Patents by Inventor Alex Phillips

Alex Phillips has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10290500
    Abstract: Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a process for forming a hard-mask.
    Type: Grant
    Filed: December 4, 2015
    Date of Patent: May 14, 2019
    Assignee: Irresistible Materials LTD
    Inventors: Alex Phillip Graham Robinson, Andeas Frommhold, Alan Brown, Tom Lada
  • Publication number: 20180373143
    Abstract: The present disclosure relates to novel positive and negative photoresist compositions containing components that are based on one or more specific metals, metal salts, and/or metal complexes and methods of using them. The photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays. The metals are characterized by high absorption cross sections and selected elastic and inelastic electron cross section.
    Type: Application
    Filed: April 22, 2016
    Publication date: December 27, 2018
    Applicant: Irresistible Materials LTD
    Inventors: Alex Phillip Graham Robinson, Andreas Frommhold, John Roth
  • Patent number: 10095112
    Abstract: The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
    Type: Grant
    Filed: February 24, 2017
    Date of Patent: October 9, 2018
    Assignee: IRRESISTIBLE MATERIALS LTD
    Inventors: Alex Phillip Graham Robinson, Alexandra McClelland, Andreas Frommhold, Dongxu Yang, John Roth
  • Publication number: 20180246408
    Abstract: The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
    Type: Application
    Filed: February 24, 2017
    Publication date: August 30, 2018
    Applicant: Irresistible Materials, LTD
    Inventors: Alex Phillip Graham Robinson, Alexandra McClelland, Andreas Frommhold, Dongxu Yang, John Roth
  • Publication number: 20170278703
    Abstract: Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a process for forming a hard-mask.
    Type: Application
    Filed: December 4, 2015
    Publication date: September 28, 2017
    Applicant: Irresistible Materials LTD
    Inventors: Alex Phillip Graham Robinson, Andeas Frommhold, Alan Brown, Tom Lada
  • Patent number: 9632409
    Abstract: The present disclosure relates to novel fullerene derivatives, positive and negative photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays.
    Type: Grant
    Filed: May 21, 2014
    Date of Patent: April 25, 2017
    Assignee: Irresistible Materials LTD
    Inventors: Alex Phillip Graham Robinson, Richard Edward Palmer, Andreas Frommhold, Dongxu Yang
  • Patent number: 9519215
    Abstract: The present application for patent discloses a composition of matter comprising: comprising a solvent; and an ester having a chemical structure chosen from (I), (II), or (III); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms and A? is an anion.
    Type: Grant
    Filed: December 21, 2015
    Date of Patent: December 13, 2016
    Assignee: IRRESISTIBLE MATERIALS, LTD
    Inventors: Alex Phillip Graham Robinson, Dongxu Yang, Andreas Frommhold, Thomas Lada, John L. Roth, Xiang Xue, Edward A. Jackson
  • Publication number: 20160246173
    Abstract: The present application for patent discloses a composition of matter comprising: comprising a solvent; and an ester having a chemical structure chosen from (I), (II), or (III); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms and A? is an anion.
    Type: Application
    Filed: December 21, 2015
    Publication date: August 25, 2016
    Inventors: Alex Phillip Graham Robinson, Dongxu Yang, Andreas Frommhold, Thomas Lada, John L. Roth, Xiang Xue, Edward A. Jackson
  • Publication number: 20160045311
    Abstract: The disclosure includes an arrangement for a handle for a catheter system that includes a first member and a second member. The handle can include a screw member positioned within the handle and configured for rotation about an axis. The screw member can include an internal thread. A carriage can be positioned within the screw member. The carriage can engage the internal thread and can be coupled to the first member. An alignment member can extend within the screw member to limit rotation of the carriage about the axis as the screw member is rotated. Rotation of the screw member in a first direction about the axis can cause the carriage to move in a first longitudinal direction within the screw member causing the first member to move in the first longitudinal direction relative to the handle.
    Type: Application
    Filed: August 13, 2015
    Publication date: February 18, 2016
    Inventors: Alex Phillip McCann, Terry W. Daniels, David Eron Flory, Kevin C. Robin
  • Patent number: 9229322
    Abstract: Disclosed and claimed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.
    Type: Grant
    Filed: October 21, 2014
    Date of Patent: January 5, 2016
    Inventors: Alex Phillip Graham Robinson, Dongxu Yang, Andreas Frommhold, Thomas Lada, John L. Roth, Xiang Xue, Edward A. Jackson
  • Publication number: 20120311029
    Abstract: An apparatus for initiating a communication across a telecommunications network, the communication being between members of a social network, comprising means for retrieving data associated with a first subscriber from a social network server, the first subscriber being a member of the social network, the data including contact information for members of the social network associated with the subscriber, means for storing the contact information on a network server, means for providing the contact information to the subscriber, means for receiving selection of contacts with whom the subscriber wishes to initiate a communication, means for receiving selection of the type of communication with which the subscriber wishes to initiate communication with the selected contacts, and means for initiating a communication with the selected contacts across a telecommunication network.
    Type: Application
    Filed: August 7, 2009
    Publication date: December 6, 2012
    Applicants: INTERNATIONAL BUSINESS MACHINES CORPORATION, VODAFONE GROUP PLC
    Inventors: Rolf Schuster, Stefan Holtel, Alex Phillips, David Barker, Jochen Kappel, Gareth Jones, Gavin Astur, Andy Strowbridge, Sima Nadler