Patents by Inventor Alexander Tritchkov

Alexander Tritchkov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • IC layout parsing for multiple masks
    Patent number: 8713483
    Abstract: A method for separating features in a target layout into different mask layouts for use in a photolithographic process. Features of a target layer are searched for features having a predefined shape. In one embodiment, portions of the feature having the predefined shape divided into two or more sub-features and at least one sub-feature are not considered when separating the features into two or more mask layouts. In another embodiment, features having a predefined shape are cut to form two or more sub-features and all features and sub-features are considered when separating the features of the target layout into the two or more mask layouts.
    Type: Grant
    Filed: June 5, 2007
    Date of Patent: April 29, 2014
    Assignee: Mentor Graphics Corporation
    Inventors: Alexander Tritchkov, Emile Y. Sahouria, Le Hong
  • Process for fabrication of alternating phase shift masks
    Publication number: 20090098469
    Abstract: Design rules are described for a phase alternating shift mask for minimum chrome width and maximum segment length, where an embodiment employs during a cleaning process of the mask a megasonic power of 50 Watts at 1 MHz, and 30 Watts at 3 MHz. Some embodiments utilize an dry etch Carbon Tetrafluoride and Dioxygen based process. Other embodiments are described and claimed.
    Type: Application
    Filed: October 12, 2007
    Publication date: April 16, 2009
    Inventors: Kishore K. Chakravorty, Sven Henrichs, Yi-Ping Liu, Henry Yun, Brian Irving, Alexander Tritchkov, Karmen Yung
  • IC LAYOUT PARSING FOR MULTIPLE MASKS
    Publication number: 20080307381
    Abstract: A method for separating features in a target layout into different mask layouts for use in a photolithographic process. Features of a target layer are searched for features having a predefined shape. In one embodiment, portions of the feature having the predefined shape divided into two or more sub-features and at least one sub-feature are not considered when separating the features into two or more mask layouts. In another embodiment, features having a predefined shape are cut to form two or more sub-features and all features and sub-features are considered when separating the features of the target layout into the two or more mask layouts.
    Type: Application
    Filed: June 5, 2007
    Publication date: December 11, 2008
    Inventors: Alexander Tritchkov, Emile Y. Sahouria, Le Hong
  • Combining image imbalance compensation and optical proximity correction in designing phase shift masks
    Publication number: 20060051680
    Abstract: This application includes techniques for applying image imbalance compensation by aperture sizing and optical proximity approximation in designing a phase mask.
    Type: Application
    Filed: September 3, 2004
    Publication date: March 9, 2006
    Inventors: Alexander Tritchkov, Seongtae Jeong