Patents by Inventor Alicia Walters

Alicia Walters has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Stable, high rate silicon slurry
    Patent number: 8017524
    Abstract: The invention provides a chemical-mechanical polishing composition comprising wet-process silica, a stabilizer compound, a potassium salt, a secondary amine compound, and water. The invention further provides a method of polishing a substrate with the polishing composition.
    Type: Grant
    Filed: May 23, 2008
    Date of Patent: September 13, 2011
    Assignee: Cabot Microelectronics Corporation
    Inventors: Michael White, Jeffrey Gilliland, Lamon Jones, Alicia Walters
  • STABLE, HIGH RATE SILICON SLURRY
    Publication number: 20090291559
    Abstract: The invention provides a chemical-mechanical polishing composition comprising wet-process silica, a stabilizer compound, a potassium salt, a secondary amine compound, and water. The invention further provides a method of polishing a substrate with the polishing composition.
    Type: Application
    Filed: May 23, 2008
    Publication date: November 26, 2009
    Applicant: Cabot Microelectronics Corporation
    Inventors: Michael White, Jeffrey Gilliland, Lamon Jones, Alicia Walters