Patents by Inventor Alex Van Zon
Alex Van Zon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8330941Abstract: Method to calibrate a substrate table position in a lithographic apparatus includes providing a substrate on the substrate table with a two dimensional arrangement of patterns; positioning the substrate table with a positioning system; measuring positions of the substrate table in at least two dimensions with a position measurement system; reading out the arrangement of patterns as a function of the measured positions of the substrate table with a pattern read out system to obtain pattern read out results; deriving position errors as a function of the measured positions of the substrate table compared with the pattern read out results; calibrating the positioning system using the position errors, the calibrating including determining drift influences of the positioning system, correcting the position errors as a function of the corresponding two dimensional position of the substrate table with the determined drift influences, and calibrating the positioning system with the corrected position errors.Type: GrantFiled: February 4, 2010Date of Patent: December 11, 2012Assignee: ASML Netherlands B.V.Inventors: Carolus Johannes Catharina Schoormans, Alex Van Zon, Johannes Mathias Theodorus Antonius Adriaens
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Publication number: 20110109889Abstract: A method is provided for positioning at least one target portion of a substrate with respect to a focal plane of a projection system. The method comprises performing height measurements of at least part of the substrate to generate height data, using predetermined correction heights to compute corrected height data for the height data. The method further comprises positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data.Type: ApplicationFiled: October 5, 2010Publication date: May 12, 2011Applicant: ASML Netherlands B.V.Inventors: CORNELIS HENRICUS VAN DE VIN, RALPH BRINKHOF, ARTHUR WINFRIED EDUARDUS MINNAERT, ALEX VAN ZON
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Patent number: 7889357Abstract: A method is provided for positioning at least one target portion of a substrate with respect to a focal plane of a projection system. The method comprises performing height measurements of at least part of the substrate to generate height data, using predetermined correction heights to compute corrected height data for the height data. The method further comprises positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data.Type: GrantFiled: June 7, 2010Date of Patent: February 15, 2011Assignee: ASML Netherlands B.V.Inventors: Cornelis Henricus Van De Vin, Ralph Brinkhof, Arthur Winfried Eduardus Minnaert, Alex Van Zon
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Publication number: 20100245798Abstract: A method is provided for positioning at least one target portion of a substrate with respect to a focal plane of a projection system. The method comprises performing height measurements of at least part of the substrate to generate height data, using predetermined correction heights to compute corrected height data for the height data. The method further comprises positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data.Type: ApplicationFiled: June 7, 2010Publication date: September 30, 2010Applicant: ASML Netherlands B.V.Inventors: Cornelis Henricus VAN DE VIN, Ralph Brinkhof, Arthur Winfried, Eduardus Minnaert, Alex Van Zon
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Patent number: 7746484Abstract: A method is provided for positioning at least one target portion of a substrate with respect to a focal plane of a projection system. The method comprises performing height measurements of at least part of the substrate to generate height data, using predetermined correction heights to compute corrected height data for the height data. The method further comprises positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data.Type: GrantFiled: May 23, 2007Date of Patent: June 29, 2010Assignee: ASML Netherlands B.V.Inventors: Cornelis Henricus Van De Vin, Ralph Brinkhof, Arthur Winfried Eduardus Minnaert, Alex Van Zon
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Publication number: 20100134778Abstract: Method to calibrate a substrate table position in a lithographic apparatus includes providing a substrate on the substrate table with a two dimensional arrangement of patterns; positioning the substrate table with a positioning system; measuring positions of the substrate table in at least two dimensions with a position measurement system; reading out the arrangement of patterns as a function of the measured positions of the substrate table with a pattern read out system to obtain pattern read out results; deriving position errors as a function of the measured positions of the substrate table compared with the pattern read out results; calibrating the positioning system using the position errors, the calibrating including determining drift influences of the positioning system, correcting the position errors as a function of the corresponding two dimensional position of the substrate table with the determined drift influences, and calibrating the positioning system with the corrected position errors.Type: ApplicationFiled: February 4, 2010Publication date: June 3, 2010Applicant: ASML Netherlands B.V.Inventors: Carolus Johannes Catharina SCHOORMANS, Alex VAN ZON, Johannes Mathias, Theodorus, Antonius, ADRIAENS
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Patent number: 7684011Abstract: Method to calibrate a substrate table position in a lithographic apparatus includes providing a substrate on the substrate table with a two dimensional arrangement of patterns; positioning the substrate table with a positioning system; measuring positions of the substrate table in at least two dimensions with a position measurement system; reading out the arrangement of patterns as a function of the measured positions of the substrate table with a pattern read out system to obtain pattern read out results; deriving position errors as a function of the measured positions of the substrate table compared with the pattern read out results; calibrating the positioning system using the position errors, the calibrating including determining drift influences of the positioning system, correcting the position errors as a function of the corresponding two dimensional position of the substrate table with the determined drift influences, and calibrating the positioning system with the corrected position errors.Type: GrantFiled: March 2, 2007Date of Patent: March 23, 2010Assignee: ASML Netherlands B.V.Inventors: Carolus Johannes Catharina Schoormans, Alex Van Zon, Johannes Mathias Theodorus Antonius Adriaens
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Publication number: 20080212055Abstract: Method to calibrate a substrate table position in a lithographic apparatus includes providing a substrate on the substrate table with a two dimensional arrangement of patterns; positioning the substrate table with a positioning system; measuring positions of the substrate table in at least two dimensions with a position measurement system; reading out the arrangement of patterns as a function of the measured positions of the substrate table with a pattern read out system to obtain pattern read out results; deriving position errors as a function of the measured positions of the substrate table compared with the pattern read out results; calibrating the positioning system using the position errors, the calibrating including determining drift influences of the positioning system, correcting the position errors as a function of the corresponding two dimensional position of the substrate table with the determined drift influences, and calibrating the positioning system with the corrected position errors.Type: ApplicationFiled: March 2, 2007Publication date: September 4, 2008Applicant: ASML Netherlands B.V.Inventors: Carolus Johannes Catharina Schoormans, Alex Van Zon, Johannes Mathias Theodorus Antonius Adriaens
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Publication number: 20080151204Abstract: A method is provided for positioning a target portion of a substrate with respect to a focal plane of a projection system. The substrate may include one or more target portions. The method includes performing height measurements of at least part of the substrate to generate height data. The at least part of the substrate is at least partially outside the target portion that is to be positioned with respect to the projection system. The method further includes using predetermined correction heights to compute corrected height data for the height data corresponding to the at least part of the substrate outside the target portion, and positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data.Type: ApplicationFiled: December 21, 2006Publication date: June 26, 2008Applicant: ASML Netherlands B.V.Inventors: Cornelis Henricus Van De Vin, Ralph Brinkhof, Arthur Winfried Eduardus Minnaert, Alex Van Zon
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Publication number: 20080151265Abstract: A method is provided for positioning at least one target portion of a substrate with respect to a focal plane of a projection system. The method comprises performing height measurements of at least part of the substrate to generate height data, using predetermined correction heights to compute corrected height data for the height data. The method further comprises positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data.Type: ApplicationFiled: May 23, 2007Publication date: June 26, 2008Applicant: ASML Netherlands B.V.Inventors: Cornelis Henricus Van De Vin, Ralph Brinkhof, Arthur Winfried Eduardus Minnaert, ALex Van Zon
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Patent number: 7012672Abstract: A lithographic projection apparatus and method of manufacturing devices using such an apparatus is presented. The apparatus includes a level sensor to measure the height of a wafer in a plurality of points. The height info is sent to a processor which is arranged to create a measured height map using input from the level sensor. In one embodiment of the invention, the processor is also arranged to calculate an average die topology using the measured height map in order to produce a raw height map of the surface of the substrate, and to detect any focus spots on said surface of said substrate using the raw height map. By subtracting the average die topology, focus spots can be located more accurately than before.Type: GrantFiled: March 10, 2004Date of Patent: March 14, 2006Assignee: ASML Netherlands B.V.Inventors: Tasja Van Rhee, Thomas Josephus Maria Castenmiller, Willem Herman Gertruda Anna Koenen, Alex Van Zon, Michael Broers
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Publication number: 20040239905Abstract: A lithographic projection apparatus and method of manufacturing devices using such an apparatus is presented. The apparatus includes a level sensor to measure the height of a wafer in a plurality of points. The height info is sent to a processor which is arranged to create a measured height map using input from the level sensor. In one embodiment of the invention, the processor is also arranged to calculate an average die topology using the measured height map in order to produce a raw height map of the surface of the substrate, and to detect any focus spots on said surface of said substrate using the raw height map. By subtracting the average die topology, focus spots can be located more accurately than before.Type: ApplicationFiled: March 10, 2004Publication date: December 2, 2004Applicant: ASML Netherlands B.V.Inventors: Tasja Van Rhee, Thomas Josephus Maria Castenmiller, Willem Herman Gertruda Anna Koenen, Alex Van Zon, Michael Broers