Abstract: Techniques for improving efficiency and accuracy of computer-aided design are provided. In one aspect, a method for generating a computer-based representation of a design having one or more shapes is provided comprising the following steps. Each of the shapes in the design is represented with one or more trapezoids, wherein a fixed number of non-vertical lines are used to define an x-coordinate of a left and right base and sides of each trapezoid with intersection points being formed between the non-vertical lines that define the sides. The x-coordinates and intersection points are used to divide the trapezoids into disjoint trapezoids, wherein each disjoint trapezoid is defined by a combination of the same non-vertical lines that are used to define one or more of the trapezoids. An order is assigned to the x-coordinates and intersection points, wherein the x-coordinates and intersection points in the assigned order are representative of the design.

Abstract: Techniques for improving efficiency and accuracy of computer-aided design are provided. In one aspect, a method for generating a computer-based representation of a design having one or more shapes is provided comprising the following steps. Each of the shapes in the design is represented with one or more trapezoids, wherein a fixed number of non-vertical lines are used to define an x-coordinate of a left and right base and sides of each trapezoid with intersection points being formed between the non-vertical lines that define the sides. The x-coordinates and intersection points are used to divide the trapezoids into disjoint trapezoids, wherein each disjoint trapezoid is defined by a combination of the same non-vertical lines that are used to define one or more of the trapezoids. An order is assigned to the x-coordinates and intersection points, wherein the x-coordinates and intersection points in the assigned order are representative of the design.

Abstract: A method of creating a photomask layout for projecting an image of an integrated circuit design comprises creating a layout of spaced integrated circuit shapes to be projected via the photomask, determining bisectors between adjacent ones of the spaced integrated circuit shapes, and creating sub-resolution assist features along at least some of the bisectors between the adjacent ones of the spaced integrated circuit shapes. The bisectors may be determined by creating Voronoi cells around the spaced integrated circuit shapes. Preferably, the adjacent ones of the spaced integrated circuit shapes are parallel to each other and the sub-resolution assist features along the bisectors are parallel to the spaced integrated circuit shapes.

Abstract: An efficient method and system is provided for computing lithographic images that takes into account vector effects such as lens birefringence, resist stack effects and tailored source polarizations, and may also include blur effects of the mask and the resist. These effects are included by forming a generalized bilinear kernel, which is independent of the mask transmission function, which can then be treated using a decomposition to allow rapid computation of an image that includes such non-scalar effects. Dominant eigenfunctions of the generalized bilinear kernel can be used to pre-compute convolutions with possible polygon sectors. A mask transmission function can then be decomposed into polygon sectors, and weighted pre-images may be formed from a coherent sum of the pre-computed convolutions for the appropriate mask polygon sectors. The image at a point may be formed from the incoherent sum of the weighted pre-images over all of the dominant eigenfunctions of the generalized bilinear kernel.