Patents by Inventor Ami Sade
Ami Sade has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11204312Abstract: Full wafer in-situ metrology chambers and methods of use are described. The metrology chambers include a substrate support and a sensor bar that are rotatable relative to each other. The sensor bar includes a plurality of sensors at different radii from a central axis.Type: GrantFiled: March 13, 2020Date of Patent: December 21, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Ami Sade, Todd Egan, Shay Assaf, Jacob Newman
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Publication number: 20210285865Abstract: Full wafer in-situ metrology chambers and methods of use are described. The metrology chambers include a substrate support and a sensor bar that are rotatable relative to each other. The sensor bar includes a plurality of sensors at different radii from a central axis.Type: ApplicationFiled: March 13, 2020Publication date: September 16, 2021Applicant: Applied Materials, Inc.Inventors: Ami Sade, Todd Egan, Shay Assaf, Jacob Newman
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Patent number: 11047039Abstract: Substrate carrier apparatus having a hard mask are disclosed herein. In some embodiments, a substrate carrier apparatus includes a carrier body having a support surface to support a substrate; and a mask assembly disposed above the support surface. The mask assembly includes an annular frame disposed atop the support surface; and a hard mask coupled to and disposed within the annular frame above the support surface, wherein the hard mask includes one or more openings arranged in a predetermined pattern and disposed through the hard mask, and wherein the hard mask includes a plurality of spacer elements extending from a bottom surface of the hard mask.Type: GrantFiled: December 26, 2018Date of Patent: June 29, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Alexander Lerner, Kim Vellore, Ami Sade, Steven Sansoni, Andrew Constant, Kevin Moraes, Roey Shaviv, Niranjan Kumar, Jeffrey Brodine, Michael Karazim
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Publication number: 20190211442Abstract: Substrate carrier apparatus having a hard mask are disclosed herein. In some embodiments, a substrate carrier apparatus includes a carrier body having a support surface to support a substrate; and a mask assembly disposed above the support surface. The mask assembly includes an annular frame disposed atop the support surface; and a hard mask coupled to and disposed within the annular frame above the support surface, wherein the hard mask includes one or more openings arranged in a predetermined pattern and disposed through the hard mask, and wherein the hard mask includes a plurality of spacer elements extending from a bottom surface of the hard mask.Type: ApplicationFiled: December 26, 2018Publication date: July 11, 2019Inventors: ALEXANDER LERNER, KIM VELLORE, AMI SADE, STEVEN SANSONI, ANDREW CONSTANT, KEVIN MORAES, ROEY SHAVIV, NIRANJAN KUMAR, JEFFREY BRODINE, MICHAEL KARAZIM
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Patent number: 7486814Abstract: A method and apparatus for inspecting a reticle measures line widths using an inspection tool that images the reticle and compares the image with a design database to detect errors in real time. The differences between the line widths of patterns on the reticle and the design database are stored during the inspection procedure. The difference (or “bias”) information is then processed off-line to create a map of all the local line-width deviation values (i.e., bias) of every feature on the reticle. The resultant local bias map can be used as a feedback mechanism to improve the reticle manufacturing process, as a “go/no go” criteria for the validity of the reticle, and as a standard report shipped together with the mask to the wafer fabrication facility, where it can be used as a yield-enhancing tool.Type: GrantFiled: April 10, 2006Date of Patent: February 3, 2009Assignee: Applied Materials, Inc.Inventors: Yair Eran, Gad Greenberg, Ami Sade, Shirley Hemar
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Publication number: 20060251317Abstract: A method and apparatus for inspecting a reticle measures line widths using an inspection tool that images the reticle and compares the image with a design database to detect errors in real time. The differences between the line widths of patterns on the reticle and the design database are stored during the inspection procedure. The difference (or “bias”) information is then processed off-line to create a map of all the local line-width deviation values (i.e., bias) of every feature on the reticle. The resultant local bias map can be used as a feedback mechanism to improve the reticle manufacturing process, as a “go/no go” criteria for the validity of the reticle, and as a standard report shipped together with the mask to the wafer fabrication facility, where it can be used as a yield-enhancing tool.Type: ApplicationFiled: April 10, 2006Publication date: November 9, 2006Applicant: APPLIED MATERIALS, INC.Inventors: Yair Eran, Gad Greenberg, Ami Sade, Shirley Hemar
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Patent number: 7133549Abstract: A method and apparatus for inspecting a reticle measures line widths using an inspection tool that images the reticle and compares the image with a design database to detect errors in real time. The differences between the line widths of patterns on the reticle and the design database are stored during the inspection procedure. The difference (or “bias”) information is then processed off-line to create a map of all the local line-width deviation values (i.e., bias) of every feature on the reticle. The resultant local bias map can be used as a feedback mechanism to improve the reticle manufacturing process, as a “go/no go” criteria for the validity of the reticle, and as a standard report shipped together with the mask to the wafer fabrication facility, where it can be used as a yield-enhancing tool.Type: GrantFiled: December 19, 2002Date of Patent: November 7, 2006Assignee: Applied Materials, Inc.Inventors: Yair Eran, Gad Greenberg, Ami Sade, Shirley Hemar
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Publication number: 20030174876Abstract: A method and apparatus for inspecting a reticle measures line widths using an inspection tool that images the reticle and compares the image with a design database to detect errors in real time. The differences between the line widths of patterns on the reticle and the design database are stored during the inspection procedure. The difference (or “bias”) information is then processed off-line to create a map of all the local line-width deviation values (i.e., bias) of every feature on the reticle. The resultant local bias map can be used as a feedback mechanism to improve the reticle manufacturing process, as a “go/no go” criteria for the validity of the reticle, and as a standard report shipped together with the mask to the wafer fabrication facility, where it can be used as a yield-enhancing tool.Type: ApplicationFiled: December 19, 2002Publication date: September 18, 2003Applicant: APPLIED MATERIALS, INC.Inventors: Yair Eran, Gad Greenberg, Ami Sade, Shirley Hemar