Patents by Inventor Alfred Feitisch
Alfred Feitisch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20160084710Abstract: A spectrometer cell can include a spacer, at least one end cap, and at least one mirror with a reflective surface. The end cap can be positioned proximate to a first contact end of the spacer such that the end cap and spacer at least partially enclose an internal volume of the spectrometer cell. The mirror can be secured in place by a mechanical attachment that includes attachment materials that are chemically inert to at least one reactive gas compound. The mechanical attachment can hold an optical axis of the reflective surface in a fixed orientation relative to other components of the spectrometer cell and or a spectrometer device that comprises the spectrometer cell. The mirror can optionally be constructed of a material such as stainless steel, ceramic, or the like. Related methods, articles of manufacture, systems, and the like are described.Type: ApplicationFiled: September 23, 2014Publication date: March 24, 2016Inventors: Lutz Keller, Alfred Feitisch, Peter Scott, Mathias Schrempel, Nathan St. John
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Publication number: 20160054178Abstract: At least one light source is configured to emit at least one beam into a sample volume of an absorbing medium. In addition, at least one detector is positioned to detect at least a portion of the beam emitted by the at least one light source. Further, at least one beam modification element is positioned between the at least one detector and the at least one light source to selectively change at least one of (i) a power intensity of, or (ii) a shape of the beam emitted by the at least one light source as detected by the at least one detector. A control circuit is coupled to the beam modification element. Related apparatus methods, articles of manufacture, systems, and the like are described.Type: ApplicationFiled: August 22, 2014Publication date: February 25, 2016Inventors: Alfred Feitisch, Xiang Liu, Chih-Husan Chang, Hsu-Hung Huang
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Publication number: 20160054177Abstract: A spectrometer includes a light source that emits a beam into a sample volume comprising an absorbing medium. Thereafter, at least one detector detects at least a portion of the beam emitted by the light source. It is later determined, based on the detected at least a portion of the beam and by a controller, that a position and/or an angle of the beam should be changed. The beam emitted by the light source is then actively steered by an actuation element under control of the controller. In addition, a concentration of the absorbing media can be quantified or otherwise calculated (using the controller or optionally a different processor that can be local or remote). The actuation element(s) can be coupled to one or more of the light source, a detector or detectors, and a reflector or reflectors intermediate the light source and the detector(s).Type: ApplicationFiled: August 22, 2014Publication date: February 25, 2016Inventors: Alfred Feitisch, Xiang Liu, Keith Benjamin Helbley, Douglas Beyer
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Publication number: 20160028211Abstract: A first contact surface of a semiconductor laser chip can be formed to a target surface roughness selected to have a maximum peak to valley height that is substantially smaller than a barrier layer thickness. A barrier layer that includes a non-metallic, electrically-conducting compound and that has the barrier layer thickness can be applied to the first contact surface, and the semiconductor laser chip can be soldered to a carrier mounting along the first contact surface using a solder composition by heating the soldering composition to less than a threshold temperature at which dissolution of the barrier layer into the soldering composition occurs. Related systems, methods, articles of manufacture, and the like are also described.Type: ApplicationFiled: October 1, 2015Publication date: January 28, 2016Inventors: Alfred Feitisch, Gabi Neubauer, Mathias Schrempel
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Publication number: 20160011047Abstract: Validation verification data quantifying an intensity of light reaching a detector of a spectrometer from a light source of the spectrometer after the light passes through a validation gas across a known path length can be collected or received. The validation gas can include an amount of an analyte compound and an undisturbed background composition that is representative of a sample gas background composition of a sample gas to be analyzed using a spectrometer. The sample gas background composition can include one or more background components. The validation verification data can be compared with stored calibration data for the spectrometer to calculate a concentration adjustment factor, and sample measurement data collected with the spectrometer can be modified using this adjustment factor to compensate for collisional broadening of a spectral peak of the analyte compound by the background components. Related methods, articles of manufacture, systems, and the like are described.Type: ApplicationFiled: February 27, 2015Publication date: January 14, 2016Inventors: Alfred Feitisch, Xiang Liu, Hsu-Hung Huang, Wenhai Ji, Richard L. Cline
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Patent number: 9166364Abstract: A first contact surface of a semiconductor laser chip can be formed to a target surface roughness selected to have a maximum peak to valley height that is substantially smaller than a barrier layer thickness. A barrier layer that includes a non-metallic, electrically-conducting compound and that has the barrier layer thickness can be applied to the first contact surface, and the semiconductor laser chip can be soldered to a carrier mounting along the first contact surface using a solder composition by heating the soldering composition to less than a threshold temperature at which dissolution of the barrier layer into the soldering composition occurs. Related systems, methods, articles of manufacture, and the like are also described.Type: GrantFiled: August 17, 2011Date of Patent: October 20, 2015Assignee: SpectraSensors, Inc.Inventors: Alfred Feitisch, Gabi Neubauer, Mathias Schrempel
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Patent number: 9166130Abstract: A first contact surface of a semiconductor laser chip can be formed to a first target surface roughness and a second contact surface of a carrier mounting can be formed to a second target surface roughness. A first bond preparation layer comprising a first metal can optionally be applied to the formed first contact surface, and a second bond preparation layer comprising a second metal can optionally be applied to the formed second contact surface. The first contact surface can be contacted with the second contact surface, and a solderless securing process can secure the semiconductor laser chip to the carrier mounting. Related systems, methods, articles of manufacture, and the like are also described.Type: GrantFiled: October 24, 2012Date of Patent: October 20, 2015Assignee: SpectraSensors, Inc.Inventors: Alfred Feitisch, Gabi Neubauer, Mathias Schrempel
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Patent number: 9109951Abstract: A sample cell can be designed to minimize excess gas volume. Described features can be advantageous in reducing an amount of gas required to flow through the sample cell during spectroscopic measurements, and in reducing a time (e.g. a total volume of gas) required to flush the cell between sampling events. In some examples, contours of the inners surfaces of the sample cell that contact the contained gas can be shaped, dimensioned, etc. such that a maximum clearance distance is provided between the inner surfaces at one or more locations. Systems, methods, and articles, etc. are described.Type: GrantFiled: November 6, 2013Date of Patent: August 18, 2015Assignee: SpectraSensors, Inc.Inventors: Peter Scott, Alfred Feitisch, Peter Dorn, Adam S. Chaimowitz, Hsu-Hung Huang, Mathias Schrempel, Lutz Keller
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Publication number: 20150124257Abstract: A sample cell can be designed to minimize excess gas volume. Described features can be advantageous in reducing an amount of gas required to flow through the sample cell during spectroscopic measurements, and in reducing a time (e.g. a total volume of gas) required to flush the cell between sampling events. In some examples, contours of the inners surfaces of the sample cell that contact the contained gas can be shaped, dimensioned, etc. such that a maximum clearance distance is provided between the inner surfaces at one or more locations. Systems, methods, and articles, etc. are described.Type: ApplicationFiled: November 6, 2013Publication date: May 7, 2015Applicant: SpectraSensors, Inc.Inventors: Peter Scott, Alfred Feitisch, Peter Dorn, Adam S. Chaimowitz, Hsu-Hung Huang, Mathias Schrempel, Lutz Keller
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Patent number: 8976358Abstract: Validation verification data quantifying an intensity of light reaching a detector of a spectrometer from a light source of the spectrometer after the light passes through a validation gas across a known path length can be collected or received. The validation gas can include an amount of an analyte compound and an undisturbed background composition that is representative of a sample gas background composition of a sample gas to be analyzed using a spectrometer. The sample gas background composition can include one or more background components. The validation verification data can be compared with stored calibration data for the spectrometer to calculate a concentration adjustment factor, and sample measurement data collected with the spectrometer can be modified using this adjustment factor to compensate for collisional broadening of a spectral peak of the analyte compound by the background components. Related methods, articles of manufacture, systems, and the like are described.Type: GrantFiled: March 23, 2012Date of Patent: March 10, 2015Assignee: SpectraSensors, Inc.Inventors: Alfred Feitisch, Xiang Liu, Hsu-Hung Huang, Wenhai Ji, Richard Cline
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Patent number: 8953165Abstract: Light intensity data quantifying intensity of light generated by a light source and received at a detector during a validation mode of an absorption spectrometer can be compared with a stored data set representing at least one previous measurement in a validation mode of an analytical system. The validation mode can include causing the light to pass at least once through each of a zero gas and a reference gas contained within a validation cell and including a known amount of a target analyte. The zero gas can have at least one of known and negligible first light absorbance characteristics within a range of wavelengths produced by the light source. A validation failure can be determined to have occurred if the first light intensity data and the stored data set are out of agreement by more than a predefined threshold amount. Related systems, methods, and articles of manufacture are also described.Type: GrantFiled: February 14, 2011Date of Patent: February 10, 2015Assignee: SpectraSensors, Inc.Inventors: Alfred Feitisch, Lutz Keller, Xiang Liu, Mathias Schrempel, Keith Benjamin Helbley
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Patent number: 8842282Abstract: A spectrometer cell can include a spacer, at least one end cap, and at least one mirror with a reflective surface. The end cap can be positioned proximate to a first contact end of the spacer such that the end cap and spacer at least partially enclose an internal volume of the spectrometer cell. The mirror can be secured in place by a mechanical attachment that includes attachment materials that are chemically inert to at least one reactive gas compound. The mechanical attachment can hold an optical axis of the reflective surface in a fixed orientation relative to other components of the spectrometer cell and or a spectrometer device that comprises the spectrometer cell. The mirror can optionally be constructed of a material such as stainless steel, ceramic, or the like. Related methods, articles of manufacture, systems, and the like are described.Type: GrantFiled: December 12, 2012Date of Patent: September 23, 2014Assignee: Spectrasensors, Inc.Inventors: Lutz Keller, Alfred Feitisch, Peter Scott, Mathias Schrempel, Nathan St. John
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Publication number: 20140253922Abstract: A reference harmonic absorption curve of a laser absorption spectrometer can have a reference curve shape derived from a reference signal generated by the detector in response to light passing from the laser light source through a reference gas or gas mixture. The reference gas or gas mixture can include one or more of a target analyte and a background gas expected to be present during analysis of the target analyte. A test harmonic absorption curve having a test curve shape is compared with the reference harmonic absorption curve to detect a difference between the test curve shape and the reference curve shape. Operating and/or analytical parameters of the laser absorption spectrometer are adjusted to correct the test curve shape to reduce the difference between the test curve shape and the reference curve shape.Type: ApplicationFiled: April 28, 2014Publication date: September 11, 2014Applicant: SPECTRASENSORS, INC.Inventors: Xiang Liu, John Lewison, Wenhai Ji, Alfred Feitisch
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Publication number: 20140160474Abstract: A spectrometer cell can include a spacer, at least one end cap, and at least one mirror with a reflective surface. The end cap can be positioned proximate to a first contact end of the spacer such that the end cap and spacer at least partially enclose an internal volume of the spectrometer cell. The mirror can be secured in place by a mechanical attachment that includes attachment materials that are chemically inert to at least one reactive gas compound. The mechanical attachment can hold an optical axis of the reflective surface in a fixed orientation relative to other components of the spectrometer cell and or a spectrometer device that comprises the spectrometer cell. The mirror can optionally be constructed of a material such as stainless steel, ceramic, or the like. Related methods, articles of manufacture, systems, and the like are described.Type: ApplicationFiled: December 12, 2012Publication date: June 12, 2014Inventors: Lutz Keller, Alfred Feitisch, Peter Scott, Mathias Schrempel, Nathan St. John
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Patent number: 8711357Abstract: A reference harmonic absorption curve of a laser absorption spectrometer, which can include a tunable or scannable laser light source and a detector, can have a reference curve shape and can include a first, second, or higher order harmonic signal of a reference signal generated by the detector in response to light passing from the laser light source through a reference gas or gas mixture. The reference gas or gas mixture can include one or more of a target analyte and a background gas expected to be present during analysis of the target analyte. The reference harmonic absorption curve can have been determined for the laser absorption spectrometer in a known or calibrated state. A test harmonic absorption curve having a test curve shape is compared with the reference harmonic absorption curve to detect a difference between the test curve shape and the reference curve shape.Type: GrantFiled: September 16, 2011Date of Patent: April 29, 2014Assignee: SpectraSensors, Inc.Inventors: Xiang Liu, John Lewison, Wenhai Ji, Alfred Feitisch
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Publication number: 20140112363Abstract: A first contact surface of a semiconductor laser chip can be formed to a first target surface roughness and a second contact surface of a carrier mounting can be formed to a second target surface roughness. A first bond preparation layer comprising a first metal can optionally be applied to the formed first contact surface, and a second bond preparation layer comprising a second metal can optionally be applied to the formed second contact surface. The first contact surface can be contacted with the second contact surface, and a solderless securing process can secure the semiconductor laser chip to the carrier mounting. Related systems, methods, articles of manufacture, and the like are also described.Type: ApplicationFiled: October 24, 2012Publication date: April 24, 2014Inventors: Alfred Feitisch, Gabi Neubauer, Mathias Schrempel
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Publication number: 20130250301Abstract: Validation verification data quantifying an intensity of light reaching a detector of a spectrometer from a light source of the spectrometer after the light passes through a validation gas across a known path length can be collected or received. The validation gas can include an amount of an analyte compound and an undisturbed background composition that is representative of a sample gas background composition of a sample gas to be analyzed using a spectrometer. The sample gas background composition can include one or more background components. The validation verification data can be compared with stored calibration data for the spectrometer to calculate a concentration adjustment factor, and sample measurement data collected with the spectrometer can be modified using this adjustment factor to compensate for collisional broadening of a spectral peak of the analyte compound by the background components. Related methods, articles of manufacture, systems, and the like are described.Type: ApplicationFiled: March 23, 2012Publication date: September 26, 2013Inventors: Alfred Feitisch, Xiang Liu, Hsu-Hung Huang, Wenhai Ji, Richard Cline
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Patent number: 8500849Abstract: A differential absorption spectrum for a reactive gas in a gas mixture can be generated for sample absorption data by subtracting background absorption data set from the sample absorption data. The background absorption data can be characteristic of absorption characteristics of the background composition in a laser light scan range that includes a target wavelength. The differential absorption spectrum can be converted to a measured concentration of the reactive gas using calibration data. A determination can be made whether the background composition has substantially changed relative to the background absorption data, and new background absorption data can be used if the background composition has substantially changed. Related systems, apparatus, methods, and/or articles are also described.Type: GrantFiled: March 23, 2012Date of Patent: August 6, 2013Assignee: SpectraSensors, Inc.Inventors: Xin Zhou, Xiang Liu, Alfred Feitisch, Gregory M. Sanger
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Publication number: 20130044322Abstract: A first contact surface of a semiconductor laser chip can be formed to a target surface roughness selected to have a maximum peak to valley height that is substantially smaller than a barrier layer thickness. A barrier layer that includes a non-metallic, electrically-conducting compound and that has the barrier layer thickness can be applied to the first contact surface, and the semiconductor laser chip can be soldered to a carrier mounting along the first contact surface using a solder composition by heating the soldering composition to less than a threshold temperature at which dissolution of the barrier layer into the soldering composition occurs. Related systems, methods, articles of manufacture, and the like are also described.Type: ApplicationFiled: August 17, 2011Publication date: February 21, 2013Inventors: Alfred Feitisch, Gabi Neubauer, Mathias Schrempel
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Patent number: 8358417Abstract: A valid state of an analytical system that includes a light source and a detector can be verified by determining that deviation of first light intensity data quantifying a first intensity of light received at the detector from the light source after the light has passed at least once through each of a reference gas in a validation cell and a zero gas from a stored data set does not exceed a pre-defined threshold deviation. The stored data set can represent at least one previous measurement collected during a previous instrument validation process performed on the analytical system. The reference gas can include a known amount of an analyte. A concentration of the analyte in a sample gas can be determined by correcting second light intensity data quantifying a second intensity of the light received at the detector after the light passes at least once through each of the reference gas in the validation cell and a sample gas containing an unknown concentration of the analyte compound.Type: GrantFiled: February 14, 2011Date of Patent: January 22, 2013Assignee: SpectraSensors, Inc.Inventors: Alfred Feitisch, Lutz Keller, Xiang Liu, Mathias Schrempel, Keith Benjamin Helbley