Abstract: The lifetime of optical components used in deep-UV (DUV) excimer laser systems, including systems in a MOPA configuration, can be increased by reducing the intensity of pulses incident upon these components. In one approach, an output pulse can be “stretched” in order to reduce the peak power of the pulse. A pulse stretching component can be used, which can be mounted outside the laser enclosure with a horizontal beam path in order to provide a delay line with a minimum impact on the laser system footprint. The horizontal beam path also can minimize the number of optical components in the arm containing the high power beam. A beamsplitting prism can be used with the delay line to avoid the rapid degradation of coatings otherwise exposed to intense UV beams. The prism can expand the beam in the delay line in order to minimize beam intensity and losses due to reflection.

Abstract: Two pulse sequences are delivered by two lasers. A rotating segmented mirror having one or more reflective areas and one or more transmissive areas is rotated synchronously with the delivery of the pulse sequences to transmit pulses from one sequence, and to reflect pulses from the other sequence at intervals.

Abstract: A pulse-stretcher has an optical delay loop including a beamsplitter. The beamsplitter divides an input pulse into a temporal sequence of pulse replicas, a first of which is transmitted by the beamsplitter and the remainder of which are reflected by the beamsplitter along the path of the transmitted replica. The sequence of replicas form an initially stretched pulse having a longer duration and lower peak power than the input pulse. A prism cooperative with the delay loop reflects the initially stretched pulse back into the delay loop along a path laterally displaced from the replica path. The beamsplitter divides the initially stretched pulse into a temporal sequence of pulse replicas propagating along a common path to form a finally stretched pulse, having a longer duration and a lower peak power than the initially stretched pulse. The finally stretched pulse has a sequence of power peaks.

Abstract: Laser systems have a line-narrowed master oscillator and a power oscillator for amplifying the output of the master oscillator. The power oscillator includes optical arrangements for limiting the bandwidth of radiation that can be amplified. The limited amplification bandwidth of the power oscillator is relatively broad compared to that of the output of the master oscillator, but narrower than would be the case without the bandwidth limiting arrangements. The bandwidth narrowing arrangements of the power oscillator function primarily to restrict the bandwidth of amplified spontaneous emission generated by the power oscillator.

Abstract: The lifetime of optical components used in deep-UV (DUV) excimer laser systems, including systems in a MOPA configuration, can be increased by reducing the intensity of pulses incident upon these components. In one approach, an output pulse can be “stretched” in order to reduce the peak power of the pulse. A pulse stretching component can be used, which can be mounted outside the laser enclosure with a horizontal beam path in order to provide a delay line with a minimum impact on the laser system footprint. The horizontal beam path also can minimize the number of optical components in the arm containing the high power beam. A beamsplitting prism can be used with the delay line to avoid the rapid degradation of coatings otherwise exposed to intense UV beams. The prism can expand the beam in the delay line in order to minimize beam intensity and losses due to reflection.