Patents by Inventor Alexander Svizher
Alexander Svizher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11164307Abstract: A metrology system and metrology methods are disclosed. The metrology system includes an illumination sub-system, a collection sub-system, a detector, and a controller. The controller is configured to receive an image of an overlay target on a sample, determine an apparent overlay between two working zones along a measurement direction based on the image, and calculate an overlay between the two sample layers by dividing the apparent overlay by a Moiré gain to compensate for Moiré interference.Type: GrantFiled: July 21, 2020Date of Patent: November 2, 2021Assignee: KLA CorporationInventors: Yoel Feler, Mark Ghinovker, Evgeni Gurevich, Vladimir Levinski, Alexander Svizher
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Patent number: 11137692Abstract: Metrology targets, design methods and measurement methods thereof are provided with periodic structure(s) which are oblique with respect to orthogonal production axes X and Y of the lithography tool—enabling more accurate overlay measurements of devices having diagonal (oblique, tilted) elements such as DRAM devices. One or more oblique periodic structure(s) may be used to provide one- or two-dimensional signals, with respect to one or more layers, possibly providing overlay measurements for multiple steps applied to one layer. The oblique periodic structure(s) may be used to modify current metrology target designs (e.g., imaging targets and/or scatterometry targets) or to design new targets, and measurement algorithms may be adjusted respectively to derive signals from the oblique periodic structure(s) and/or to provide pre-processed images thereof. The disclosed targets are process compatible and reflect more accurately the device overlays with respect to various process steps.Type: GrantFiled: November 29, 2018Date of Patent: October 5, 2021Assignee: KLA-Tencor CorporationInventors: Yoel Feler, Mark Ghinovker, Alexander Svizher, Vladimir Levinski, Inna Tarshish-Shapir
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Patent number: 10761022Abstract: A scatterometry metrology system, configured to measure diffraction signals from at least one target having respective at least one measurement direction, the scatterometry metrology system having at least one field stop having edges which are slanted with respect to the at least one measurement direction.Type: GrantFiled: March 29, 2016Date of Patent: September 1, 2020Assignee: KLA-Tencor CorporationInventors: Tzahi Grunzweig, Alexander Svizher
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Patent number: 10699969Abstract: Methods applicable in metrology modules and tools are provided, which enable adjusting metrology measurement parameters with respect to process variation, without re-initiating metrology recipe setup. Methods comprise, during an initial metrology recipe setup, recording a metrology process window and deriving baseline information therefrom, and during operation, quantifying the process variation with respect to the baseline information, and adjusting the metrology measurement parameters within the metrology process window with respect to the quantified process variation. The quick adjustment of metrology parameters avoids metrology-related process delays and releases prior art bottlenecks related thereto. Models of effects of various process variation factors on the metrology measurements may be used to enhance the derivation of required metrology tuning and enable their application with minimal delays to the production process.Type: GrantFiled: April 5, 2018Date of Patent: June 30, 2020Assignee: KLA-Tencor CorporationInventors: Einat Peled, Eran Amit, Alexander Svizher, Yuval Lamhot, Noga Sella, Wei-Te Cheng
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Publication number: 20200124982Abstract: Metrology targets, design methods and measurement methods thereof are provided with periodic structure(s) which are oblique with respect to orthogonal production axes X and Y of the lithography tool—enabling more accurate overlay measurements of devices having diagonal (oblique, tilted) elements such as DRAM devices. One or more oblique periodic structure(s) may be used to provide one- or two-dimensional signals, with respect to one or more layers, possibly providing overlay measurements for multiple steps applied to one layer. The oblique periodic structure(s) may be used to modify current metrology target designs (e.g., imaging targets and/or scatterometry targets) or to design new targets, and measurement algorithms may be adjusted respectively to derive signals from the oblique periodic structure(s) and/or to provide pre-processed images thereof. The disclosed targets are process compatible and reflect more accurately the device overlays with respect to various process steps.Type: ApplicationFiled: November 29, 2018Publication date: April 23, 2020Inventors: Yoel Feler, Mark Ghinovker, Alexander Svizher, Vladimir Levinski, Inna Tarshish-Shapir
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Patent number: 10591406Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.Type: GrantFiled: April 6, 2016Date of Patent: March 17, 2020Assignee: KLA-Tencor CorporationInventors: Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Paykin Irina, Alexander Svizher, Meir Aloni, Guy Ben Dov, Hadar Shalmoni, Vladimir Levinski
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Patent number: 10527952Abstract: Scatterometry overlay targets and measurement methods are provided, which are configured to detect and eliminate process-related errors and illumination-related errors from overlay measurements of the targets. Targets comprise at least three cells associated with a measurement direction, wherein at least two of the cells comprise periodic structures at different target layers, having a same pitch and opposite offsets between the two cells, and at least an additional cell comprises a periodic structure with the same pitch at only one of the target layers. The additional cell(s) are used to detect irregularities in the respective periodic structure(s), enable estimation of process quality, provide reference images, enhance metrology simulations and provide mitigation of errors in critical process steps. Measurement methods incorporate scatterometry measurements ion the additional cell(s) for these purposes.Type: GrantFiled: October 24, 2017Date of Patent: January 7, 2020Assignee: KLA-Tencor CorporationInventors: Tzahi Grunzweig, Jordan Pio, Alexander Svizher
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Publication number: 20190074227Abstract: Methods applicable in metrology modules and tools are provided, which enable adjusting metrology measurement parameters with respect to process variation, without re-initiating metrology recipe setup. Methods comprise, during an initial metrology recipe setup, recording a metrology process window and deriving baseline information therefrom, and during operation, quantifying the process variation with respect to the baseline information, and adjusting the metrology measurement parameters within the metrology process window with respect to the quantified process variation. The quick adjustment of metrology parameters avoids metrology-related process delays and releases prior art bottlenecks related thereto. Models of effects of various process variation factors on the metrology measurements may be used to enhance the derivation of required metrology tuning and enable their application with minimal delays to the production process.Type: ApplicationFiled: April 5, 2018Publication date: March 7, 2019Inventors: Einat Peled, Eran Amit, Alexander Svizher, Yuval Lamhot, Noga Sella, Wei-Te Cheng
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Patent number: 10203247Abstract: A system for providing illumination to a measurement head for optical metrology is configured to combine illumination beams from a plurality of illumination sources to deliver illumination at one or more selected wavelengths to the measurement head. The intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. Illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.Type: GrantFiled: December 5, 2016Date of Patent: February 12, 2019Assignee: KLA-Tencor CorporationInventors: Gregory R. Brady, Andrei V. Shchegrov, Lawrence D. Rotter, Derrick A. Shaughnessy, Anatoly Shchemelinin, Ilya Bezel, Muzammil A. Arain, Anatoly A. Vasiliev, James Andrew Allen, Oleg Shulepov, Andrew V. Hill, Ohad Bachar, Moshe Markowitz, Yaron Ish-Shalom, Ilan Sela, Amnon Manassen, Alexander Svizher, Maxim Khokhlov, Avi Abramov, Oleg Tsibulevsky, Daniel Kandel, Mark Ghinovker
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Publication number: 20180373167Abstract: Scatterometry overlay targets and measurement methods are provided, which are configured to detect and eliminate process-related errors and illumination-related errors from overlay measurements of the targets. Targets comprise at least three cells associated with a measurement direction, wherein at least two of the cells comprise periodic structures at different target layers, having a same pitch and opposite offsets between the two cells, and at least an additional cell comprises a periodic structure with the same pitch at only one of the target layers. The additional cell(s) are used to detect irregularities in the respective periodic structure(s), enable estimation of process quality, provide reference images, enhance metrology simulations and provide mitigation of errors in critical process steps. Measurement methods incorporate scatterometry measurements ion the additional cell(s) for these purposes.Type: ApplicationFiled: October 24, 2017Publication date: December 27, 2018Inventors: Tzahi Grunzweig, Jordan Pio, Alexander Svizher
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Patent number: 9851300Abstract: Methods and metrology modules and tools are provided, which minimize an estimated overlay variation measure at misalignment vector values obtained from a derived functional form of an overlay linear response to non-periodic effects. Provided methods further quantifying target noise due to the non-periodic effects using multiple repeated overlay measurements of the target cells, calculating an ensemble of overlay measurements between the cells over the multiple measurement repeats and expressing the target noise as a statistical derivative of the calculated overlay measurements. Sub-ensembles may be selected to further characterize the target noise. Various outputs include optimized scanning patterns, target noise metrics and recipe and target optimization.Type: GrantFiled: April 3, 2015Date of Patent: December 26, 2017Assignee: KLA-Tencor CorporationInventors: Barak Bringoltz, Ofer Zaharan, Amnon Manassen, Nadav Carmel, Victoria Naipak, Alexander Svizher, Tzahi Grunzweig, Daniel Kandel
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Patent number: 9739702Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.Type: GrantFiled: January 22, 2014Date of Patent: August 22, 2017Assignee: KLA-Tencor CorporationInventors: Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Irina Paykin, Alexander Svizher, Meir Aloni, Guy Ben Dov, Hadar Shalmoni, Vladimir Levinski
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Publication number: 20170146399Abstract: A system for providing illumination to a measurement head for optical metrology is configured to combine illumination beams from a plurality of illumination sources to deliver illumination at one or more selected wavelengths to the measurement head. The intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. Illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.Type: ApplicationFiled: December 5, 2016Publication date: May 25, 2017Inventors: Gregory R. Brady, Andrei V. Shchegrov, Lawrence D. Rotter, Derrick A. Shaughnessy, Anatoly Shchemelinin, Ilya Bezel, Muzammil A. Arain, Anatoly A. Vasiliev, James Andrew Allen, Oleg Shulepov, Andrew V. Hill, Ohad Bachar, Moshe Markowitz, Yaron Ish-Shalom, Ilan Sela, Amnon Manassen, Alexander Svizher, Maxim Khokhlov, Avi Abramov, Oleg Tsibulevsky, Daniel Kandel, Mark Ghinovker
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Patent number: 9581430Abstract: Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.Type: GrantFiled: October 18, 2013Date of Patent: February 28, 2017Assignee: KLA-Tencor CorporationInventors: Amnon Manassen, Ohad Bachar, Daria Negri, Boris Golovanevsky, Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Paykin Irina, Alexander Svizher, Meir Aloni, Guy Ben Dov, Hadar Shalmoni, Vladimir Levinski
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Patent number: 9512985Abstract: The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.Type: GrantFiled: February 22, 2013Date of Patent: December 6, 2016Assignee: KLA-Tencor CorporationInventors: Gregory R. Brady, Andrei V. Shchegrov, Lawrence D. Rotter, Derrick Shaughnessy, Anatoly Shchemelinin, Ilya Bezel, Muzammil A. Arain, Anatoly A. Vasiliev, James Andrew Allen, Oleg Shulepov, Andrew V. Hill, Ohad Bachar, Moshe Markowitz, Yaron Ish-Shalom, Ilan Sela, Amnon Manassen, Alexander Svizher, Maxim Khokhlov, Avi Abramov, Oleg Tsibulevsky, Daniel Kandel, Mark Ghinovker
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Publication number: 20160216197Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.Type: ApplicationFiled: April 6, 2016Publication date: July 28, 2016Inventors: Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Paykin Irina, Alexander Svizher, Meir Aloni, Guy Ben Dov, Hadar Shalmoni, Vladimir Levinski
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Publication number: 20160209327Abstract: A scatterometry metrology system, configured to measure diffraction signals from at least one target having respective at least one measurement direction, the scatterometry metrology system having at least one field stop having edges which are slanted with respect to the at least one measurement direction.Type: ApplicationFiled: March 29, 2016Publication date: July 21, 2016Inventors: Tzahi Grunzweig, Alexander Svizher
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Patent number: 9164397Abstract: The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens.Type: GrantFiled: July 22, 2011Date of Patent: October 20, 2015Assignee: KLA-Tencor CorporationInventors: Amnon Manassen, Daniel Kandel, Moshe Baruch, Joel L. Seligson, Alexander Svizher, Guy Cohen, Efraim Rotem, Ohad Bachar, Daria Negri, Noam Sapiens
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Publication number: 20150204664Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.Type: ApplicationFiled: January 22, 2014Publication date: July 23, 2015Applicant: KLA-Tencor CorporationInventors: Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Irina Paykin, Alexander Svizher, Meir Aloni, Guy BEN DOV, Hadar Shalmoni, Vladimir Levinski
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Patent number: 9080971Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.Type: GrantFiled: October 16, 2014Date of Patent: July 14, 2015Assignee: KLA-Tencor Corp.Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem