Patents by Inventor Alex Berger
Alex Berger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11966571Abstract: Disclosed herein is a computer-implemented method comprising aggregating PFAS remediation evaluation data for a plurality of remediation options and for a plurality of predefined criteria; graphically displaying the user modifiable chart comprising the plurality of graphical representations of the aggregated PFAS remediation evaluation data, wherein: each graphical representation depicts data points visually plotted with weights, the plurality of graphical representations for the plurality of predefined criteria are visually ordered according to a rank of the plurality of predefined criteria, and the weights are based on the rank of the plurality of predefined criteria; detecting a first user input modifying the rank of at least one predefined criterion; in accordance with the first user input, automatically updating the weights of the data points; and displaying an updated user modifiable chart comprising the plurality of graphical representations of the aggregated PFAS remediation evaluation data.Type: GrantFiled: July 20, 2022Date of Patent: April 23, 2024Assignee: The MITRE CorporationInventors: Gary Lee Klein, Ryan Douglas Hollins, Mark Stephen Pfaff, Brittany Allison Tracy, Elizabeth Haines, James Alex Philp, Jay Nathan Lustig, Thomas W. Whieldon, Joseph John Patrick Roberts, Christopher M. Berger, Gavin Timothy Plesko
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Publication number: 20240071796Abstract: Disclosed herein are systems and methods relating to a transfer chamber for an electronic device processing system. The transfer chamber can include a first magnetic levitation track having a face-up orientation and a second magnetic levitation track spaced from the first magnetic levitation track and having a face-down orientation. The system can include substrate carriers that move along the first and second magnetic levitation tracks where each substrate carrier includes a magnet on a bottom portion to interact with a first magnetic field and a second magnet on a top portion to interact with a second magnetic field. The system also can include at least one lift pin assembly to move the substrate carriers in a vertical direction between the first and second magnetic levitation tracks.Type: ApplicationFiled: September 7, 2023Publication date: February 29, 2024Inventors: Alex Berger, Jeffrey Hudgens, Eric Englhardt
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Patent number: 11784074Abstract: Disclosed herein are systems and methods relating to a transfer chamber for an electronic device processing system. The transfer chamber can include a first magnetic levitation track having a face-up orientation and a second magnetic levitation track spaced from the first magnetic levitation track and having a face-down orientation. The system can include substrate carriers that move along the first and second magnetic levitation tracks where each substrate carrier includes a magnet on a bottom portion to interact with a first magnetic field and a second magnet on a top portion to interact with a second magnetic field. The system also can include at least one lift pin assembly to move the substrate carriers in a vertical direction between the first and second magnetic levitation tracks.Type: GrantFiled: July 8, 2021Date of Patent: October 10, 2023Assignee: Applied Materials, Inc.Inventors: Alex Berger, Jeffrey Hudgens, Eric Englhardt
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Patent number: 11527424Abstract: Disclosed herein are systems and methods relating to a transfer chamber for an electronic device processing system. The transfer chamber can include a first magnetic levitation track having a face-up orientation and a second magnetic levitation track spaced from the first magnetic levitation track and having a face-down orientation. The system can include substrate carriers that move along the first and second magnetic levitation tracks where each substrate carrier includes a magnet on a bottom portion to interact with a first magnetic field and a second magnet on a top portion to interact with a second magnetic field. The system also can include at least one lift pin assembly to move the substrate carriers in a vertical direction between the first and second magnetic levitation tracks.Type: GrantFiled: March 20, 2020Date of Patent: December 13, 2022Assignee: Applied Materials, Inc.Inventors: Alex Berger, Jeffrey Hudgens, Eric Englhardt
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Patent number: 11519351Abstract: Operating an internal combustion engine (110) having at least two combustion chambers (1-6) and at least one exhaust-gas catalytic converter (130). In one example, a beginning of the load operation phase of the internal combustion engine (110) that adjoins a coasting phase is detected. A combustion chamber of the at least two combustion chambers (1-6) is determined as the first combustion chamber; and one of other the combustion chambers is selected as the purging combustion chamber. An exhaust gas of the purging combustion chamber is directed into the same exhaust-gas catalytic converter (130) as an exhaust gas of the first combustion chamber. A first fuel quantity is fed into the purging combustion chamber such that the first fuel quantity, prior to igniting the fuel in the purging combustion chamber, is discharged to be partially or fully non-combusted in the direction of the exhaust-gas catalytic convertor (130).Type: GrantFiled: March 29, 2022Date of Patent: December 6, 2022Assignee: Robert Bosch GmbHInventor: Alex Berger
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Publication number: 20220307438Abstract: Operating an internal combustion engine (110) having at least two combustion chambers (1-6) and at least one exhaust-gas catalytic converter (130). In one example, a beginning of the load operation phase of the internal combustion engine (110) that adjoins a coasting phase is detected. A combustion chamber of the at least two combustion chambers (1-6) is determined as the first combustion chamber; and one of other the combustion chambers is selected as the purging combustion chamber. An exhaust gas of the purging combustion chamber is directed into the same exhaust-gas catalytic converter (130) as an exhaust gas of the first combustion chamber. A first fuel quantity is fed into the purging combustion chamber such that the first fuel quantity, prior to igniting the fuel in the purging combustion chamber, is discharged to be partially or fully non-combusted in the direction of the exhaust-gas catalytic convertor (130).Type: ApplicationFiled: March 29, 2022Publication date: September 29, 2022Inventor: Alex Berger
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Publication number: 20210358788Abstract: Disclosed herein are systems and methods relating to a transfer chamber for an electronic device processing system. The transfer chamber can include a first magnetic levitation track having a face-up orientation and a second magnetic levitation track spaced from the first magnetic levitation track and having a face-down orientation. The system can include substrate carriers that move along the first and second magnetic levitation tracks where each substrate carrier includes a magnet on a bottom portion to interact with a first magnetic field and a second magnet on a top portion to interact with a second magnetic field. The system also can include at least one lift pin assembly to move the substrate carriers in a vertical direction between the first and second magnetic levitation tracks.Type: ApplicationFiled: July 8, 2021Publication date: November 18, 2021Inventors: Alex Berger, Jeffrey Hudgens, Eric Englhardt
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Publication number: 20210296150Abstract: Disclosed herein are systems and methods relating to a transfer chamber for an electronic device processing system. The transfer chamber can include a first magnetic levitation track having a face-up orientation and a second magnetic levitation track spaced from the first magnetic levitation track and having a face-down orientation. The system can include substrate carriers that move along the first and second magnetic levitation tracks where each substrate carrier includes a magnet on a bottom portion to interact with a first magnetic field and a second magnet on a top portion to interact with a second magnetic field. The system also can include at least one lift pin assembly to move the substrate carriers in a vertical direction between the first and second magnetic levitation tracks.Type: ApplicationFiled: March 20, 2020Publication date: September 23, 2021Inventors: Alex Berger, Jeffrey Hudgens, Eric Englhardt
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Patent number: 6667242Abstract: The present invention comprises a brim surrounding a wafer or wafer-like object during plasma etching in a non-contact wafer holder, such brim facilitating uniform flow of the plasma discharge around the edge of the wafer during plasma etching. The brim of the present invention avoids plasma instability and non-uniform flow typical of conventional plasma etching near the edges of the wafer being etched. The brim of the present invention, by facilitating uniform and stable plasma flows, decreases non-uniform etching. One embodiment of the present invention permits the brim to move in the axial direction from a position substantially. This permits the etching process to be controlled for more uniform and precise wafer etching as lowering the brim tends to shadow the edge region of the wafer from the plasma, reducing etching in the edge region while not significantly affecting etching in the central regions of the wafer.Type: GrantFiled: January 8, 2001Date of Patent: December 23, 2003Assignee: Tru-Si Technologies, Inc.Inventors: Oleg Siniaguine, Sergey Savastiouk, Alex Berger
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Patent number: 6448188Abstract: The present invention comprises a dynamic brake that applies restraining frictional force to a wafer in a wafer holder while the wafer holder is substantially at rest, but releases the restraining force as the processing carousel containing several wafer holders rotates about a central axis of the carousel. This dynamic brake preferably comprises a boot that passes through an opening in the wafer holder to rest on the surface of the wafer in an exclusion zone near the wafer's edge. The exclusion zone is typically no more than about 3 mm in extent. The frictional force between the boot and wafer is sufficient to prevent unwanted motion of the wafer in the holder. As the wafer holder rotates about a central axis of the processing carousel, centrifugal forces applied to the brake arising from such rotation cause the boot to pivot upward, releasing the frictional force on the wafer.Type: GrantFiled: December 14, 2001Date of Patent: September 10, 2002Assignee: Tru-Si Technologies, Inc.Inventors: Oleg Siniaguine, Alex Berger
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Patent number: 6402843Abstract: The present invention relates to a non-contact holder for substantially planar workpieces, particularly suited for holding thin workpieces without substantial distortion. The present invention includes a cylindrical chuck having a gas inlet orifice positioned at an oblique. The introduction of pressurized gas creates a vortex and vacuum attraction holding a wafer in close proximity to the chuck while the gas exiting from the chuck prevents contact between wafer and chuck. Small diameter chucks located in close proximity help the present invention avoid distortion when processing very thin workpieces. The gas exiting from the chuck of the present invention exits preferentially in a certain angular direction. Chucks are arranged on the wafer holder such that exiting gas is preferentially directed radially towards the periphery of the holder and that exiting gas is directed between adjacent chucks, not directly at another nearby chuck.Type: GrantFiled: December 7, 1999Date of Patent: June 11, 2002Assignee: TruSi Technologies, LLCInventors: Oleg Siniaguine, Sergey Savastiouk, Alex Berger, Igor Bagriy
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Patent number: 6398823Abstract: The present invention comprises a dynamic brake that applies restraining frictional force to a wafer in a wafer holder while the wafer holder is substantially at rest, but releases the restraining force as the processing carousel containing several wafer holders rotates about a central axis of the carousel. This dynamic brake preferably comprises a boot that passes through an opening in the wafer holder to rest on the surface of the wafer in an exclusion zone near the wafer's edge. The exclusion zone is typically no more than about 3mm in extent. The frictional force between the boot and wafer is sufficient to prevent unwanted motion of the wafer in the holder. As the wafer holder rotates about a central axis of the processing carousel, centrifugal forces applied to the brake arising from such rotation cause the boot to pivot upward, releasing the frictional force on the wafer.Type: GrantFiled: December 7, 1999Date of Patent: June 4, 2002Assignee: Tru-Si Technologies, Inc.Inventors: Oleg Siniaguine, Alex Berger
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Publication number: 20020055267Abstract: The present invention comprises a dynamic brake that applies restraining frictional force to a wafer in a wafer holder while the wafer holder is substantially at rest, but releases the restraining force as the processing carousel containing several wafer holders rotates about a central axis of the carousel. This dynamic brake preferably comprises a boot that passes through an opening in the wafer holder to rest on the surface of the wafer in an exclusion zone near the wafer's edge. The exclusion zone is typically no more than about 3 mm in extent. The frictional force between the boot and wafer is sufficient to prevent unwanted motion of the wafer in the holder. As the wafer holder rotates about a central axis of the processing carousel, centrifugal forces applied to the brake arising from such rotation cause the boot to pivot upward, releasing the frictional force on the wafer.Type: ApplicationFiled: December 14, 2001Publication date: May 9, 2002Inventors: Oleg Siniaguine, Alex Berger
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Publication number: 20010002613Abstract: The present invention comprises a brim surrounding a wafer or wafer-like object during plasma etching in a non-contact wafer holder, such brim facilitating uniform flow of the plasma discharge around the edge of the wafer during plasma etching. The brim of the present invention avoids plasma instability and non-uniform flow typical of conventional plasma etching near the edges of the wafer being etched. The brim of the present invention, by facilitating uniform and stable plasma flows, decreases non-uniform etching. One embodiment of the present invention permits the brim to move in the axial direction from a position substantially. This permits the etching process to be controlled for more uniform and precise wafer etching as lowering the brim tends to shadow the edge region of the wafer from the plasma, reducing etching in the edge region while not significantly affecting etching in the central regions of the wafer.Type: ApplicationFiled: January 8, 2001Publication date: June 7, 2001Inventors: Oleg Siniaguine, Sergey Savastiouk, Alex Berger
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Patent number: 6203661Abstract: The present invention comprises a brim surrounding a wafer or wafer-like object during plasma etching in a non-contact wafer holder, such brim facilitating uniform flow of the plasma discharge around the edge of the wafer during plasma etching. The brim of the present invention avoids plasma instability and non-uniform flow typical of conventional plasma etching near the edges of the wafer being etched. The brim of the present invention, by facilitating uniform and stable plasma flows, decreases non-uniform etching. One embodiment of the present invention permits the brim to move in the axial direction from a position substantially. This permits the etching process to be controlled for more uniform and precise wafer etching as lowering the brim tends to shadow the edge region of the wafer from the plasma, reducing etching in the edge region while not significantly affecting etching in the central regions of the wafer.Type: GrantFiled: December 7, 1999Date of Patent: March 20, 2001Assignee: TruSi Technologies, LLCInventors: Oleg Siniaguine, Sergey Savastiouk, Alex Berger