Patents by Inventor Alan Stivers

Alan Stivers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9593477
    Abstract: Various embodiments of a modular catch basin for implementation in a high performance bioswale are disclosed. The modular catch basin containing bio-media in bio-media filters to treat urban run-off. Method of installing and maintaining the modular catch basin are also disclosed.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: March 14, 2017
    Inventor: Guy Alan Stivers
  • Patent number: 9175463
    Abstract: Various embodiments of a modular catch basin for implementation in a high performance bioswale are disclosed. The modular catch basin containing bio-media in bio-media filters to treat urban run-off. Method of installing and maintaining the modular catch basin are also disclosed.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: November 3, 2015
    Inventor: Guy Alan Stivers
  • Patent number: 9162169
    Abstract: Various embodiments of a modular catch basin for implementation in a high performance bioswale are disclosed. The modular catch basin containing bio-media in bio-media filters to treat urban run-off. Method of installing and maintaining the modular catch basin are also disclosed.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: October 20, 2015
    Inventor: Guy Alan Stivers
  • Publication number: 20060190911
    Abstract: Generation of one or more translations is described. The generated translations may be applied to a mask pattern so that the pattern may be moved to cover one or more mask defects in part or in totality.
    Type: Application
    Filed: January 14, 2005
    Publication date: August 24, 2006
    Inventor: Alan Stivers
  • Publication number: 20060066197
    Abstract: According to one aspect of the invention, a method and apparatus for producing electromagnetic radiation is provided. The apparatus may include a chamber wall enclosing a plasma emission chamber to contain a plasma emission gas. A first electrode may be within the plasma emission chamber. At least one second electrode may within the plasma emission chamber. The at least one second electrode may be rotatable about an axis thereof and positioned within the plasma emission chamber such that when a voltage is applied across the first electrode and the at least one second electrode, a plasma is generated between the first electrode and the at least one second electrode.
    Type: Application
    Filed: September 30, 2004
    Publication date: March 30, 2006
    Inventor: Alan Stivers
  • Publication number: 20050109278
    Abstract: A method of forming thin films of materials on an extreme ultraviolet multilayer surface is described. Specifically, an electron beam and a precursor gas are used to locally deposit a capping filling in a pinhole of a multilayer surface. The growth rate, purity, and spatial resolution of the capping filling may be modulated.
    Type: Application
    Filed: November 26, 2003
    Publication date: May 26, 2005
    Inventors: Ted Liang, Alan Stivers
  • Patent number: 6897157
    Abstract: The present invention discloses a method of fabricating and repairing a mask without damage and an apparatus including a holder to mount a substrate; a stage to position the holder in a chamber; a pumping system to evacuate the chamber; an imaging system to locate an opaque defect in the substrate; a gas delivery system to dispense a reactant gas towards the defect; and an electron delivery system to direct electrons towards the opaque defect.
    Type: Grant
    Filed: September 10, 2003
    Date of Patent: May 24, 2005
    Assignee: Intel Corporation
    Inventors: Ted Liang, Alan Stivers
  • Publication number: 20040048398
    Abstract: The present invention discloses a method of fabricating and repairing a mask without damage and an apparatus including a holder to mount a substrate; a stage to position the holder in a chamber; a pumping system to evacuate the chamber; an imaging system to locate an opaque defect in the substrate; a gas delivery system to dispense a reactant gas towards the defect; and an electron delivery system to direct electrons towards the opaque defect.
    Type: Application
    Filed: September 10, 2003
    Publication date: March 11, 2004
    Inventors: Ted Liang, Alan Stivers
  • Publication number: 20030000921
    Abstract: The present invention discloses a method of fabricating and repairing a mask without damage and an apparatus including a holder to mount a substrate; a stage to position the holder in a chamber; a pumping system to evacuate the chamber; an imaging system to locate an opaque defect in the substrate; a gas delivery system to dispense a reactant gas towards the defect; and an electron delivery system to direct electrons towards the opaque defect.
    Type: Application
    Filed: June 29, 2001
    Publication date: January 2, 2003
    Inventors: Ted Liang, Alan Stivers