Patents by Inventor Allen Flanigan
Allen Flanigan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11658016Abstract: A shield encircles a sputtering target that faces a substrate support in a substrate processing chamber. The shield comprises an outer band having a diameter sized to encircle the sputtering target, the outer band having upper and bottom ends, and the upper end having a tapered surface extending radially outwardly and adjacent to the sputtering target. A base plate extends radially inward from the bottom end of the outer band. An inner band joined to the base plate at least partially surrounds a peripheral edge of a substrate support. The shield can also have a heat exchanger comprising a conduit with an inlet and outlet to flow heat exchange fluid therethrough.Type: GrantFiled: May 10, 2019Date of Patent: May 23, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Kathleen Scheible, Michael Allen Flanigan, Goichi Yoshidome, Adolph Miller Allen, Cristopher Pavloff
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Publication number: 20190267220Abstract: A shield encircles a sputtering target that faces a substrate support in a substrate processing chamber. The shield comprises an outer band having a diameter sized to encircle the sputtering target, the outer band having upper and bottom ends, and the upper end having a tapered surface extending radially outwardly and adjacent to the sputtering target. A base plate extends radially inward from the bottom end of the outer band. An inner band joined to the base plate at least partially surrounds a peripheral edge of a substrate support. The shield can also have a heat exchanger comprising a conduit with an inlet and outlet to flow heat exchange fluid therethrough.Type: ApplicationFiled: May 10, 2019Publication date: August 29, 2019Applicant: APPLIED MATERIALS, INC.Inventors: Kathleen Scheible, Michael Allen Flanigan, Goichi Yoshidome, Adolph Miller Allen, Cristopher Pavloff
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Patent number: 10347475Abstract: A holding assembly for retaining a deposition ring about a periphery of a substrate support in a substrate processing chamber, the deposition ring comprising a peripheral recessed pocket with a holding post. The holding assembly comprises a restraint beam capable of being attached to the substrate support, the restraint beam comprising two ends, and an anti-lift bracket. The anti-lift bracket comprises a block comprising a through-channel to receive an end of a restraint beam, and a retaining hoop attached to the block, the retaining hoop sized to slide over and encircle the holding post in the peripheral recessed pocket of the deposition ring.Type: GrantFiled: September 7, 2015Date of Patent: July 9, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Kathleen Scheible, Michael Allen Flanigan, Goichi Yoshidome, Adolph Miller Allen, Christopher Pavloff
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Publication number: 20150380223Abstract: A holding assembly for retaining a deposition ring about a periphery of a substrate support in a substrate processing chamber, the deposition ring comprising a peripheral recessed pocket with a holding post. The holding assembly comprises a restraint beam capable of being attached to the substrate support, the restraint beam comprising two ends, and an anti-lift bracket. The anti-lift bracket comprises a block comprising a through-channel to receive an end of a restraint beam, and a retaining hoop attached to the block, the retaining hoop sized to slide over and encircle the holding post in the peripheral recessed pocket of the deposition ring.Type: ApplicationFiled: September 7, 2015Publication date: December 31, 2015Inventors: Kathleen Scheible, Michael Allen Flanigan, Goichi Yoshidome, Adolph Miller Allen, Christopher Pavloff
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Patent number: 9127362Abstract: A process kit comprises a ring assembly that is placed about a substrate support in a substrate processing chamber to reduce deposition of process deposits on the chamber components and on an overhang edge of the substrate. The process kit includes a deposition ring, cover ring, and anti-lift bracket, and can also include a unitary shield. A target is also described.Type: GrantFiled: October 27, 2006Date of Patent: September 8, 2015Assignee: Applied Materials, Inc.Inventors: Kathleen Scheible, Michael Allen Flanigan, Goichi Yoshidome, Adolph Miller Allen, Cristopher M. Pavloff
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Patent number: 8900427Abstract: A magnetron actuator for moving a magnetron in a nearly arbitrary radial and azimuthal path in the back of a target in a plasma sputter reactor. The magnetron includes two coaxial rotary shafts extending along the chamber central axis and coupled to two independently controllable rotary actuators. An epicyclic gear mechanism or a frog-leg structure mechanically couple the shafts to the magnetron to control its radial and azimuthal position. A vertical actuator moves the shafts vertically in tandem to vary the magnetron's separation from the target's back surface and compensate for erosion of the front surface. The rotary actuators may be separately coupled to the shafts or a rotatable ring gear may be coupled to the shafts through respectively fixed and orbiting idler gears. Two radially spaced sensors detect reflectors attached to the inner and outer arms of the epicyclic gear mechanism for homing of the controller.Type: GrantFiled: August 19, 2011Date of Patent: December 2, 2014Assignee: Applied Materials, Inc.Inventors: Keith A. Miller, Michael Allen Flanigan, Hari Ponnekanti
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Publication number: 20110297538Abstract: A magnetron actuator for moving a magnetron in a nearly arbitrary radial and azimuthal path in the back of a target in a plasma sputter reactor. The magnetron includes two coaxial rotary shafts extending along the chamber central axis and coupled to two independently controllable rotary actuators. An epicyclic gear mechanism or a frog-leg structure mechanically couple the shafts to the magnetron to control its radial and azimuthal position. A vertical actuator moves the shafts vertically in tandem to vary the magnetron's separation from the target's back surface and compensate for erosion of the front surface. The rotary actuators may be separately coupled to the shafts or a rotatable ring gear may be coupled to the shafts through respectively fixed and orbiting idler gears. Two radially spaced sensors detect reflectors attached to the inner and outer arms of the epicyclic gear mechanism for homing of the controller.Type: ApplicationFiled: August 19, 2011Publication date: December 8, 2011Applicant: APPLIED MATERIAL;S, INC.Inventors: Keith A. Miller, Michael Allen Flanigan, Hari Ponnekanti
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Patent number: 8021527Abstract: A magnetron actuator for moving a magnetron in a nearly arbitrary radial and azimuthal path in the back of a target in a plasma sputter reactor. The magnetron includes two coaxial rotary shafts extending along the chamber central axis and coupled to two independently controllable rotary actuators. An epicyclic gear mechanism or a frog-leg structure mechanically couple the shafts to the magnetron to control its radial and azimuthal position. A vertical actuator moves the shafts vertically in tandem to vary the magnetron's separation from the target's back surface and compensate for erosion of the front surface. The rotary actuators may be separately coupled to the shafts or a rotatable ring gear may be coupled to the shafts through respectively fixed and orbiting idler gears. Two radially spaced sensors detect reflectors attached to the inner and outer arms of the epicyclic gear mechanism for homing of the controller.Type: GrantFiled: October 25, 2007Date of Patent: September 20, 2011Assignee: Applied Materials, Inc.Inventors: Keith A. Miller, Michael Allen Flanigan, Hari Ponnekanti
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Patent number: 6508062Abstract: A thermal exchanger assembly for a wafer chuck and method of use therefor is disclosed. More particularly, complimentary manifolds, each having a plurality of fins, are positioned with respect to one another to provide interleaved spaced-apart fins. At least one thermo-electric device is disposed between alternating pairs of fins. The thermo-electric device is coupled to the fins to provide a thermally conductive path from one manifold to the other through the thermo-electric device. The thermal exchanger assembly may be located in a process chamber for processing a wafer, including but not limited to a semiconductor wafer.Type: GrantFiled: January 31, 2001Date of Patent: January 21, 2003Assignee: Applied Materials, Inc.Inventor: Allen Flanigan
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Publication number: 20020100282Abstract: A thermal exchanger assembly for a wafer chuck and method of use therefor is disclosed. More particularly, complimentary manifolds, each having a plurality of fins, are positioned with respect to one another to provide interleaved spaced-apart fins. At least one thermo-electric device is disposed between alternating pairs of fins. The thermo-electric device is coupled to the fins to provide a thermally conductive path from one manifold to the other through the thermo-electric device. The thermal exchanger assembly may be located in a process chamber for processing a wafer, including but not limited to a semiconductor wafer.Type: ApplicationFiled: January 31, 2001Publication date: August 1, 2002Applicant: Applied Materials, Inc.Inventor: Allen Flanigan
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Publication number: 20010030124Abstract: A method and apparatus for fabricating a wafer spacing mask on a workpiece support chuck. Such apparatus is a central body containing a plurality of apertures that is positioned atop the workpiece support chuck and an outer ring shaped body positioned on a flange of the workpiece support chuck while material is deposited onto the apparatus and through the apertures onto chuck. Upon completion of the deposition process, the central body and ring shaped body are removed from the workpiece support chuck leaving deposits of the material to form the wafer spacing mask.Type: ApplicationFiled: June 12, 2001Publication date: October 18, 2001Inventor: Allen Flanigan
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Patent number: 6258227Abstract: A method and apparatus for fabricating a wafer spacing mask on a workpiece support chuck. Such apparatus is a central body containing a plurality of apertures that is positioned atop the workpiece support chuck and an outer ring shaped body positioned on a flange of the workpiece support chuck while material is deposited onto the apparatus and through the apertures onto chuck. Upon completion of the deposition process, the central body and ring shaped body are removed from the workpiece support chuck leaving deposits of the material to form the wafer spacing mask.Type: GrantFiled: March 13, 1999Date of Patent: July 10, 2001Assignee: Applied Materials, Inc.Inventor: Allen Flanigan
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Patent number: 6081414Abstract: Apparatus for biasing and retaining a wafer in a semiconductor wafer processing system. The apparatus has a pedestal, a puck and an electrode disposed between the pedestal and the puck. The pedestal defines an enclosure within which the electrode and other pedestal components are housed. The electrode may serve as a cooling plate for the puck. Each of the components is insulated so as to define an electrical path. The electrical path consists of a conductor connected to a coolant tube inside the enclosure and the cooling plate which is in contact with the coolant tube. The cooling plate is electrically isolated from the pedestal via an isolator ring that circumscribes an upper inner wall of the enclosure. The coolant tube is disposed in a channel on the bottomside of the cooling plate and affixed to the plate so as to establish physical contact. The coolant tube and plate conduct RF power from a power source connected to the tube.Type: GrantFiled: May 1, 1998Date of Patent: June 27, 2000Assignee: Applied Materials, Inc.Inventors: Allen Flanigan, Michael N. Sugarman
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Patent number: 6053756Abstract: The present invention generally provides a safety connector apparatus for making an electrical/power connection in an electrical/power system comprising an interlock cover disposed on a connecting end of a power cable, a housing disposed over a power connector, the housing having a cover receiving cavity and a switch adaptable to enable power transfer when the cover is safely and securely locked by the cover lock.Type: GrantFiled: May 4, 1998Date of Patent: April 25, 2000Assignee: Applied Materials, Inc.Inventors: Allen Flanigan, Vince Burkhart
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Patent number: 6051122Abstract: A readily removable deposition shield assembly for processing chambers such as chemical vapor deposition (CVD), ion implantation, or physical vapor deposition (PVD) or sputtering chambers, is disclosed. The shield assembly includes a shield member which is mounted to the chamber for easy removal, such as by screws, and defines a space along the periphery of the substrate support. A shadow ring is inserted into the peripheral space and is thus mounted in removable fashion and is automatically centered about the substrate by an alignment ring. The alignment ring removably rests upon a flange extending from the outer periphery of an electrostatic chuck. The shadow ring overlaps the cylindrical shield member, the alignment ring and the peripheral edge of a substrate retained by the chuck. Collectively, these components prevent deposition on the chamber and hardware outside the processing region.Type: GrantFiled: August 21, 1997Date of Patent: April 18, 2000Assignee: Applied Materials, Inc.Inventor: Allen Flanigan
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Patent number: D406852Type: GrantFiled: November 14, 1997Date of Patent: March 16, 1999Assignee: Applied Materials, Inc.Inventors: Vincent E. Burkhart, Allen Flanigan, Steven Sansoni
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Patent number: D407073Type: GrantFiled: December 24, 1997Date of Patent: March 23, 1999Assignee: Applied Materials, Inc.Inventors: Vincent E. Burkhart, Allen Flanigan, Steven Sansoni
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Patent number: D420022Type: GrantFiled: December 24, 1997Date of Patent: February 1, 2000Assignee: Applied Materials, Inc.Inventors: Vincent E. Burkhart, Allen Flanigan, Steven Sansoni
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Patent number: D420023Type: GrantFiled: January 9, 1999Date of Patent: February 1, 2000Assignee: Applied Materials, Inc.Inventors: Allen Flanigan, Steven Sansoni, Vincent E. Burkhart
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Patent number: D425919Type: GrantFiled: November 14, 1997Date of Patent: May 30, 2000Assignee: Applied Materials, Inc.Inventors: Vincent E. Burkhart, Allen Flanigan, Steven Sansoni