Patents by Inventor Alexander Kosyachkov
Alexander Kosyachkov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7622149Abstract: A physical vapor deposition method for the deposition of thioaluminate phosphor compositions includes providing one or more source materials including an intermetallic barium aluminum compound, a barium aluminum alloy or a protected barium metal, providing an activator species and effecting deposition of the one or more source materials and activator species as a phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminance and colors required for TV applications.Type: GrantFiled: March 4, 2005Date of Patent: November 24, 2009Assignee: Ifire IP CorporationInventors: Yue (Helen) Xu, Alexander Kosyachkov, Guo Liu, Xingwei Wu, Joe Acchione
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Patent number: 7556721Abstract: The present invention relates to novel thiosilicate phosphor compositions. The invention is further a physical vapor deposition method for the deposition of rare earth activated thiosilicate phosphor compositions comprising providing at least one or more source materials where the source materials may comprise a barium silicon alloy, an intermetallic barium silicon compound, a protected barium metal and combinations thereof; providing an activator species; and effecting deposition of the one or more source materials and activator species as a thin film phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminance and colors required for TV applications.Type: GrantFiled: October 29, 2005Date of Patent: July 7, 2009Assignee: IFIRE IP CorporationInventors: Alexander Kosyachkov, Vincent Joseph Alfred Pugliese, Joe Acchione, Stephen Charles Cool
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Patent number: 7534504Abstract: An improved fine grained zinc sulfide phosphor is provided for use in ac electroluminescent displays. The fine-grained zinc sulfide phosphor film exhibits improved luminance and may be used in conjunction with a structure or substance to minimize or prevent reaction of the fine grained phosphor with oxygen. The invention is particularly applicable to zinc sulfide phosphors used in electroluminescent displays that employ thick dielectric layers subject to high processing temperatures to form and activate the phosphor films.Type: GrantFiled: August 27, 2003Date of Patent: May 19, 2009Assignee: Ifire IP CorporationInventors: Guo Liu, Alexander Kosyachkov, Yue (Helen) Xu, James Alexander Stiles
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Patent number: 7282123Abstract: The invention is a novel sputter target and deposition method for multi-element thin film phosphors for thick film dielectric electroluminescent displays in which the deposited phosphors provide a high luminance and colors required for TV applications. The method comprises sputtering a single composite target in a low pressure sputtering atmosphere that comprises gases containing reactive species and non-reactive species. The composite target comprising a matrix phase and an inclusion phase, or two matrix phases, wherein one of the phases comprises one or more metallic elements that contribute to the composition of the phosphor and the other of the phases comprises the remaining elements that contribute to the composition of the phosphor.Type: GrantFiled: December 15, 2003Date of Patent: October 16, 2007Assignee: Ifire Technology Corp.Inventor: Alexander Kosyachkov
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Patent number: 7129633Abstract: A novel structure is provided to improve the operating stability of thioaluminate based phosphors used in ac thick film dielectric electroluminescent displays. The novel structure comprises a rare earth activated alkaline earth thioaluminate phosphor thin film layer and a silicon oxynitride layer provided directly adjacent the top and/or bottom of the phosphor thin film layer, wherein said silicon oxynitride layer comprises a composition of Si3NxOyHz where 2?x?4, 0<y?2 and 0?z?1. The invention is particularly applicable to phosphors used in electroluminescent displays that employ thick dielectric layers subject to high processing temperatures to form and activate the phosphor films.Type: GrantFiled: September 12, 2003Date of Patent: October 31, 2006Assignee: Ifire Technology Inc.Inventor: Alexander Kosyachkov
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Publication number: 20060091000Abstract: The present invention relates to novel thiosilicate phosphor compositions. The invention is further a physical vapour deposition method for the deposition of rare earth activated thiosilicate phosphor compositions comprising providing at least one or more source materials where the source materials may comprise a barium silicon alloy, an intermetallic barium silicon compound, a protected barium metal and combinations thereof; providing an activator species; and effecting deposition of the one or more source materials and activator species as a thin film phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminance and colors required for TV applications.Type: ApplicationFiled: October 29, 2005Publication date: May 4, 2006Inventors: Alexander Kosyachkov, Vincent Joseph Pugliese, Joe Acchione, Stephen Cool
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Publication number: 20050202162Abstract: A physical vapour deposition method for the deposition of thioaluminate phosphor compositions includes providing one or more source materials including an intermetallic barium aluminum compound, a barium aluminum alloy or a protected barium metal, providing an activator species and effecting deposition of the one or more source materials and activator species as a phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminance and colors required for TV applications.Type: ApplicationFiled: March 4, 2005Publication date: September 15, 2005Inventors: Yue (Helen) Xu, Alexander Kosyachkov, Guo Liu, Xingwei Wu, Joe Acchione
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Publication number: 20050035704Abstract: A novel structure is provided to improve the operating stability of thioaluminate based phosphors used in ac thick film dielectric electroluminescent displays. The novel structure comprises a rare earth activated alkaline earth thioaluminate phosphor thin film layer and a silicon oxynitride layer provided directly adjacent the top and/or bottom of the phosphor thin film layer, wherein said silicon oxynitride layer comprises a composition of Si3NxOyHz where 2?x?4, 0<y?2 and 0?z?1. The invention is particularly applicable to phosphors used in electroluminescent displays that employ thick dielectric layers subject to high processing temperatures to form and activate the phosphor films.Type: ApplicationFiled: September 12, 2003Publication date: February 17, 2005Inventor: Alexander Kosyachkov
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Patent number: 6841045Abstract: A method of deposition of a phosphor in a single-source sputtering process, in which the phosphor is selected from the group consisting of ternary, quaternary or higher thioaluminate, thiogallate and thioindate phosphors, and composites thereof, synthesized with cations selected from Groups IIA and IIB of the Periodic Table of Elements. The phosphor is of a pre-determined composition of elements. The method comprising sputtering in a hydrogen sulphide atmosphere from a single source composition so as to deposit a composition on a substrate. The composition of the targets of the single source has a relative increase in concentration of elements of the phosphor that have a lower atomic weight compared to other elements in said phosphor. The relative increase is controlled such that deposition of the pre-determined composition is effected on the substrate. Preferred phosphors are barium thioaluminate (BaAl2S4:Eu), and barium magnesium thioaluminates.Type: GrantFiled: August 5, 2002Date of Patent: January 11, 2005Assignee: iFire Technology Inc.Inventor: Alexander Kosyachkov
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Patent number: 6793782Abstract: The invention is a novel sputter deposition process for thin film phosphors that provide high luminance and colors required for TV applications.Type: GrantFiled: December 21, 2001Date of Patent: September 21, 2004Assignee: IFIRE Technology Inc.Inventor: Alexander Kosyachkov
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Publication number: 20040161631Abstract: An improved fine grained zinc sulfide phosphor is provided for use in ac electroluminescent displays. The fine-grained zinc sulfide phosphor film exhibits improved luminance and may be used in conjunction with a structure or substance to minimize or prevent reaction of the fine grained phosphor with oxygen. The invention is particularly applicable to zinc sulfide phosphors used in electroluminescent displays that employ thick dielectric layers subject to high processing temperatures to form and activate the phosphor films.Type: ApplicationFiled: August 27, 2003Publication date: August 19, 2004Inventors: Guo Liu, Alexander Kosyachkov, Yue Xu, Jim Stiles
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Publication number: 20040149567Abstract: The invention is a novel sputter target and deposition method for multi-element thin film phosphors for thick film dielectric electroluminescent displays in which the deposited phosphors provide a high luminance and colors required for TV applications. The method comprises sputtering a single composite target in a low pressure sputtering atmosphere that comprises gases containing reactive species and non-reactive species. The composite target comprising a matrix phase and an inclusion phase, or two matrix phases, wherein one of the phases comprises one or more metallic elements that contribute to the composition of the phosphor and the other of the phases comprises the remaining elements that contribute to the composition of the phosphor.Type: ApplicationFiled: December 15, 2003Publication date: August 5, 2004Inventor: Alexander Kosyachkov
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Publication number: 20030118864Abstract: The invention is a novel sputter deposition process for thin film phosphors that provide high luminance and colors required for TV applications.Type: ApplicationFiled: December 21, 2001Publication date: June 26, 2003Inventor: Alexander Kosyachkov
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Patent number: 6504557Abstract: A print head suitable for use in an image forming system is provided having a pair of electrode layers separated by an isolating structure that includes a semiconductor. The presence of the semiconductor, such as a semiconductor layer, extends the life of the print head by reducing degradation of the print head.Type: GrantFiled: May 29, 2001Date of Patent: January 7, 2003Assignee: Xerox CorporationInventors: Alexander A. Kosyachkov, Igor Kubelik, Lech Jedral, Dung Nguen, Rossitza Ivanova
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Publication number: 20030000829Abstract: A method of deposition of a phosphor in a single-source sputtering process, in which the phosphor is selected from the group consisting of ternary, quaternary or higher thioaluminate, thiogallate and thioindate phosphors, and composites thereof, synthesized with cations selected from Groups IIA and IIB of the Periodic Table of Elements. The phosphor is of a pre-determined composition of elements. The method comprising sputtering in a hydrogen sulphide atmosphere from a single source composition so as to deposit a composition on a substrate. The composition of the targets of the single source has a relative increase in concentration of elements of the phosphor that have a lower atomic weight compared to other elements in said phosphor. The relative increase is controlled such that deposition of the pre-determined composition is effected on the substrate. Preferred phosphors are barium thioaluminate (BaAl2S4:Eu), and barium magnesium thioaluminates.Type: ApplicationFiled: August 5, 2002Publication date: January 2, 2003Applicant: iFire Technology Inc.Inventor: Alexander Kosyachkov
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Publication number: 20020180858Abstract: A print head suitable for use in an image forming system is provided having a pair of electrode layers separated by an isolating structure that includes a semiconductor. The presence of the semiconductor, such as a semiconductor layer, extends the life of the print head by reducing degradation of the print head.Type: ApplicationFiled: May 29, 2001Publication date: December 5, 2002Applicant: Xerox CorporationInventors: Alexander A. Kosyachkov, Igor Kubelik, Lech Jedral, Dung Nguen, Rossitza Ivanova
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Patent number: 6447654Abstract: A method of deposition of a phosphor in a single-source sputtering process, in which the phosphor is selected from the group consisting of ternary, quaternary or higher thioaluminate, thiogallate and thioindate phosphors, and composites thereof, synthesized with cations selected from Groups IIA and IIB of the Periodic Table of Elements. The phosphor is of a pre-determined composition of elements. The method comprising sputtering in a hydrogen sulphide atmosphere from a single source composition so as to deposit a composition on a substrate. The composition of the targets of the single source has a relative increase in concentration of elements of the phosphor that have a lower atomic weight compared to other elements in said phosphor. The relative increase is controlled such that deposition of the predetermined composition is effected on the substrate. Preferred phosphors are barium thioaluminate (BaAl2S4:Eu), and barium magnesium thioaluminates.Type: GrantFiled: May 29, 2001Date of Patent: September 10, 2002Assignee: iFire Technology Inc.Inventor: Alexander Kosyachkov