Patents by Inventor Alois Litters

Alois Litters has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Agent and method for the removal of photoresist and stripper residues from semiconductor substrates
    Patent number: 4786578
    Abstract: Photoresist and stripper residues can be rapidly and completely removed from semiconductor substrates after the stripping process with an aqueous post-rinsing agent which contains a nonionogenic surfactant and an organic base.
    Type: Grant
    Filed: July 20, 1987
    Date of Patent: November 22, 1988
    Assignee: Merck Patent Gesellschaft mit beschrankter Haftung
    Inventors: Karl H. Neisius, Alois Litters