Patents by Inventor Alessandro ANTONCECCHI

Alessandro ANTONCECCHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11042096
    Abstract: A method for determining a characteristic of a feature in an object, the feature being disposed below a surface of the object is disclosed. The surface of the object is irradiated with a pulsed pump radiation beam so as to produce an acoustic wave in the object. The surface of the object is then irradiated with a measurement radiation beam. A portion of the measurement radiation beam scattered from the surface is received and a characteristic of the feature in the object is determined from at least a portion of the measurement radiation beam scattered from the surface within a measurement time period. A temporal intensity distribution of the pulsed pump radiation beam is selected such that in the measurement time period a signal to background ratio is greater than a signal to background ratio achieved using a single pulse of the pulsed pump radiation beam.
    Type: Grant
    Filed: May 15, 2018
    Date of Patent: June 22, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Stefan Michiel Witte, Alessandro Antoncecchi, Hao Zhang, Stephen Edward, Paulus Clemens Maria Planken, Sebastianus Adrianus Goorden, Simon Reinald Huisman, Irwan Dani Setija, David Ferdinand Vles
  • Patent number: 10788765
    Abstract: As increasing numbers of layers, using increasing numbers of specific materials, are deposited on substrates, it becomes increasingly difficult to detect alignment marks accurately for, for example, applying a desired pattern onto a substrate using a lithographic apparatus, in part due to one or more of the materials used in one or more of the layers being wholly or partially opaque to the radiation used to detect alignment marks. In a first step, the substrate is illuminated with excitation radiation. In a second step, at least one effect associated with a reflected material effect scattered by a buried structure is measured. The effect may, for example, include a physical displacement of the surface of the substrate. In a third step, at least one characteristic of the structure based on the measured effect is derived.
    Type: Grant
    Filed: January 10, 2018
    Date of Patent: September 29, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Stefan Michiel Witte, Alessandro Antoncecchi, Stephen Edward, Hao Zhang, Paulus Clemens Maria Planken, Kjeld Sijbrand Eduard Eikema, Sebastianus Adrianus Goorden, Simon Reinald Huisman, Irwan Dani Setija
  • Publication number: 20200142319
    Abstract: A method for determining a characteristic of a feature in an object, the feature being disposed below a surface of the object is disclosed. The surface of the object is irradiated with a pulsed pump radiation beam so as to produce an acoustic wave in the object. The surface of the object is then irradiated with a measurement radiation beam. A portion of the measurement radiation beam scattered from the surface is received and a characteristic of the feature in the object is determined from at least a portion of the measurement radiation beam scattered from the surface within a measurement time period. A temporal intensity distribution of the pulsed pump radiation beam is selected such that in the measurement time period a signal to background ratio is greater than a signal to background ratio achieved using a single pulse of the pulsed pump radiation beam.
    Type: Application
    Filed: May 15, 2018
    Publication date: May 7, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Stefan Michiel WITTE, Alessandro ANTONCECCHI, Hao ZHANG, Stephen EDWARD, Paulus Clemens Maria PLANKEN, Sebastianus Adrianus GOORDEN, Simon Reinaid HUISMAN, Irwan Dani SETiJA, David Ferdinand VLES
  • Publication number: 20190354026
    Abstract: As increasing numbers of layers, using increasing numbers of specific materials, are deposited on substrates, it becomes increasingly difficult to detect alignment marks accurately for, for example, applying a desired pattern onto a substrate using a lithographic apparatus, in part due to one or more of the materials used in one or more of the layers being wholly or partially opaque to the radiation used to detect alignment marks. In a first step, the substrate is illuminated with excitation radiation. In a second step, at least one effect associated with a reflected material effect scattered by a buried structure is measured. The effect may, for example, include a physical displacement of the surface of the substrate. In a third step, at least one characteristic of the structure based on the measured effect is derived.
    Type: Application
    Filed: January 10, 2018
    Publication date: November 21, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Stefan Michiel WITTE, Alessandro ANTONCECCHI, Stephen EDWARD, Hao ZHANG, Paulus Clemens Maria PLANKEN, Kjeld Sijbrand Eduard EIKEMA, Sebastianus Adrianus GOORDEN, Simon Reinald HUISMAN, Irwan Dani SETIJA