Abstract: A method for operating a photovoltaic module array includes identifying when an atmospheric temperature drops below a dew point. A photovoltaic module is then positioned such that a module face is oriented at a first position substantially parallel to a ground surface permitting dew to form on the module face, the dew mixing with dust present on the module face. An angular orientation of the photovoltaic module is changed after dew formation so the module face is oriented at a second position angled away from the first position facilitating the removal of the dew entrained with the dust to be removed from the module face, thereby cleaning the module face.

Abstract: Magnetic multilayer structures, such as magnetic or magnetoresistive tunnel junctions (MTJs) and spin valves, having one or more spin diffusion layers to diffuse the electron spins outside the MTJ or spin valve structure to reduce the spin transfer switching current for switching the free layer.

Abstract: Magnetic multilayer structures, such as magnetic or magnetoresistive tunnel junctions (MTJs) and spin valves, having one or more spin diffusion layers to diffuse the electron spins outside the MTJ or spin valve structure to reduce the spin transfer switching current for switching the free layer.

Abstract: Devices and techniques for applying a resonant action by an applied oscillating magnetic field to a magnetic tunnel junction (MTJ) and an action of an applied DC current across the MTJ to effectuate a switching of the MTJ when writing data to the MTJ.

Abstract: Devices and techniques for applying a resonant action by an applied oscillating magnetic field to a magnetic tunnel junction (MTJ) and an action of an applied DC current across the MTJ to effectuate a switching of the MTJ when writing data to the MTJ.

Abstract: Methods of etching a carbon-rich layer on organic photoresist overlying an inorganic layer can utilize a process gas including a fluorine-containing gas, an oxygen-containing gas, and a hydrocarbon gas, and one or more optional components to generate a plasma effective to etch the carbon-rich layer with low removal of the inorganic layer. The carbon-rich layer can be removed in the same processing chamber, or alternatively can be removed in a different processing chamber, as used to remove the bulk photoresist.