Patents by Inventor Alexey Kondyurin

Alexey Kondyurin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9526814
    Abstract: Medical balloons are provided that have enhanced properties, such as enhanced puncture and scratch resistance.
    Type: Grant
    Filed: February 16, 2006
    Date of Patent: December 27, 2016
    Assignee: BOSTON SCIENTIFIC SCIMED, INC.
    Inventors: Jan Weber, Liliana Atanasoska, Alexey Kondyurin
  • Publication number: 20100023111
    Abstract: A method for modifying an ePTFE surface by plasma immersion ion implantation includes the steps of providing an ePTFE material in a chamber suitable for plasma treatment; providing a continuous low energy plasma discharge onto the sample; and applying negative high voltage pulses of short duration to form a high energy ion flux from the plasma discharge to generate ions which form free radials on the surface of the ePTFE material without changing the molecular and/or physical structure below the surface to define a modified ePTFE surface. The step of applying the high voltage pulses modifies the surface of the ePTFE without destroying the node and fibril structure of the ePTFE, even when the step of applying the high voltage pulses etches and/or carburizes the surface of the ePTFE. The modified surface may have a depth of about 30 nm to about 500 nm. The ions are dosed onto the ePTFE sample at concentrations or doses from about 1013 ions/cm2 to about 1016 ions/cm2.
    Type: Application
    Filed: September 30, 2009
    Publication date: January 28, 2010
    Applicant: BOSTON SCIENTIFIC SCIMED, INC.
    Inventors: Alexey Kondyurin, Manfred Franz Maitz
  • Patent number: 7597924
    Abstract: A method for modifying an ePTFE surface by plasma immersion ion implantation includes the steps of providing an ePTFE material in a chamber suitable for plasma treatment; providing a continuous low energy plasma discharge onto the sample; and applying negative high voltage pulses of short duration to form a high energy ion flux from the plasma discharge to generate ions which form free radials on the surface of the ePTFE material without changing the molecular and/or physical structure below the surface to define a modified ePTFE surface. The step of applying the high voltage pulses modifies the surface of the ePTFE without destroying the node and fibril structure of the ePTFE, even when the step of applying the high voltage pulses etches and/or carburizes the surface of the ePTFE. The modified surface may have a depth of about 30 nm to about 500 nm. The ions are dosed onto the ePTFE sample at concentrations or doses from about 1013 ions/cm2 to about 1016 ions/cm2.
    Type: Grant
    Filed: September 15, 2005
    Date of Patent: October 6, 2009
    Assignee: Boston Scientific Scimed, Inc.
    Inventors: Alexey Kondyurin, Manfred Franz Maitz
  • Publication number: 20070191931
    Abstract: Endoprostheses include a wall having a base, e.g., a bioerodible base, and a polymer that may include a region of carbonized polymer formed by implantation.
    Type: Application
    Filed: February 16, 2006
    Publication date: August 16, 2007
    Inventors: Jan Weber, Liliana Atanasoska, Alexey Kondyurin
  • Publication number: 20070191923
    Abstract: Medical balloons are provided that have enhanced properties, such as enhanced puncture and scratch resistance.
    Type: Application
    Filed: February 16, 2006
    Publication date: August 16, 2007
    Inventors: Jan Weber, Liliana Atanasoska, Alexey Kondyurin
  • Publication number: 20070050007
    Abstract: A method for modifying an ePTFE surface by plasma immersion ion implantation includes the steps of providing an ePTFE material in a chamber suitable for plasma treatment; providing a continuous low energy plasma discharge onto the sample; and applying negative high voltage pulses of short duration to form a high energy ion flux from the plasma discharge to generate ions which form free radials on the surface of the ePTFE material without changing the molecular and/or physical structure below the surface to define a modified ePTFE surface. The step of applying the high voltage pulses modifies the surface of the ePTFE without destroying the node and fibril structure of the ePTFE, even when the step of applying the high voltage pulses etches and/or carburizes the surface of the ePTFE. The modified surface may have a depth of about 30 nm to about 500 nm. The ions are dosed onto the ePTFE sample at concentrations or doses from about 1013 ions/cm2 to about 1016 ions/cm2.
    Type: Application
    Filed: September 15, 2005
    Publication date: March 1, 2007
    Inventors: Alexey Kondyurin, Manfred Maitz