Patents by Inventor Alexei V. Smirnov

Alexei V. Smirnov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11435764
    Abstract: Mass flow controllers and methods for controlling mass flow controllers are disclosed. A method includes providing a gas through a thermal mass flow sensor of the mass flow controller and processing a sensor signal from the thermal mass flow sensor to produce a flow signal. A total nonlinearity characteristic function is determined based on nonlinearity effects on the flow signal and includes a first and second nonlinearity component function based on a first and second source of nonlinearity respectively. The total nonlinearity characteristic function is calibrated, and the first nonlinearity component function is adjusted responsive to changes in the first source of nonlinearity, after which the total nonlinearity characteristic function is updated. The flow signal is corrected to produce a corrected flow signal using the total nonlinearity characteristic function. A valve of the mass flow controller is controlled using the corrected flow signal and a setpoint signal.
    Type: Grant
    Filed: March 30, 2021
    Date of Patent: September 6, 2022
    Assignee: Hitachi Metals, Ltd.
    Inventor: Alexei V. Smirnov
  • Patent number: 11327510
    Abstract: A multi-chamber rate-of-change flow meter system and methods for operating the same are disclosed. The multi-chamber rate-of-change flow meter system includes a collection of N chambers, means for drawing a gas into or out of the collection of N chambers, N pressure sensors corresponding one of the N chambers, and means for redistributing the gas among the chambers. A measurement module is coupled to the pressure sensors to obtain a rate of change of pressure in each of the chambers due to the redistribution of the gas and calculate a flow rate of the gas flowing into or out of the collection of N chambers based upon the rate of change of pressure in each of the chambers.
    Type: Grant
    Filed: April 26, 2019
    Date of Patent: May 10, 2022
    Assignee: Hitachi Metals, Ltd.
    Inventor: Alexei V. Smirnov
  • Patent number: 11209298
    Abstract: Mass flow controllers and methods for controlling mass flow controllers are disclosed. A method includes providing a gas through a thermal mass flow sensor of the mass flow controller and processing a flow sensor signal from the thermal mass flow sensor of the mass flow controller to produce a measured flow signal. The measured flow signal is corrected to produce a corrected flow signal by gradually changing non-linearity correction to the measured flow signal when a flow rate of the gas changes. A valve of the mass flow controller is controlled using the corrected flow signal and a setpoint signal.
    Type: Grant
    Filed: April 3, 2019
    Date of Patent: December 28, 2021
    Assignee: Hitachi Metals, Ltd.
    Inventor: Alexei V. Smirnov
  • Patent number: 11073845
    Abstract: Mass flow controllers and methods for correcting flow inconsistencies associated with parasitic flow of a fluid in mass flow controllers are disclosed. A method includes obtaining a pressure measurement signal of the fluid generated by a pressure sensor and receiving a flow sensor signal of the fluid generated by a flow sensor. An estimated parasitic flow signal is generated using the pressure measurement signal, and the flow sensor signal is accelerated to produce an accelerated flow sensor signal with a bandwidth that is comparable to that of the estimated parasitic flow signal. A corrected flow signal is generated using the accelerated flow sensor signal and the estimated parasitic flow signal to control the mass flow controller.
    Type: Grant
    Filed: August 26, 2019
    Date of Patent: July 27, 2021
    Assignee: Hitachi Metals, Ltd.
    Inventor: Alexei V. Smirnov
  • Publication number: 20210190575
    Abstract: Mass flow controllers and methods for controlling mass flow controllers are disclosed. One method includes providing a process gas through a flow sensor of the mass flow controller, obtaining a gas-adjusted sensitivity coefficient for the flow sensor, and obtaining gas-adjusted nonlinearity data for the flow sensor. The method also includes producing gas-adjusted characterization data for the flow sensor using the gas-adjusted sensitivity coefficient and the gas-adjusted nonlinearity data. A flow value from the gas-adjusted characterization data is obtained using a flow sensor signal from the flow sensor, and the flow value is used along with a setpoint signal to control a valve of the mass flow controller.
    Type: Application
    Filed: December 19, 2019
    Publication date: June 24, 2021
    Inventor: Alexei V. Smirnov
  • Patent number: 11041749
    Abstract: Mass flow controllers and methods for controlling mass flow controllers are disclosed. One method includes providing a process gas through a flow sensor of the mass flow controller, obtaining a gas-adjusted sensitivity coefficient for the flow sensor, and obtaining gas-adjusted nonlinearity data for the flow sensor. The method also includes producing gas-adjusted characterization data for the flow sensor using the gas-adjusted sensitivity coefficient and the gas-adjusted nonlinearity data. A flow value from the gas-adjusted characterization data is obtained using a flow sensor signal from the flow sensor, and the flow value is used along with a setpoint signal to control a valve of the mass flow controller.
    Type: Grant
    Filed: December 19, 2019
    Date of Patent: June 22, 2021
    Assignee: Hitachi Metals, Ltd.
    Inventor: Alexei V. Smirnov
  • Patent number: 10982985
    Abstract: Mass flow meters and mass flow controllers that include mass flow meters are disclosed. A mass flow meter includes a main flow path for a gas, and a bypass with a length, L, within the main flow path. The bypass includes a continuous flow section including a plurality of continuous capillary tubes that each have a length, L. The bypass also includes n flow segments forming n?1 spaces within the bypass where n is greater than or equal to 2, and each of the flow segments has a plurality of capillary tubes. The mass flow meter also includes at least one thermal sensor including a sensor tube, and the sensor tube is positioned across at least one of the flow segments to divert a portion of the gas around the at least one of the flow segments and provide a measured flow signal in response to the diverted portion of the gas.
    Type: Grant
    Filed: February 3, 2020
    Date of Patent: April 20, 2021
    Assignee: Hitachi Metals, Ltd.
    Inventors: Alexei V. Smirnov, Ryan Johnson
  • Publication number: 20210064067
    Abstract: Mass flow controllers and methods for correcting flow inconsistencies associated with parasitic flow of a fluid in mass flow controllers are disclosed. A method includes obtaining a pressure measurement signal of the fluid generated by a pressure sensor and receiving a flow sensor signal of the fluid generated by a flow sensor. An estimated parasitic flow signal is generated using the pressure measurement signal, and the flow sensor signal is accelerated to produce an accelerated flow sensor signal with a bandwidth that is comparable to that of the estimated parasitic flow signal. A corrected flow signal is generated using the accelerated flow sensor signal and the estimated parasitic flow signal to control the mass flow controller.
    Type: Application
    Filed: August 26, 2019
    Publication date: March 4, 2021
    Inventor: Alexei V. Smirnov
  • Publication number: 20200284631
    Abstract: Mass flow meters and mass flow controllers that include mass flow meters are disclosed. A mass flow meter includes a main flow path for a gas, and a bypass with a length, L, within the main flow path. The bypass includes a continuous flow section including a plurality of continuous capillary tubes that each have a length, L. The bypass also includes n flow segments forming n?1 spaces within the bypass where n is greater than or equal to 2, and each of the flow segments has a plurality of capillary tubes. The mass flow meter also includes at least one thermal sensor including a sensor tube, and the sensor tube is positioned across at least one of the flow segments to divert a portion of the gas around the at least one of the flow segments and provide a measured flow signal in response to the diverted portion of the gas.
    Type: Application
    Filed: February 3, 2020
    Publication date: September 10, 2020
    Inventors: Alexei V. Smirnov, Ryan Johnson
  • Patent number: 10534375
    Abstract: Mass flow control systems and methods for controlling the mass flow rate of a gas through a primary conduit are disclosed. One mass flow control system includes a primary conduit for directing a flow of a gas and an adjustment system configured to divert a portion of the gas from the primary conduit to a secondary conduit and provide an adjustment signal that changes when a composition of the gas changes. A mass flow controller is operatively coupled to the primary conduit to control a primary flow rate of the gas. The mass flow controller includes a valve to control the primary flow rate of the gas and a control loop configured to receive the adjustment signal and control the valve to provide the primary flow rate of the gas at a set point.
    Type: Grant
    Filed: August 9, 2018
    Date of Patent: January 14, 2020
    Assignee: Hitachi Metals, Ltd.
    Inventors: Ryan Johnson, Alexei V. Smirnov, Patrick Albright, Cy Jordan, Arun Nagarajan
  • Patent number: 10533982
    Abstract: Systems and method for detecting a concentration of a gas in a gas stream are disclosed. A method includes receiving a gas stream including a carrier gas and a processing gas. Bridge signals of a mass flow sensor are used to produce a processing-gas concentration signal and a gas-stream mass flow rate signal. The gas stream is controlled so a mass flow rate of the processing gas equals a processing-gas-setpoint signal. In some variations, the processing-gas-concentration signal is produced using an upstream temperature of the gas stream and a bridge-derived temperature.
    Type: Grant
    Filed: May 15, 2019
    Date of Patent: January 14, 2020
    Assignee: HITACHI METALS, LTD.
    Inventors: Patrick Albright, Ryan Johnson, Alexei V. Smirnov
  • Publication number: 20190361468
    Abstract: A multi-chamber rate-of-change flow meter system and methods for operating the same are disclosed. The multi-chamber rate-of-change flow meter system includes a collection of N chambers, means for drawing a gas into or out of the collection of N chambers, N pressure sensors corresponding one of the N chambers, and means for redistributing the gas among the chambers. A measurement module is coupled to the pressure sensors to obtain a rate of change of pressure in each of the chambers due to the redistribution of the gas and calculate a flow rate of the gas flowing into or out of the collection of N chambers based upon the rate of change of pressure in each of the chambers.
    Type: Application
    Filed: April 26, 2019
    Publication date: November 28, 2019
    Inventor: Alexei V. Smirnov
  • Patent number: 10473500
    Abstract: A mass flow controller and associated methods for providing indicated flow from the mass flow controller are disclosed. The method may include obtaining a measured flow signal indicative of a mass flow rate of a fluid that is controlled by the mass flow controller and filtering the measured flow signal to generate indicated flow that provides a representation of the actual mass flow rate of the fluid. The indicated flow is provided to an operator of the mass flow controller, and a rate of change of the mass flow rate of the fluid is determined based upon samples of the measured flow signal. A time constant used in connection with the filtering is then adjusted based upon the rate of change of the mass flow rate.
    Type: Grant
    Filed: January 20, 2014
    Date of Patent: November 12, 2019
    Assignee: Hitachi Metals, Ltd.
    Inventor: Alexei V. Smirnov
  • Publication number: 20190331515
    Abstract: Mass flow controllers and methods for controlling mass flow controllers are disclosed. A method includes providing a gas through a thermal mass flow sensor of the mass flow controller and processing a flow sensor signal from the thermal mass flow sensor of the mass flow controller to produce a measured flow signal. The measured flow signal is corrected to produce a corrected flow signal by gradually applying non-linearity correction to the measured flow signal when a flow rate of the gas changes. A valve of the mass flow controller is controlled using the corrected flow signal and a setpoint signal.
    Type: Application
    Filed: April 3, 2019
    Publication date: October 31, 2019
    Inventor: Alexei V. Smirnov
  • Publication number: 20190265218
    Abstract: Systems and method for detecting a concentration of a gas in a gas stream are disclosed. A method includes receiving a gas stream including a carrier gas and a processing gas. Bridge signals of a mass flow sensor are used to produce a processing-gas concentration signal and a gas-stream mass flow rate signal. The gas stream is controlled so a mass flow rate of the processing gas equals a processing-gas-setpoint signal. In some variations, the processing-gas-concentration signal is produced using an upstream temperature of the gas stream and a bridge-derived temperature.
    Type: Application
    Filed: May 15, 2019
    Publication date: August 29, 2019
    Inventors: Patrick Albright, Ryan Johnson, Alexei V. Smirnov
  • Patent number: 10295518
    Abstract: Systems and method for detecting a concentration of a gas in a gas stream are disclosed. A method includes receiving a gas stream including a carrier gas and a processing gas. Bridge voltages of a mass flow sensor are used to produce a processing-gas concentration signal and a gas-stream mass flow rate signal. The gas stream is controlled so a mass flow rate of the processing gas equals a processing-gas-setpoint signal. In some variations, the processing-gas-concentration signal is produced using an upstream temperature of the gas stream and a bridge-derived temperature. In other variations, the processing-gas-concentration signal is produced using a top voltage of the mass flow sensor and the gas-stream mass flow rate signal.
    Type: Grant
    Filed: December 14, 2016
    Date of Patent: May 21, 2019
    Assignee: Hitachi Metals, Ltd.
    Inventors: Patrick Albright, Ryan Johnson, Alexei V. Smirnov
  • Publication number: 20180348798
    Abstract: Mass flow control systems and methods for controlling the mass flow rate of a gas through a primary conduit are disclosed. One mass flow control system includes a primary conduit for directing a flow of a gas and an adjustment system configured to divert a portion of the gas from the primary conduit to a secondary conduit and provide an adjustment signal that changes when a composition of the gas changes. A mass flow controller is operatively coupled to the primary conduit to control a primary flow rate of the gas. The mass flow controller includes a valve to control the primary flow rate of the gas and a control loop configured to receive the adjustment signal and control the valve to provide the primary flow rate of the gas at a set point.
    Type: Application
    Filed: August 9, 2018
    Publication date: December 6, 2018
    Inventors: Ryan Johnson, Alexei V. Smirnov, Patrick Albright, Cy Jordan, Arun Nagarajan
  • Patent number: 10126761
    Abstract: Gas insensitive systems and methods for controlling the mass flow rate of a gas through a primary conduit are disclosed. The method includes producing, in a secondary conduit, an assessment flow that has a changing pressure; calculating a first measure of a flow rate of the assessment flow based upon a rate-of-change of the pressure of the assessment flow; and measuring the assessment flow with a mass flow meter that is affected by the composition of the gas to produce a second measure of the assessment flow. An adjustment signal is generated based upon a difference between the first measure and the second measure, and a gas-corrected flow signal is generated by adjusting a measured-flow signal of a mass flow controller with the adjustment signal. The gas-corrected flow signal is used by the mass flow controller to control a flow rate of the gas through the primary conduit.
    Type: Grant
    Filed: December 21, 2016
    Date of Patent: November 13, 2018
    Assignee: Hitachi Metals, Ltd.
    Inventors: Ryan Johnson, Alexei V. Smirnov, Patrick Albright, Cy Jordan, Arun Nagarajan
  • Patent number: 10041825
    Abstract: Mass flow controllers with on-tool diagnostic capabilities and methods for on-tool diagnostics are disclosed. A mass flow controller includes a differential voltage processing component to provide a first output that is indicative of a differential voltage between second and fourth nodes of a bridge circuit and a top voltage processing component provides a second output indicative of a top voltage between the first node and the third node of the bridge circuit. Top-and-differential voltage reference data stored in non-volatile memory defines a characteristic curve relating top voltage reference values to corresponding differential voltage reference values. A sensor analysis component obtains a top and differential voltage pair and assesses whether the top and differential voltage pair deviates from the characteristic curve to determine whether the sensing element circuit has changed since the top-and-differential voltage reference data was stored in the non-volatile memory.
    Type: Grant
    Filed: December 15, 2017
    Date of Patent: August 7, 2018
    Assignee: HITACHI METALS, LTD.
    Inventors: Alexei V. Smirnov, Patrick Albright
  • Publication number: 20180106658
    Abstract: Mass flow controllers with on-tool diagnostic capabilities and methods for on-tool diagnostics are disclosed. A mass flow controller includes a differential voltage processing component to provide a first output that is indicative of a differential voltage between second and fourth nodes of a bridge circuit and a top voltage processing component provides a second output indicative of a top voltage between the first node and the third node of the bridge circuit. Top-and-differential voltage reference data stored in non-volatile memory defines a characteristic curve relating top voltage reference values to corresponding differential voltage reference values. A sensor analysis component obtains a top and differential voltage pair and assesses whether the top and differential voltage pair deviates from the characteristic curve to determine whether the sensing element circuit has changed since the top-and-differential voltage reference data was stored in the non-volatile memory.
    Type: Application
    Filed: December 15, 2017
    Publication date: April 19, 2018
    Inventors: Alexei V. Smirnov, Patrick Albright