Patents by Inventor Amir MOSHE
Amir MOSHE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11964455Abstract: A method for manufacturing a breathable elastic laminate includes aperturing an elastic film to create an apertured elastic film with a pattern. The pattern includes a plurality of first lanes extending in a machine direction, each of the plurality of first lanes having a plurality of apertures, and a plurality of second lanes extending in the machine direction. Each of the plurality of second lanes is devoid of apertures and has a width of at least twice the width of one of the apertures in the first lanes. The plurality of second lanes alternate with the plurality of first lanes in a cross direction substantially orthogonal to the machine direction. The method includes stretching the apertured elastic film in the machine direction to activate the apertured elastic film and bonding a first side of the activated apertured elastic film to a nonwoven web to create a breathable elastic laminate.Type: GrantFiled: July 28, 2020Date of Patent: April 23, 2024Assignee: FITESA FILM PRODUCTS LLCInventors: Amir Moshe, David L Godshall
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Publication number: 20210101377Abstract: A method for manufacturing a breathable elastic laminate includes aperturing an elastic film to create an apertured elastic film with a pattern. The pattern includes a plurality of first lanes extending in a machine direction, each of the plurality of first lanes having a plurality of apertures, and a plurality of second lanes extending in the machine direction. Each of the plurality of second lanes is devoid of apertures and has a width of at least twice the width of one of the apertures in the first lanes. The plurality of second lanes alternate with the plurality of first lanes in a cross direction substantially orthogonal to the machine direction. The method includes stretching the apertured elastic film in the machine direction to activate the apertured elastic film and bonding a first side of the activated apertured elastic film to a nonwoven web to create a breathable elastic laminate.Type: ApplicationFiled: July 28, 2020Publication date: April 8, 2021Inventors: Amir MOSHE, David L. GODSHALL
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Publication number: 20210052438Abstract: A method for manufacturing an elastic laminate includes conveying an elastic laminate precursor material comprising an elastic film layer and a nonwoven layer in a machine direction to an activation station, activating, at the activation station, a first zone of the elastic laminate precursor material to create a first stretch zone of the elastic laminate, and activating a second zone of the elastic laminate precursor material to create a second stretch zone of the elastic laminate having at least one stretch property different from the first stretch zone of the elastic laminate.Type: ApplicationFiled: August 21, 2020Publication date: February 25, 2021Inventors: Amir MOSHE, Stephen D. BRUCE, Todd R. SKOCHDOPOLE, Meredith W. ALLIN, Tiffany Cassidy HULTQUIST
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Patent number: 10060736Abstract: A method for determining a distance between a near field sensor and a substrate, the method may include creating a diffraction pattern by illuminating, with a beam of coherent radiation having a wavelength that does not exceed twenty nanometers, a slit that is formed between the substrate and an opaque element; detecting, by a detector, multiple portions of the diffraction pattern and generating detection signals indicative of the multiple portions of the diffraction pattern; processing the detection signals to determine a height of the slit; and determining the distance between the near field sensor and the substrate based upon (a) the height of the slit, and (b) a relationship between the height of the slit and a location of the near field sensor.Type: GrantFiled: April 21, 2016Date of Patent: August 28, 2018Assignee: Appled Materials Israel Ltd.Inventors: Amir Moshe Sagiv, Yoram Uziel, Haim Feldman, Ron Naftali
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Patent number: 9395266Abstract: An on-tool measurement system and a method for measuring optical system's wavefront (WF) aberrations are disclosed. The on-tool measurement system includes an optical setup comprising a moveable deflection element further comprising a highly transparent region. The deflection element includes a first surface configured to project a first image of at least one object onto a sensor and the highly transparent region includes a second surface configured to project a second image of the at least one object onto the sensor. The on-tool measurement system includes a sensor configured to capture the first and second images and a controller configured to measure differential displacements between the first and second images at each deflection element position and to calculate the optical setup local WF gradients that depend on the measured differential displacements.Type: GrantFiled: December 4, 2014Date of Patent: July 19, 2016Assignee: APPLIED MATERIALS ISRAEL LTD.Inventors: Boris Golberg, Amir Moshe Sagiv, Haim Feldman, Uriel Malul, Adam Baer
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Patent number: 9244290Abstract: An optical system having coherence reduction capabilities includes a light source for generating a first light pulse; an asymmetrical pulse stretcher arranged to receive the first light pulse and to generate multiple light pulses, during a pulse sequence generation period, wherein the asymmetrical pulse stretcher includes multiple optical components which define a loop and a condenser lens is located between the asymmetrical pulse stretcher and an object, for directing the multiple pulses toward an area on the object At least two optical components of the multiple optical components are positioned in an almost symmetrical manner in relation to each other and introduce a coherence-related difference between at least two pulses of the multiple pulses. The pulse sequence generation period does not exceed a response period of a detector.Type: GrantFiled: January 6, 2011Date of Patent: January 26, 2016Assignee: Applied Materials Israel Ltd.Inventors: Roman Vander, Shmuel Mangan, Boris Goldberg, Amir Moshe Sagiv
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Publication number: 20150300913Abstract: An on-tool measurement system and a method for measuring optical system's wavefront (WF) aberrations are disclosed. The on-tool measurement system includes an optical setup comprising a moveable deflection element further comprising a highly transparent region. The deflection element includes a first surface configured to project a first image of at least one object onto a sensor and the highly transparent region includes a second surface configured to project a second image of the at least one object onto the sensor. The on-tool measurement system includes a sensor configured to capture the first and second images and a controller configured to measure differential displacements between the first and second images at each deflection element position and to calculate the optical setup local WF gradients that depend on the measured differential displacements.Type: ApplicationFiled: December 4, 2014Publication date: October 22, 2015Inventors: Boris Golberg, Amir Moshe Sagiv, Haim Feldman, Uriel Malul, Adam Baer
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Publication number: 20140036942Abstract: An optical system having coherence reduction capabilities includes a light source for generating a first light pulse; an asymmetrical pulse stretcher arranged to receive the first light pulse and to generate multiple light pulses, during a pulse sequence generation period, wherein the asymmetrical pulse stretcher includes multiple optical components which define a loop and a condenser lens is located between the asymmetrical pulse stretcher and an object, for directing the multiple pulses toward an area on the object At least two optical components of the multiple optical components are positioned in an almost symmetrical manner in relation to each other and introduce a coherence-related difference between at least two pulses of the multiple pulses. The pulse sequence generation period does not exceed a response period of a detector.Type: ApplicationFiled: January 6, 2011Publication date: February 6, 2014Applicant: APPLIED MATERIALS ISRAEL LTDInventors: Roman Vander, Shmuel Mangan, Boris Goldberg, Amir Moshe Sagiv
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Patent number: 8327298Abstract: Evaluating error sources associated with a mask involves: (i) receiving data representative of multiple images of the mask that were obtained at different exposure conditions; (ii) calculating, for multiple sub-frames of each image of the mask, values of a function of intensities of pixels of each sub-frame to provide multiple calculated values; and (iii) detecting error sources in response to calculated values and in response to sensitivities of the function to each error source.Type: GrantFiled: February 25, 2010Date of Patent: December 4, 2012Assignee: Applied Materials Israel, Ltd.Inventors: Lev Faivishevsky, Sergey Khristo, Amir Moshe Sagiv, Shmuel Mangan
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Patent number: 8228497Abstract: A method and system for evaluating an object that has a repetitive pattern. Illumination optics of an optical unit are adapted to scan a spot of radiation over a repetitive pattern that includes multiple regularly repeating structural elements that are optically distinguishable from their background, generating a diffraction pattern that includes multiple diffraction lobes. Collection optics are adapted to focus radiation from the repetitive pattern onto a detector. The focused radiation includes a single diffraction lobe while not including other diffraction lobes. A grey field detector generates detection signals, responsive to the focused collected radiation.Type: GrantFiled: July 11, 2008Date of Patent: July 24, 2012Assignee: Applied Materials Israel, Ltd.Inventors: Shmuel Mangan, Amir Moshe Sagiv
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Publication number: 20100235805Abstract: Evaluating error sources associated with a mask involves: (i) receiving data representative of multiple images of the mask that were obtained at different exposure conditions; (ii) calculating, for multiple sub-frames of each image of the mask, values of a function of intensities of pixels of each sub-frame to provide multiple calculated values; and (iii) detecting error sources in response to calculated values and in response to sensitivities of the function to each error source.Type: ApplicationFiled: February 25, 2010Publication date: September 16, 2010Inventors: Lev Faivishevsky, Sergey Khristo, Amir Moshe Sagiv, Shmuel Mangan
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Publication number: 20090066942Abstract: A method and system for evaluating an object that has a repetitive pattern. Illumination optics of an optical unit are adapted to scan a spot of radiation over a repetitive pattern that includes multiple regularly repeating structural elements that are optically distinguishable from their background, generating a diffraction pattern that includes multiple diffraction lobes. Collection optics are adapted to focus radiation from the repetitive pattern onto a detector. The focused radiation includes a single diffraction lobe while not including other diffraction lobes. A grey field detector generates detection signals, responsive to the focused collected radiation.Type: ApplicationFiled: July 11, 2008Publication date: March 12, 2009Inventors: Shmuel Mangan, Amir Moshe Sagiv