Abstract: A measurement system (222) for measuring the position of a stage (248) along a first axis includes a first system (260) having a first beam source (260A) that directs a first beam (260H) on a first path that is parallel with a second axis and a first redirector (260D) that redirects the first beam so that the redirected first beam (260H) is on a first redirected path that is parallel with the first axis irrespective to the orientation of the first redirector (260D) about a third axis. The measurement system (222) can include a shield (380) that protects the first beam (260H) from environmental conditions.

Abstract: Methods and apparatus for both coarsely and accurately controlling a scanning stage are disclosed. According to one aspect of the present invention, an apparatus for scanning an object includes a first stage that is coupled to a first actuator which moves the first stage along an axis, as well as a second stage that is arranged to accommodate the object. A first coupler which has first and second ends is aligned along the axis such that the first and second ends of the first coupler contact the first and second stages, respectively. A second coupler which also has first and second ends is aligned along the axis such that the first and second ends of the second coupler contact the first and second stages, respectively. When the first stage scans in a first direction, the first coupler causes the second stage to scan along the axis through the first coupler.

Abstract: A stage apparatus includes a first assembly including a target member, a second assembly including a first attracting member and a second attracting member located on opposite sides of the target member, and an actuator associated with the second assembly. The actuator of the stage apparatus moves the second assembly to adjust the relative distance between the target member and the first attracting member.

Abstract: Methods and apparatus for providing a stage apparatus which is modular and allows for reaction force cancellation are described. According to one aspect of the present invention, a stage apparatus includes a table assembly and a first stage. The table assembly supports an object, e.g., a wafer or a reticle, which is to be moved. The first stage includes a counter mass arrangement, a plurality of carriages, and a plurality of linkages. The plurality of carriages is coupled to the table assembly through the plurality of linkages such that a first carriage and a second carriage are arranged to move in substantially opposite directions along a first axis to cause the table assembly to move along a second axis while reaction forces generated when the first carriage and the second carriage are substantially cancelled by the counter mass arrangement.

Abstract: A positioning device for positioning a wafer table and an exposure apparatus including the positioning device are disclosed. The positioning device includes a housing, a piezoelectric actuator, and a structure for moving the wafer table in a second direction. The piezoelectric actuator has a first and second end. The first end is fixedly mounted to the housing and the second end is movable in a first direction in response to a change in voltage applied to the piezoelectric actuator. The structure includes a first joint, a second joint, a diagonal member, and a flexure. The first joint is movable in the first direction in response to the second end of the piezoelectric actuator moving in the first direction. The second joint is movable in the second direction to move the wafer in the second direction. The diagonal member is connected to the first and second joints at an angle with respect to the first direction.

Abstract: Methods and apparatus for providing a stage apparatus which is modular and allows for reaction force cancellation are described. According to one aspect of the present invention, a stage apparatus includes a table assembly and a first stage. The table assembly supports an object, e.g., a wafer or a reticle, which is to be moved. The first stage includes a counter mass arrangement, a plurality of carriages, and a plurality of linkages. The plurality of carriages is coupled to the table assembly through the plurality of linkages such that a first carriage and a second carriage are arranged to move in substantially opposite directions along a first axis to cause the table assembly to move along a second axis while reaction forces generated when the first carriage and the second carriage are substantially cancelled by the counter mass arrangement.

Abstract: A vibration isolation system is provided. A frame is provided. A stage supported by the frame is provided. The stage comprises a stage body supported by the frame, a first isolation stage supported by the stage body, a first stage vibration isolation device that reduces vibrations transferred from the stage body to the first isolation stage, a second isolation stage supported by the first isolation stage, and a second stage vibration isolation device that reduces vibrations transferred from the first isolation stage to the second isolation stage.

Abstract: Methods and apparatus for both coarsely and accurately controlling a scanning stage are disclosed. According to one aspect of the present invention, an apparatus for scanning an object includes a first stage that is coupled to a first actuator which moves the first stage along an axis, as well as a second stage that is arranged to accommodate the object. A first coupler which has first and second ends is aligned along the axis such that the first and second ends of the first coupler contact the first and second stages, respectively. A second coupler which also has first and second ends is aligned along the axis such that the first and second ends of the second coupler contact the first and second stages, respectively. When the first stage scans in a first direction, the first coupler causes the second stage to scan along the axis through the first coupler.

Abstract: An exposure apparatus (10) that transfers an image to a device (32) includes a stage (60) that retains the device (32) and a chamber assembly (12). The chamber assembly (12) encircles the device (32) and is used with an environmental system (26) to provide a controlled environment around the device (32). The chamber assembly (12) includes at least one fixed section (34), at least one moving section (36), and a seal assembly (38). The moving section (36) moves relative to the fixed section (34). The seal assembly (38) seals an intersection between the fixed section (34) and the moving section (36) during movement of the moving section (36). Moreover, the moving section (36) is secured to the stage (60) and moves concurrently with the stage (60). The chamber assembly (12) facilitates faster pump-outs of the chamber and enhances the access to the components of the exposure apparatus (10) to allow for field servicing and trouble shooting of the components.

Abstract: A positioning device for positioning a wafer table and an exposure apparatus including the positioning device are disclosed. The positioning device comprises a housing, a piezoelectric actuator, and a structure for moving the wafer table in a second direction. The piezoelectric actuator has a first and second end. The first end is fixedly mounted to the housing and the second end is movable in a first direction in response to a change in voltage applied to the piezoelectric actuator. The structure comprises a first joint, a second joint, a diagonal member, and a flexure. The first joint is movable in the first direction in response to the second end of the piezoelectric actuator moving in the first direction. The second joint is movable in the second direction to move the wafer in the second direction. The diagonal member is connected to the first and second joints at an angle with respect to the first direction.

Abstract: A stage assembly (10) for moving and positioning one or more objects (24) for an exposure apparatus (28) is provided herein. The stage assembly (10) includes a fine stage (14) and a coarse stage (18). The fine stage (14) includes a holder (15) that retains the object (24). The stage assembly (10) also includes a fine Y mover (32) and a fine X mover (34) that precisely move the fine stage (14) relative to the coarse stage (18). Uniquely, the fine movers (32), (34) are positioned on only one side of the holder (15). With this design, the resulting stage assembly (10) has a relatively low mass and a relatively high servo bandwidth. Further, with this design, the stage assembly (10) is readily accessible for service and a measurement system (16) can be easily positioned near the fine stage (14). The stage assembly (10) can also include an anti-gravity mechanism (40) that minimizes distortion of a stage base (12) that supports the fine stage (14) as the fine stage (14) moves above the stage base (12).

Abstract: A stage assembly (10) for moving and positioning one or more objects (24) for an exposure apparatus (28) is provided herein. The stage assembly (10) includes a fine stage (14) and a coarse stage (18). The fine stage (14) includes a holder (15) that retains the object (24). The stage assembly (10) also includes a fine Y mover (32) and a fine X mover (34) that precisely move the fine stage (14) relative to the coarse stage (18). Uniquely, the fine movers (32), (34) are positioned on only one side of the holder (15). With this design, the resulting stage assembly (10) has a relatively low mass and a relatively high servo bandwidth. Further, with this design, the stage assembly (10) is readily accessible for service and a measurement system (16) can be easily positioned near the fine stage (14). The stage assembly (10) can also include an anti-gravity mechanism (40) that minimizes distortion of a stage base (12) that supports the fine stage (14) as the fine stage (14) moves above the stage base (12).