Patents by Inventor Amir Prizant

Amir Prizant has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photolithographic patterning of a cylinder
    Patent number: 10345705
    Abstract: Methods herein form a photoresist on an exterior of a cylinder and expose the photoresist to a light source while rotating the cylinder. Such methods develop the photoresist, after exposing, to change the photoresist into a patterned protective layer on the exterior of the cylinder. Then, these methods pattern the exterior of the cylinder while rotating the cylinder using the patterned protective layer to produce a patterned cylinder.
    Type: Grant
    Filed: July 12, 2013
    Date of Patent: July 9, 2019
    Assignee: Xerox Corporation
    Inventors: Karl E. Kurz, Amir Prizant, Christopher D. Blair
  • METHOD TO SIMULTANEOUSLY PROTECT A XEROGRAPHIC PHOTORECEPTOR FROM LIGHT SHOCK AND PROVIDE STARTUP LUBRICATION AT INSTALL
    Publication number: 20160139518
    Abstract: A removable protective coating for a photoreceptor that includes a colorant of a preselected color and a lubricant for providing initial lubrication to the photoreceptor and cleaning system blade or brush. The coating also includes a binding agent that is configured to attach the colorant and the lubricant together. The removable protective coating further includes a solution mixed with the colorant, the lubricant, and the binding agent, the mixed solution being applied to an exterior surface of the photoreceptor drying to form the removable protective coating. The removable protective coating is removed by the cleaning system during startup, providing lubrication to the cleaning system and the photoreceptor.
    Type: Application
    Filed: November 18, 2014
    Publication date: May 19, 2016
    Inventors: Amir Prizant, Edward C. Savage, David R. Voight, Man Kit Yip
  • PHOTOLITHOGRAPHIC PATTERNING OF A CYLINDER
    Publication number: 20150017588
    Abstract: Methods herein form a photoresist on an exterior of a cylinder and expose the photoresist to a light source while rotating the cylinder. Such methods develop the photoresist, after exposing, to change the photoresist into a patterned protective layer on the exterior of the cylinder. Then, these methods pattern the exterior of the cylinder while rotating the cylinder using the patterned protective layer to produce a patterned cylinder.
    Type: Application
    Filed: July 12, 2013
    Publication date: January 15, 2015
    Inventors: Karl E. Kurz, Amir Prizant, Christopher D. Blair