Patents by Inventor Alexander C. Ruege

Alexander C. Ruege has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9880110
    Abstract: Disclosed is an improved system and method to evaluate the status of a material. The system and method are operative to identify flaws and measure the erosion profile and thickness of different materials, including refractory materials, using electromagnetic waves. The system is designed to reduce a plurality of reflections, associated with the propagation of electromagnetic waves launched into the material under evaluation, by a sufficient extent so as to enable detection of electromagnetic waves of interest reflected from remote discontinuities of the material. Furthermore, the system and method utilize a configuration and signal processing techniques that reduce clutter and enable the isolation of electromagnetic waves of interest. Moreover, the launcher is impedance matched to the material under evaluation, and the feeding mechanism is designed to mitigate multiple reflection effects to further suppress clutter.
    Type: Grant
    Filed: November 8, 2016
    Date of Patent: January 30, 2018
    Assignee: PANERATECH, INC.
    Inventors: Alexander C. Ruege, Yakup Bayram
  • Patent number: 9810646
    Abstract: Disclosed is an improved system and method to treat an edge of a material for determining a property of such material through measurements of electromagnetic waves. The system and method are operative to mitigate the adverse effects caused by the interaction between an electromagnetic wave and an edge of a sample of a material under test. The system and method define a configuration to block and significantly attenuate the propagation of electromagnetic waves that may reach an edge of the sample being evaluated. This configuration reduces the undesired effects caused by edge-diffraction that may interfere with the measurement of desired electromagnetic waves for material evaluation. As a result, a property of a material under test can be measured more accurately, especially near the edges of such material. In addition, the system and method enable the evaluation of a small-size sample of a material.
    Type: Grant
    Filed: April 24, 2015
    Date of Patent: November 7, 2017
    Assignee: PANERATECH, INC.
    Inventors: Yakup Bayram, Alexander C. Ruege, Eric K. Walton
  • Publication number: 20170234808
    Abstract: Disclosed is an improved system and method to evaluate the status of a material. The system and method are operative to identify flaws and measure the erosion profile and thickness of different materials, including refractory materials, using electromagnetic waves. The system is designed to reduce a plurality of reflections, associated with the propagation of electromagnetic waves launched into the material under evaluation, by a sufficient extent so as to enable detection of electromagnetic waves of interest reflected from remote discontinuities of the material. Furthermore, the system and method utilize a configuration and signal processing techniques that reduce clutter and enable the isolation of electromagnetic waves of interest. Moreover, the launcher is impedance matched to the material under evaluation, and the feeding mechanism is designed to mitigate multiple reflection effects to further suppress clutter.
    Type: Application
    Filed: November 8, 2016
    Publication date: August 17, 2017
    Inventors: Alexander C. Ruege, Yakup Bayram
  • Patent number: 9488601
    Abstract: Disclosed is an improved system and method to evaluate the status of a material. The system and method are operative to identify flaws and measure the erosion profile and thickness of different materials, including refractory materials, using electromagnetic waves. The system is designed to reduce a plurality of reflections, associated with the propagation of electromagnetic waves launched into the material under evaluation, by a sufficient extent so as to enable detection of electromagnetic waves of interest reflected from remote discontinuities of the material. Furthermore, the system and method utilize a configuration and signal processing techniques that reduce clutter and enable the isolation of electromagnetic waves of interest. Moreover, the launcher is impedance matched to the material under evaluation, and the feeding mechanism is designed to mitigate multiple reflection effects to further suppress clutter.
    Type: Grant
    Filed: March 26, 2014
    Date of Patent: November 8, 2016
    Assignee: PANERATECH, INC.
    Inventors: Alexander C. Ruege, Yakup Bayram, Eric K. Walton
  • Publication number: 20150355109
    Abstract: Disclosed is an improved system and method to treat an edge of a material for determining a property of such material through measurements of electromagnetic waves. The system and method are operative to mitigate the adverse effects caused by the interaction between an electromagnetic wave and an edge of a sample of a material under test. The system and method define a configuration to block and significantly attenuate the propagation of electromagnetic waves that may reach an edge of the sample being evaluated. This configuration reduces the undesired effects caused by edge-diffraction that may interfere with the measurement of desired electromagnetic waves for material evaluation. As a result, a property of a material under test can be measured more accurately, especially near the edges of such material. In addition, the system and method enable the evaluation of a small-size sample of a material.
    Type: Application
    Filed: April 24, 2015
    Publication date: December 10, 2015
    Inventors: Yakup Bayram, Alexander C. Ruege, Eric K. Walton
  • Publication number: 20150276577
    Abstract: Disclosed is an improved system and method to evaluate the status of a material. The system and method are operative to identify flaws and measure the erosion profile and thickness of different materials, including refractory materials, using electromagnetic waves. The system is designed to reduce a plurality of reflections, associated with the propagation of electromagnetic waves launched into the material under evaluation, by a sufficient extent so as to enable detection of electromagnetic waves of interest reflected from remote discontinuities of the material. Furthermore, the system and method utilize a configuration and signal processing techniques that reduce clutter and enable the isolation of electromagnetic waves of interest. Moreover, the launcher is impedance matched to the material under evaluation, and the feeding mechanism is designed to mitigate multiple reflection effects to further suppress clutter.
    Type: Application
    Filed: March 26, 2014
    Publication date: October 1, 2015
    Applicant: PaneraTech, Inc.
    Inventors: Alexander C. Ruege, Yakup Bayram, Eric K. Walton