Abstract: A method for cutting a single crystal having a first polar axis includes the steps of arranging the single crystal relative to a cutting tool in such a way that the first polar axis is oriented perpendicular to an intended cutting plane; arranging at least one further single crystal having a second polar axis in such a way that the first and the second polar axis are oriented substantially parallel but opposite one another; and simultaneously guiding a cutting tool through the single crystal and the at least one further single crystal along the intended cutting plane.

Abstract: An object of the present invention is to provide, even when a single crystal of a material other than AlN is used as a crystal, an AlN bulk single crystal having fewer defects and high quality, a method for producing such an AlN bulk single crystal, and a semiconductor device. A feature is to select, as a surface 1a of a hexagonal single crystal substrate serving as a seed crystal 1, a plane inclined at an angle of 10° to 80° with respect to the C-plane (FIG. 1(a)), and to grow an AlN single crystal 2 as a growth plane 2a on the surface 1a by a sublimation method (FIG. 1(b)).

Abstract: In a storage phosphor sheet, plate or panel, comprising a needle-shaped storage or photostimulable phosphor, said needle-shaped phosphor comprising a host or matrix compound and a dopant or activator compound or element in an amount of less than 0.01 mole % versus said host or matrix compound, said needle-shaped phosphor further comprises, as inclusions or precipitates, particles having a size in the range from 10?3 ?m up to 10 ?m, wherein said particles are present as ferroelectric particles, providing said panel with ferro-electric properties.

Abstract: The invention provides a method for making a new semiconductor base material comprising thin layers of amorphous, hydrogenous carbon (a-c:H) with a specific electrical resistance of between 10.sup.1 and 10.sup.8 .OMEGA..cm and a charge carrier concentration (n+p) of between 10.sup.10 and 10.sup.18 cm.sup.-3, respectively at room temperature. The new semiconductor base material can be manufactured in thin layer technology with the application of band processes and exhibits a charge carrier mobility of at least 1 cm.sup.2.v.sup.-1.s.sup.-1.

Abstract: The invention provides electroactive passivation layers for semiconductor components comprising a thin layer of amorphous, hydrogenated carbon.

Abstract: A sensor for gases or ions with a light source, a detector and a sensor layer all of which are attached to a carrier. A thin sensor film, the absorptivity of which changes through the action of the measurement medium, is arranged on a light waveguide, the one flat side of which covers a flat end face of the light source, the end face of the carrier and a plane receiving surface of the detector. Thus, a sensitive sensor, especially for gases, is obtained in which the sensor layer, the light source and the detector form an integrated structural unit.