layers separated by a first distance. A likewise second channel with an inlet and an outlet is placed adjacent to the first channel. A gap connects the first channel and the second channel, at the gap at least one layer showing a window transparent to the method of inspection and at the window the two layers being separated by a very small distance of, for example, 1 ?m or less. The micro-reactor may be used with an optical microscope (in which all particles are in focus), inspection with a Scanning Transmission Electron Microscope (in which the range of the electrons is limited), inspection with soft X-rays in the 250-500 eV range (also showing a limited range), etc.Type: ApplicationFiled: October 26, 2010Publication date: April 28, 2011Applicants: FEI COMPANY, STICHTING HET NEDERLANDS KANKER INSTITUUTInventors: Gerard Anne Nicolaas van Veen, Jacobus Peter Johannes Peters, Pleun Dona, Alan Frank De Jong
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Patent number: 7915584Abstract: The invention relates to a TEM with a corrector (330) to improve the image quality and a phase plate (340) to improve contrast. The improved TEM comprises a correction system completely placed between the objective lens and the phase plate, and uses the lenses of the corrector to form a magnified image of the diffraction plane on the phase plate.Type: GrantFiled: February 12, 2009Date of Patent: March 29, 2011Assignee: FEI CompanyInventors: Peter Christiaan Tiemeijer, Alan Frank De Jong
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Publication number: 20100255213Abstract: A method for forming microscopic 3D structures. In the method according to the invention a substrate (105) is placed in a Scanning Electron Microscope (SEM). The SEM is equipped with a Gas Injection System (GIS) (110) for directing a jet of precursor fluid to the substrate. The substrate is cooled below the freezing point of the precursor gas so that a frozen layer of the precursor gas can be applied to the substrate. By now repeatedly applying a frozen layer of the precursor to the substrate and irradiate the frozen layer with an electron beam (102), a stack of frozen layers (130) is built, each layer showing an irradiated part (131) in which the precursor is converted to another material. After applying the last layer the temperature is raised so that the unprocessed precursor (132) can evaporate. As a result 3D structures with overhanging features can be built.Type: ApplicationFiled: March 31, 2010Publication date: October 7, 2010Applicant: FEI COMPANYInventors: Jacob Simon Faber, Johannes Jacobus Lambertus Mulders, Alan Frank de Jong, Carmen Francisca Maria van Vilsteren
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Publication number: 20100224592Abstract: Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate. The beam preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.Type: ApplicationFiled: March 8, 2010Publication date: September 9, 2010Applicant: FEI COMPANYInventors: MILOS TOTH, Richard J. Young, Alexander Henstra, Alan Frank de Jong, Johannes Jacobus Lambertus Mulders
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Publication number: 20100159370Abstract: The invention relates to a method for forming microscopic structures. By scanning a focused particle beam over a substrate in the presence of a precursor fluid, a patterned seed layer is formed. By now growing this layer with Atomic Layer Deposition or Chemical Vapour Deposition, a high quality layer can be grown. An advantage of this method is that forming the seed layer takes relatively little time, as only a very thin layer needs to be deposited.Type: ApplicationFiled: December 18, 2009Publication date: June 24, 2010Applicant: FEI COMPANYInventors: Alan Frank de Jong, Johannes Jacobus Lambertus Mulders, Wilhelmus Mathijs Marie Kessels, Adriaan Jacobus Martinus Mackus
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Publication number: 20100072366Abstract: The invention relates to a method for correcting distortions introduced by the projection system (106) of a TEM. As known to the person skilled in the art distortions may limit the resolution of a TEM, especially when making a 3D reconstruction of a feature using tomography. Also when using strain analysis in a TEM the distortions may limit the detection of strain. To this end the invention discloses a detector equipped with multipoles (152), the multipoles warping the image of the TEM in such a way that distortions introduced by the projection system are counteracted. The detector may further include a CCD or a fluorescent screen (151) for detecting the electrons.Type: ApplicationFiled: September 22, 2009Publication date: March 25, 2010Applicant: FEI COMPANYInventors: Peter Christiaan Tiemeijer, Uwe Luecken, Alan Frank De Jong, Hendrik Nicolaas Slingerland
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Publication number: 20090200464Abstract: The invention relates to a TEM with a corrector (330) to improve the image quality and a phase plate (340) to improve contrast. The improved TEM comprises a correction system completely placed between the objective lens and the phase plate, and uses the lenses of the corrector to form a magnified image of the diffraction plane on the phase plate.Type: ApplicationFiled: February 12, 2009Publication date: August 13, 2009Applicant: FEI COMPANYInventors: Peter Christiaan Tiemeijer, Alan Frank de Jong