Abstract: Bone anchor assemblies are disclosed herein that can provide for improved fixation as compared with traditional bone anchor assemblies. An exemplary assembly can include a bracket or wing that extends down from the receiver member and accommodates one or more auxiliary bone anchors that augment the fixation of the assembly's primary bone anchor. Another exemplary assembly can include a plate that is seated between the receiver member and the rod and accommodates one or more auxiliary bone anchors that augment the fixation of the assembly's primary bone anchor. Another exemplary assembly can include a hook that extends out from the receiver member to hook onto an anatomical structure or another implant to augment the fixation of the assembly's primary bone anchor. Surgical methods using the bone anchor assemblies described herein are also disclosed.

Abstract: Optical device has a carrier substrate with a surface consisting of a plastic material with a predetermined index of refraction and with first mechanical and/or chemical characteristics. The surface is coated and the coating has second mechanical and/or chemical characteristics which are different from the first characteristics. The index of refraction of the coating is different from the predetermined index of refraction of the carrier substrate surface material, varying steplessly through at least a part of the coating, up to the end index of refraction and the surface of the coating.

Abstract: A cathode arrangement for emitting electrons includes an electrode-conductive emission body that defines an emission surface from which the electrons propagate. A slit pattern is cut into the emission body for dividing the emission body into a current path. Two spaced apart conductive terminals on the emission body connect opposite ends of the current path for carrying current along the emission body that is used to heat the emission body by Joule heat.

Abstract: The invention relates to a method and an apparatus by means of which a material is vaporized in a treatment chamber by means of an electron beam. Due to controlling the inhomogenity of power distribution over the working area of the beam it becomes possible to prevent local overheating of the target material and thus of a deformation of the target surface. This is realized by oscillating the beam around its working point. The amplitude of the oscillation is, thereby, of almost a few beam diameters and this oscillation is superimposed on the momentarily working position of the beam on the target.

Abstract: An electron beam generator having an electron emission cathode adopted to be rapidly mounted to an installation, has an electronically insulating support body that is clamped on one side to a metal contact body having a large surface area. At the other side of the electrically insulating support body, a quick release device is arranged in order to rapidly mount and dismount the generator to an installation.

Abstract: A method and apparatus for controlling, regulating and measuirng the particle mass which is evaporated per unit time from a target by a charged particle beam, in particular an electron beam, comprises the varying of an impingement area of the beam on the target in a manner which is decoupled from control of the position of the impingement area and control of the mass current of the beam. The impingment area may be modulated for varying the particle mass and the particle mass can be measured by also using a modulation step in conjunction with a particle detector and a beam modulation step.

Abstract: In order to utilize a magnet arrangement having a magnetic flux density field for beam guidance in the deflection of a beam of monopolar charged particles, regions of the field having curved field lines, are modified to significantly linearize the field lines in the area of the beam. An additional flux density field is superimposed on the primary flux density field so that the field lines interact in an harmonic synthesis and so that the field lines of the resulting field in the region of interest, extend linearly. In this way, the deflection force on the beam is essentially independent of the beam position in the field direction and in the linearized region.

Abstract: A process and a system are disclosed for controlling the focusing of a beam of monopolar charged particles which is used, for example, to vaporize substances in vacuum coating systems. The beam (S) has a cross-sectional area (Q) in a plane (E.sub.1) transverse to the axis of the beam. Perpendicular to plane (E.sub.1) there is a plane (E.sub.2), the surface normal (R) to which indicates the direction in which the change in the cross-sectional area (Q) is to occur. According to the invention, flux density fields (B.sub.1, B.sub.2) are applied, which are parallel on opposite sides to plane (E.sub.2) but have opposing directions. As a result, the change in the focusing of the beam has essentially no effect on any deflection of the beam; that is, it is possible to control the focusing without exerting any significant effect on the deflection.

Abstract: The average evaporation rate over a predetermined area to be evaporated is controlled by moving an electron beam over said area wherein one characteristic of the electron beam is controlled in order to influence the evaporation rate. The electron beam is moved along a path according to stored maps wherein each position to which the electron beam is moved has assigned thereto substantially equal control values. In a first technique, each of the individual stored maps are selected in a sequential fashion to minimize the number of changes in the control value during a complete scan of the area being evaporated. In another technique, the control value of a predetermined position is compared against a predetermined number of stored control values, which is preferably all of the control values stored in a memory.